Duplicating film mask with radiation absorbing benzophenone in processed
positive-working radiation sensitive layer on transparent substrate
    1.
    发明授权
    Duplicating film mask with radiation absorbing benzophenone in processed positive-working radiation sensitive layer on transparent substrate 失效
    在透明基底上加工的正性辐射敏感层中,用吸收二苯甲酮的复印膜掩膜

    公开(公告)号:US4486518A

    公开(公告)日:1984-12-04

    申请号:US420766

    申请日:1982-09-21

    CPC分类号: G03F7/0226

    摘要: A non-silver, positive-working, essentially alkali-insoluble, radiation-sensitive composition, which becomes alkali-soluble on exposure to radiation, comprising a non-silver, positive-acting, essentially alkali-insoluble radiation-sensitive component a radiation absorbing component and an essentially alkali-soluble polymeric binder. A radiation-sensitive element comprising a transparent substrate overcoated with said radiation-sensitive composition. A duplicating film comprising the said element prepared by exposing said composition through the substrate and then image-wise exposing said composition through a mask in front of the composition followed by treatment with an alkaline developer to remove those areas of the composition subjected to both exposures.

    摘要翻译: 非银,正性,基本上不溶于碱的辐射敏感组合物,其在暴露于辐射下变得碱溶性,包含非银,正性作用,基本上不溶于碱的辐射敏感组分,辐射吸收 组分和基本上碱溶性的聚合物粘合剂。 一种辐射敏感元件,包括用所述辐射敏感组合物外敷的透明基底。 一种复制膜,其包含通过将所述组合物暴露于基底而制备的所述元件,然后通过组合物前面的掩模将所述组合物成像曝光,然后用碱性显影剂处理以去除经受两次曝光的组合物的那些区域。

    Heat treatment method for obtaining imagable coatings and imagable coatings
    3.
    发明授权
    Heat treatment method for obtaining imagable coatings and imagable coatings 失效
    用于获得可成像涂层和可成像涂层的热处理方法

    公开(公告)号:US06251559B1

    公开(公告)日:2001-06-26

    申请号:US09368261

    申请日:1999-08-03

    IPC分类号: G03F7004

    CPC分类号: B41N3/00

    摘要: Imagable articles comprising positive working polymeric resins coating onto substrates are given a heat treatment comprising their controlled slow cooling from an elevated temperature. The imagable articles include precursors for lithographic printing plates and for printed circuits. The controlled slow cooling improves the development characteristics of the coatings after an imaging step.

    摘要翻译: 包含涂覆在基底上的正性聚合物树脂的可想象的制品被给予热处理,其包括从高温控制的缓慢冷却。 可成像制品包括平版印刷版和印刷电路用前体。 受控的慢冷却改善了成像步骤后涂层的显影特性。