公开(公告)号：US20110249358A1

公开(公告)日：2011-10-13

申请号：US13085657

申请日：2011-04-13

Applicant: Ji-young LEE ,  Man-sik Sim

Inventor： Ji-young LEE ,  Man-sik Sim

IPC: G11B5/02

CPC classification number: G11B20/1816 ,  G11B2220/2516

Abstract: A method and apparatus to detect a defective sector include features of determining a first error value by counting the number of error symbols in first data read from a sector by using a head in an on-track state, and reading second data from the sector by off-tracking the head in a positive direction and third data from the sector by off-tracking the head in a negative direction in response to the first error value being equal to or greater than a first threshold value. Additionally, a second error value is determined based on the number of error symbols in the read second data and a third error value is determined based on the number of error symbols in the read third data. Accordingly, the sector is determined to have a defect by comparing an average of the second and third error values to a second threshold value.

Abstract translation: 用于检测缺陷扇区的方法和装置包括通过使用在轨道状态下的头从扇区读取的第一数据中的误差符号的数量进行计数来确定第一误差值的特征，以及从扇区读取第二数据， 响应于第一误差值等于或大于第一阈值，通过以负方向偏移磁头来从正向切向磁头和来自扇区的第三数据。 此外，基于读取的第二数据中的错误符号的数量确定第二错误值，并且基于读取的第三数据中的错误符号的数量来确定第三错误值。 因此，通过将第二和第三误差值的平均值与第二阈值进行比较来确定扇区具有缺陷。

公开(公告)号：US20070263309A1

公开(公告)日：2007-11-15

申请号：US11736152

申请日：2007-04-17

Applicant: Joo-hyun LEE ,  Ji-young LEE ,  Myoung-mee KIM

Inventor： Joo-hyun LEE ,  Ji-young LEE ,  Myoung-mee KIM

IPC: G11B27/36 ,  G11B21/02

CPC classification number: G11B5/09 ,  G11B5/3136 ,  G11B27/36 ,  G11B2220/2516

Abstract: Optimal write current of a data storage device is determined by writing test data with an initial write condition and evaluating a performance related to the pole tip protrusion (PTP) of a magnetic head. A PTP control duration is determined as a duration between where the test data is initially written and where a performance evaluation value begins to satisfy a threshold criterion. An overshoot value of a PTP control signal that determines an overshoot amplitude of a write current and a PTP control duration are determined by for writing subsequent data such that PTP-related data errors are substantially constant regardless of write time.

Abstract translation: 通过写入具有初始写入条件的测试数据并评估与磁头的极尖突起（PTP）相关的性能来确定数据存储设备的最佳写入电流。 PTP控制持续时间被确定为最初写入测试数据和性能评估值开始满足阈值标准之间的持续时间。 通过写入后续数据确定确定写入电流和PTP控制持续时间的过冲幅度的PTP控制信号的过冲值，使得PTP相关数据误差基本上恒定，而与写入时间无关。

公开(公告)号：US20080048340A1

公开(公告)日：2008-02-28

申请号：US11928034

申请日：2007-10-30

Applicant: Dong-seok LEE ,  Seung-pil CHUNG ,  Ji-young LEE

Inventor： Dong-seok LEE ,  Seung-pil CHUNG ,  Ji-young LEE

IPC: H01L23/48 ,  H01L21/44

CPC classification number: H01L21/0337 ,  H01L21/0338 ,  H01L21/31144 ,  H01L21/32139 ,  H01L21/76804 ,  H01L21/76811 ,  H01L21/76813 ,  H01L21/76816 ,  H01L27/105 ,  H01L27/1052 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A semiconductor device and method are disclosed in which an interlayer insulating layer is patterned using multiple overlaying masks to define the geometry of contact plugs and corresponding wiring layers separated by fine pitches.

