公开(公告)号：US20180008465A1

公开(公告)日：2018-01-11

申请号：US15543567

申请日：2015-09-08

申请人： Jin Young Park ,  Jin A Park ,  Ki Sung Park ,  In Kyung Park ,  Kee Cheol Park

发明人： Jin Young Park ,  Jin A Park ,  Ki Sung Park ,  In Kyung Park ,  Kee Cheol Park

IPC分类号： A61F9/008 ,  A61B3/10

摘要： A corneal ablation system for correcting vision by using a laser is provided. The corneal ablation system includes: an operation device for creating an integrated corneal ablation plan for correcting a shape and a curvature error of a cornea based on corneal status data; a laser control unit for controlling a laser module according to an ablation position and an ablation shape of the cornea based on the integrated corneal ablation plan transmitted from the operation device; and the laser module for generating a laser and transmitting the laser to an optical unit under control of the laser control unit.

公开(公告)号：US10596039B2

公开(公告)日：2020-03-24

申请号：US15543567

申请日：2015-09-08

申请人： Jin Young Park ,  Jin A. Park ,  Ki Sung Park ,  In Kyung Park ,  Kee Cheol Park

发明人： Jin Young Park ,  Jin A. Park ,  Ki Sung Park ,  In Kyung Park ,  Kee Cheol Park

IPC分类号： A61F9/008 ,  A61B3/10

摘要： A corneal ablation system for correcting vision by using a laser is provided. The corneal ablation system includes: an operation device for creating an integrated corneal ablation plan for correcting a shape and a curvature error of a cornea based on corneal status data; a laser control unit for controlling a laser module according to an ablation position and an ablation shape of the cornea based on the integrated corneal ablation plan transmitted from the operation device; and the laser module for generating a laser and transmitting the laser to an optical unit under control of the laser control unit.

公开(公告)号：US20110128011A1

公开(公告)日：2011-06-02

申请号：US12716948

申请日：2010-03-03

申请人： Seung Seoup LEE ,  Jae Cheon Doh ,  In Kyung Park

发明人： Seung Seoup LEE ,  Jae Cheon Doh ,  In Kyung Park

IPC分类号： G01R31/26 ,  G01R31/02

CPC分类号： G01R31/309

摘要： Disclosed herein is an apparatus and method for inspecting defects in a circuit pattern. In the inspection apparatus and method, a laser beam is radiated by a laser unit onto a first end of a circuit pattern, and variation in impedance of a capacitor sensor disposed at a second end of the circuit pattern is measured, thus measuring the open/short circuits of the circuit pattern.Accordingly, the inspection apparatus and method are advantageous in that defects in the circuit pattern can be measured in a non-contact manner, so that the consumption of pin probes can be reduced, and the reliability of the measurement of defects in the circuit pattern can be improved.

摘要翻译： 本文公开了一种用于检查电路图案中的缺陷的装置和方法。 在检查装置和方法中，通过激光单元将激光束照射到电路图案的第一端，并且测量设置在电路图案的第二端的电容器传感器的阻抗的变化，从而测量开路/ 电路图案短路。 因此，检查装置和方法的优点在于，可以以非接触的方式测量电路图案的缺陷，从而可以减少引脚探针的消耗，并且电路图案中的缺陷的测量的可靠性可以 要改进

公开(公告)号：US20110115516A1

公开(公告)日：2011-05-19

申请号：US12710937

申请日：2010-02-23

申请人： Seung Seoup Lee ,  Soon Gyu Yim ,  In Kyung Park

发明人： Seung Seoup Lee ,  Soon Gyu Yim ,  In Kyung Park

IPC分类号： G01R31/02

CPC分类号： G01R31/312

摘要： Disclosed herein is an apparatus and method for inspecting defects in the circuit pattern of a substrate. The apparatus for inspecting defects in a circuit pattern of a substrate includes a pin probe configured to input a voltage while coming into contact with an inspection target circuit pattern of a substrate. A capacitor sensor is provided with a membrane electrode which is opposite a connection circuit pattern to be electrically connected to the inspection target circuit pattern in a non-contact manner, and is configured to detect both capacitance and capacitance variation, generated due to displacement of the membrane electrode attributable to electrostatic attractive force acting from the connection circuit pattern on the membrane electrode. A capacitance measurement unit is connected to the capacitor sensor and is configured to measure capacitance attributable to the displacement of the membrane electrode, which is input from the capacitor sensor.

