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    Method for accurate exposure of small dots on a heat-sensitive positive-working lithographic printing plate material
    2.
    发明授权
    Method for accurate exposure of small dots on a heat-sensitive positive-working lithographic printing plate material 有权
    在热敏正性平版印刷版材料上精确曝光小点的方法

    公开(公告)号：US07467587B2

    公开(公告)日：2008-12-23

    申请号：US11114210

    申请日：2005-04-21

    申请人： Joan Vermeersch ,  Wim Sap ,  Marc Van Damme

    发明人： Joan Vermeersch ,  Wim Sap ,  Marc Van Damme

    IPC分类号： B41C1/10 ,  B41M1/06 ,  G03F7/00

    CPC分类号： B41C1/1008 ,  B41C2210/02 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/262

    摘要： A method is disclosed for accurate reproduction of high-quality halftone images comprising microdots by means of lithographic plate materials which comprise a heat-sensitive positive-working coating that requires wet processing. Such microdots have a dot size ≦25 μm and may be obtained by stochastic screening or by amplitude-modulated screening at a ruling of not less than 150 lpi. It has been established that the “physical right exposure energy density” (physical REED) lies in the range from CP to 1.5*CP, wherein the physical REED is defined as the energy density at which the physical area on the plate, occupied by a microdot corresponding to a 50% halftone in the image data, coincides with the 50% target value; and wherein CP is the clearing point of the plate which is defined as the minimum energy density that is required to obtain, after processing, a dissolution of 95% of the coating. An accurate reproduction of microdots can therefore be achieved by exposing the material with light having an energy density in the range from CP to 1.5*CP. Loss of microdots by overexposure is thereby avoided.

    摘要翻译： 公开了一种用于通过平版印刷材料精确再现包含微点的高质量半色调图像的方法，该平版印刷材料包括需要湿法处理的热敏正性涂层。 这样的微点具有<25μm的点大小，并且可以通过随机筛选或通过幅度调制筛选获得，尺寸不小于150lpi。 已经确定的是，“身体右曝光能量密度”（物理REED）在CP到1.5 * CP的范围内，其中物理REED被定义为板上的物理区域的能量密度，由 在图像数据中对应于50％半色调的微点符合50％的目标值; 并且其中CP是板的清除点，其被定义为在加工后95％的涂层的溶解所需的最小能量密度。 因此，通过用能量密度在CP至1.5×CP范围内的光使材料曝光，可以实现微点的精确再现。 从而避免由于过度曝光导致的微点损失。

    Processless lithographic printing plate
    4.
    发明授权
    Processless lithographic printing plate 失效
    无处理平版印刷版

    公开(公告)号：US06790595B2

    公开(公告)日：2004-09-14

    申请号：US10002944

    申请日：2001-11-02

    申请人： Marc Van Damme ,  Wim Sap ,  Huub Van Aert

    发明人： Marc Van Damme ,  Wim Sap ,  Huub Van Aert

    IPC分类号： G03F711

    CPC分类号： B41C1/1041 ,  Y10S430/145 ,  Y10S430/146

    摘要： A negative-working heat-sensitive material for making a lithographic printing plate by direct-to-plate recording is disclosed. The material comprises in the order given a lithographic base having a hydrophilic surface, an oleophilic imaging layer and a cross-linked hydrophilic upper layer which comprises an organic compound derived from sulfonic acid, sulfuric acid, phosphoric acid or phosphonic acid. Materials according to the invention are characterized by an increased water-acceptance in the non-printing areas, which allows a rapid start-up of the press.

    摘要翻译： 公开了一种用于通过直接到板记录制造平版印刷版的负性热敏材料。 该材料按顺序给出具有亲水表面的光刻基底，亲油成像层和交联的亲水性上层，其包含衍生自磺酸，硫酸，磷酸或膦酸的有机化合物。 根据本发明的材料的特征在于在非印刷区域中增加的水接受性，这允许压机的快速启动。

    Processless lithographic printing plate
    5.
    发明授权
    Processless lithographic printing plate 失效

    公开(公告)号：US06620573B2

    公开(公告)日：2003-09-16

    申请号：US09993073

    申请日：2001-11-19

    申请人： Marc Van Damme ,  Wim Sap

    发明人： Marc Van Damme ,  Wim Sap

    IPC分类号： G03F7038

    CPC分类号： B41C1/1033 ,  Y10S430/145 ,  Y10S430/146

    摘要： A negative-working heat-sensitive material for making a lithographic printing plate by direct-to-plate recording is disclosed which comprises in the order given a lithographic base having a hydrophilic surface, an oleophilic imaging layer and a cross-linked hydrophilic upper layer, characterize in that the oleophilic imaging layer comprises at least one transition metal complex of an organic acid. Materials according to the invention are characterized by an increased run length and can be used as a printing plate immediately after exposure.

    Method for accurate exposure of small dots on a heat-sensitive positive-working lithographic plate material
    6.
    发明申请
    Method for accurate exposure of small dots on a heat-sensitive positive-working lithographic plate material 有权
    在热敏正性平版印刷版材料上精确曝光小点的方法

    公开(公告)号：US20050235854A1

    公开(公告)日：2005-10-27

    申请号：US11114210

    申请日：2005-04-21

    申请人： Joan Vermeersch ,  Wim Sap ,  Marc Damme

    发明人： Joan Vermeersch ,  Wim Sap ,  Marc Damme

    IPC分类号： B41C1/10

    CPC分类号： B41C1/1008 ,  B41C2210/02 ,  B41C2210/06 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/262

    摘要： A method is disclosed for accurate reproduction of high-quality halftone images comprising microdots by means of lithographic plate materials which comprise a heat-sensitive positive-working coating that requires wet processing. Such microdots have a dot size ≦25 μm and may be obtained by stochastic screening or by amplitude-modulated screening at a ruling of not less than 150 lpi. It has been established that the “physical right exposure energy density” (physical REED) lies in the range from CP to 1.5*CP, wherein the physical REED is defined as the energy density at which the physical area on the plate, occupied by a microdot corresponding to a 50% halftone in the image data, coincides with the 50% target value; and wherein CP is the clearing point of the plate which is defined as the minimum energy density that is required to obtain, after processing, a dissolution of 95% of the coating. An accurate reproduction of microdots can therefore be achieved by exposing the material with light having an energy density in the range from CP to 1.5*CP. Loss of microdots by overexposure is thereby avoided.

    摘要翻译： 公开了一种用于通过平版印刷材料精确再现包含微点的高质量半色调图像的方法，该平版印刷材料包括需要湿法处理的热敏正性涂层。 这样的微点具有<25μm的点大小，并且可以通过随机筛选或通过幅度调制筛选获得，尺寸不小于150lpi。 已经确定的是，“身体右曝光能量密度”（物理REED）在CP到1.5 * CP的范围内，其中物理REED被定义为板上物理区域由能量密度 在图像数据中对应于50％半色调的微点符合50％的目标值; 并且其中CP是板的清除点，其被定义为在加工后95％的涂层的溶解所需的最小能量密度。 因此，通过用能量密度在CP至1.5×CP范围内的光使材料曝光，可以实现微点的精确再现。 从而避免由于过度曝光导致的微点损失。