Abstract translation: 公开了一种半导体器件和方法，其中使用多个覆盖掩模来图案化层间绝缘层，以限定接触插塞的几何形状和由细间距分开的对应的布线层。

公开(公告)号：US20120303779A1

公开(公告)日：2012-11-29

申请号：US13469400

申请日：2012-05-11

Applicant: Ji-young LEE ,  Seung-soo OAK ,  Byung-oh PARK ,  Lye-suk LEE ,  Hyung-chan KIM

Inventor： Ji-young LEE ,  Seung-soo OAK ,  Byung-oh PARK ,  Lye-suk LEE ,  Hyung-chan KIM

IPC: G06F15/173

CPC classification number: H04L41/0893 ,  H04L41/046 ,  H04L41/22

Abstract: Management server is provided. The management server includes a storage unit to store information about a plurality of client groups, a communication interface unit to receive management device identification information from a management device at remote distance connected to at least one image forming apparatus, a mapping unit to map at least one from among the plurality of client groups with the management device based on the received management device identification information, and a control unit to transmit an activation command to the mapped management device, the activation command directing the management device mapped with the client group to collect the information about the connected image forming apparatus.

Abstract translation: 提供管理服务器。 管理服务器包括：存储单元，用于存储关于多个客户端组的信息;通信接口单元，用于从连接到至少一个图像形成装置的远程距离的管理设备接收管理设备标识信息;映射单元，至少映射 基于接收到的管理装置识别信息的具有管理装置的多个客户组中的一个，以及向映射的管理装置发送激活命令的控制单元，指示与客户端组对应的管理装置收集的激活命令 关于连接图像形成装置的信息。

公开(公告)号：US20110081778A1

公开(公告)日：2011-04-07

申请号：US12966110

申请日：2010-12-13

Applicant: Dong-seok LEE ,  Seung-pil CHUNG ,  Ji-young LEE

Inventor： Dong-seok LEE ,  Seung-pil CHUNG ,  Ji-young LEE

IPC: H01L21/768

CPC classification number: H01L21/0337 ,  H01L21/0338 ,  H01L21/31144 ,  H01L21/32139 ,  H01L21/76804 ,  H01L21/76811 ,  H01L21/76813 ,  H01L21/76816 ,  H01L27/105 ,  H01L27/1052 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A semiconductor device and method are disclosed in which an interlayer insulating layer is patterned using multiple overlaying masks to define the geometry of contact plugs and corresponding wiring layers separated by fine pitches.

Abstract translation: 公开了一种半导体器件和方法，其中使用多个覆盖掩模来图案化层间绝缘层，以限定接触插塞的几何形状和由细间距分开的对应的布线层。

公开(公告)号：US20090117497A1

公开(公告)日：2009-05-07

申请号：US12327006

申请日：2008-12-03

Applicant: Ji-young LEE ,  Sang-gyun WOO ,  Joon-soo PARK

Inventor： Ji-young LEE ,  Sang-gyun WOO ,  Joon-soo PARK

IPC: G03F7/20

CPC classification number: H01L21/32139 ,  H01L21/0337 ,  H01L21/0338

Abstract: A method of forming a fine pattern of a semiconductor device using a fine pitch hard mask is provided. A first hard mask pattern including first line patterns formed on an etch target layer of a substrate with a first pitch is formed. A first layer including a top surface where a recess is formed between adjacent first line patterns is formed. A second hard mask pattern including second line patterns within the recess is formed. An anisotropic etching process is performed on the first layer using the first and the second line patterns as an etch mask. Another anisotropic etching process is performed on the etch target layer using the first and the second hard mask patterns as an etch mask.

Abstract translation: 提供了使用细间距硬掩模形成半导体器件的精细图案的方法。 形成包括形成在具有第一间距的基板的蚀刻目标层上的第一线图案的第一硬掩模图案。 形成包括在相邻的第一线图案之间形成有凹部的顶面的第一层。 形成包括凹部内的第二线图案的第二硬掩模图案。 使用第一和第二线图案作为蚀刻掩模在第一层上进行各向异性蚀刻处理。 使用第一和第二硬掩模图案作为蚀刻掩模在蚀刻目标层上执行另一种各向异性蚀刻工艺。