Self-aligned non-volatile memory cell
    8.
    发明授权
    Self-aligned non-volatile memory cell 有权
    自对准非易失性存储单元

    公开(公告)号:US07504686B2

    公开(公告)日:2009-03-17

    申请号:US11469727

    申请日:2006-09-01

    IPC分类号: H01L29/76

    摘要: Floating gate structures are disclosed that have a projection that extends away from the surface of a substrate. This projection may provide the floating gate with increased surface area for coupling the floating gate and the control gate. In one embodiment, the word line extends downwards on each side of the floating gate to shield adjacent floating gates in the same string. In another embodiment, a process for fabricating floating gates with projections is disclosed. The projection may be formed so that it is self-aligned to the rest of the floating gate.

    摘要翻译: 公开了浮动栅极结构,其具有远离衬底的表面延伸的突起。 该突起可以为浮动栅极提供增加的表面积,用于耦合浮动栅极和控制栅极。 在一个实施例中,字线在浮动栅极的每一侧向下延伸以屏蔽相同串中的相邻浮动栅极。 在另一个实施例中,公开了一种用于制造具有突起的浮动栅极的工艺。 突起可以形成为使得其与浮动栅极的其余部分自对准。

    Non-volatile memory cells shaped to increase coupling to word lines
    9.
    发明授权
    Non-volatile memory cells shaped to increase coupling to word lines 有权
    非易失性存储单元成形为增加与字线的耦合

    公开(公告)号:US07436019B2

    公开(公告)日:2008-10-14

    申请号:US11622634

    申请日:2007-01-12

    IPC分类号: H01L29/788

    摘要: A non-volatile memory array has word lines coupled to floating gates, the floating gates having an upper portion that is adapted to provide increased surface area, and thereby, to provide increased coupling to the word lines. Shielding between floating gates is also provided. The upper portion covers part of a lower portion of the floating gate and leaves a part of the lower portion uncovered. A control gate is coplanar with a top surface of the upper portion, a vertical side of the upper portion, and the uncovered portion of the lower portion.

    摘要翻译: 非易失性存储器阵列具有耦合到浮动栅极的字线,浮动栅极具有适于提供增加的表面积的上部部分,从而提供增加的与字线的耦合。 还提供了浮动门之间的屏蔽。 上部覆盖浮动门的下部的一部分并且使下部的未被覆盖的部分离开。 控制栅极与上部的上表面,上部的垂直侧和下部的未覆盖部分共面。

    Method of manufacturing self aligned non-volatile memory cells
    10.
    发明授权
    Method of manufacturing self aligned non-volatile memory cells 有权
    制造自对准非易失性存储单元的方法

    公开(公告)号:US07183153B2

    公开(公告)日:2007-02-27

    申请号:US10799060

    申请日:2004-03-12

    IPC分类号: H01L21/8238

    摘要: A method of forming an array of non-volatile memory cells includes forming a plurality of floating gate structures and shaping the plurality of floating gate structures to reduce the width of upper parts of floating gate structures. A first process forms floating gates by etching an upper portion of a polysilicon structure with masking elements in place to shape the floating gate. A second process etches recesses and protrusions in a polysilicon structure prior to etching the structure to form individual floating gates.

    摘要翻译: 形成非易失性存储单元阵列的方法包括形成多个浮置栅极结构并使多个浮动栅极结构成形以减小浮动栅极结构的上部的宽度。 第一工艺通过用掩蔽元件蚀刻多晶硅结构的上部来形成浮栅来形成浮栅,以形成浮栅。 在蚀刻结构之前,第二工艺蚀刻多晶硅结构中的凹陷和突起以形成单独的浮动栅极。