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1.
公开(公告)号:US07329879B2
公开(公告)日:2008-02-12
申请号:US11064036
申请日:2005-02-22
IPC分类号: H01J49/42
CPC分类号: H01J49/063 , H01J49/4215 , H01J49/4225 , H01J49/4255
摘要: A device for manipulating ions which includes a perforated folder of electrically conductive material, a first electrode fixed to the holder and a second electrode extending parallel to the first electrode and spaced from the first electrode and holder. The second electrode is connected to the holder through a rigid support of electrically insulated material.
摘要翻译: 一种用于操作离子的装置,其包括导电材料的穿孔的夹具,固定到保持器的第一电极和平行于第一电极延伸并与第一电极和保持器间隔开的第二电极。 第二电极通过电绝缘材料的刚性支撑件连接到保持器。
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2.
公开(公告)号:US06723986B2
公开(公告)日:2004-04-20
申请号:US10027333
申请日:2002-03-15
IPC分类号: B01D5944
CPC分类号: H01J49/063 , H01J49/4215 , H01J49/4225 , H01J49/4255
摘要: A device for manipulating ions which includes a perforated folder of electrically conducted material, a first electrode fixed to the holder and a second electrode extending parallel to the first electrode and spaced from the first electrode and holder. The second electrode is connected to the holder through a rigid support of electrically insulated material.
摘要翻译: 一种用于操作离子的装置,其包括导电材料的穿孔夹具,固定到保持器的第一电极和平行于第一电极延伸并与第一电极和保持器间隔开的第二电极。 第二电极通过电绝缘材料的刚性支撑件连接到保持器。
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公开(公告)号:US07259379B2
公开(公告)日:2007-08-21
申请号:US11271443
申请日:2005-11-09
申请人: Mingda Wang , Edward C. Cirimele
发明人: Mingda Wang , Edward C. Cirimele
CPC分类号: H01J49/147 , H01J49/063
摘要: An electron impact ion source includes an ionization chamber in which a first rf multipole field can be generated and an ion guide positioned downstream from the ionization chamber in which a second rf multipole field can be generated wherein electrons are injected into the ionization chamber along the axis (on-axis) to ionize an analyte sample provided to the ionization chamber.
摘要翻译: 电子碰撞离子源包括其中可以产生第一rf多极场的电离室和位于电离室下游的离子导向器,其中可以产生第二射频多极场,其中电子沿着轴线注入电离室 (轴上)离子化提供给电离室的分析物样品。
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公开(公告)号:US06998622B1
公开(公告)日:2006-02-14
申请号:US10992191
申请日:2004-11-17
申请人: Mingda Wang , Edward C. Cirimele
发明人: Mingda Wang , Edward C. Cirimele
CPC分类号: H01J49/147 , H01J49/063
摘要: An electron impact ion source includes an ionization chamber in which a first rf multipole field can be generated and an ion guide positioned downstream from the ionization chamber in which a second rf multipole field can be generated wherein electrons are injected into the ionization chamber along the axis (on-axis) to ionize an analyte sample provided to the ionization chamber.
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