摘要翻译： 本文公开了一种用于检查衬底的电路图案中的缺陷的装置和方法。 用于检查基板的电路图案中的缺陷的装置包括：引脚探针，其被配置为在与基板的检查对象电路图案接触的同时输入电压。 电容器传感器设置有与非接触式电连接到检查对象电路图案的连接电路图案相对的膜电极，并且被配置为检测由于位移而产生的电容和电容变化 膜电极归因于从膜电极上的连接电路图案作用的静电吸引力。 电容测量单元连接到电容器传感器，并且被配置为测量归因于从电容器传感器输入的膜电极的位移的电容。

公开(公告)号：US08471581B2

公开(公告)日：2013-06-25

申请号：US12710937

申请日：2010-02-23

申请人： Seung Seoup Lee ,  Soon Gyu Yim ,  In Kyung Park

发明人： Seung Seoup Lee ,  Soon Gyu Yim ,  In Kyung Park

IPC分类号： G01R31/00

CPC分类号： G01R31/312

摘要： Disclosed herein is an apparatus and method for inspecting defects in the circuit pattern of a substrate. The apparatus for inspecting defects in a circuit pattern of a substrate includes a pin probe configured to input a voltage while coming into contact with an inspection target circuit pattern of a substrate. A capacitor sensor is provided with a membrane electrode which is opposite a connection circuit pattern to be electrically connected to the inspection target circuit pattern in a non-contact manner, and is configured to detect both capacitance and capacitance variation, generated due to displacement of the membrane electrode attributable to electrostatic attractive force acting from the connection circuit pattern on the membrane electrode. A capacitance measurement unit is connected to the capacitor sensor and is configured to measure capacitance attributable to the displacement of the membrane electrode, which is input from the capacitor sensor.

摘要翻译： 本文公开了一种用于检查衬底的电路图案中的缺陷的装置和方法。 用于检查基板的电路图案中的缺陷的装置包括：引脚探针，其被配置为在与基板的检查对象电路图案接触的同时输入电压。 电容器传感器设置有与非接触式电连接到检查对象电路图案的连接电路图案相对的膜电极，并且被配置为检测由于位移而产生的电容和电容变化 膜电极归因于从膜电极上的连接电路图案作用的静电吸引力。 电容测量单元连接到电容器传感器，并且被配置为测量归因于从电容器传感器输入的膜电极的位移的电容。

公开(公告)号：US08410465B2

公开(公告)日：2013-04-02

申请号：US12716948

申请日：2010-03-03

申请人： Seung Seoup Lee ,  Jae Cheon Doh ,  In Kyung Park

发明人： Seung Seoup Lee ,  Jae Cheon Doh ,  In Kyung Park

IPC分类号： G01N21/86

CPC分类号： G01R31/309

摘要： An apparatus for inspecting defects in a circuit pattern is described. The apparatus includes at least one laser unit for radiating a laser beam onto a first end of a circuit pattern formed on a substrate. The apparatus also includes a capacitor sensor disposed opposite a second end of the circuit pattern, which is connected to the first end of the circuit pattern through a via hole, in a non-contact manner. The apparatus also includes a voltage source connected to the capacitor sensor and configured to apply a voltage. The apparatus also includes a measurement unit connected to the capacitor sensor and configured to detect variation in impedance generated in the capacitor sensor.

摘要翻译： 描述了用于检查电路图案中的缺陷的装置。 该装置包括用于将激光束照射到形成在基板上的电路图案的第一端上的至少一个激光单元。 该装置还包括电容传感器，该电容器传感器与电路图案的第二端相对设置，其以非接触方式通过通孔连接到电路图案的第一端。 该装置还包括连接到电容器传感器并被配置为施加电压的电压源。 该装置还包括连接到电容器传感器并被配置为检测在电容器传感器中产生的阻抗变化的测量单元。