EXPOSING PRINTING PLATES USING LIGHT EMITTING DIODES
    3.
    发明申请
    EXPOSING PRINTING PLATES USING LIGHT EMITTING DIODES 审中-公开
    使用发光二极管曝光印版

    公开(公告)号:US20160214369A1

    公开(公告)日:2016-07-28

    申请号:US15088062

    申请日:2016-03-31

    发明人: Wolfgang Sievers

    IPC分类号: B41C1/10

    摘要: An apparatus comprises: (a) a rotatable drum configured to have a UV-curable printing plate with an ablatable layer thereon, placed thereon; (b) at least one laser beam to image the plate on the drum by ablating some of the ablatable layer according to image data to form an imaged plate; (c) an unloading area onto which a plate is movable when unloaded; and (d) a plurality of UV LEDs configured to apply UV radiation to the back of the UV-curable plate or to both the front and back of the UV-curable plate during or after the unloading of the imaged plate.

    摘要翻译: 一种装置包括:(a)可旋转的滚筒,其被配置成在其上放置有其上具有可烧蚀层的UV固化印刷板; (b)至少一个激光束,以通过根据图像数据烧蚀一些可烧蚀层来成像所述滚筒上的板以形成成像板; (c)卸载区域,卸载时板可以移动; 以及(d)多个UV LED,其被配置为在所述成像板的卸载期间或之后将紫外线辐射施加到所述UV可固化板的背面或者UV可固化板的前后。

    Exposing printing plates using light emitting diodes
    4.
    发明授权
    Exposing printing plates using light emitting diodes 有权
    露出使用发光二极管的印版

    公开(公告)号:US09315009B2

    公开(公告)日:2016-04-19

    申请号:US13770974

    申请日:2013-02-19

    发明人: Wolfgang Sievers

    摘要: An apparatus comprises: (a) a rotatable drum configured to have a UV-curable printing plate with an ablatable layer thereon, placed thereon; (b) at least one laser beam to image the plate on the drum by ablating some of the ablatable layer according to image data to form an imaged plate; (c) an unloading area onto which a plate is movable when unloaded; and (d) a plurality of UV LEDs configured to cure UV-curable material on at least an imaged portion of the plate during the imaging process, such that imaging of one part of the plate and curing of an imaged portion of the plate occur simultaneously. In another embodiment, the plurality of LEDs are to apply UV radiation to the back of the UV-curable plate or to both the front and back of the UV-curable plate during or after the unloading of the imaged plate.

    摘要翻译: 一种装置包括:(a)可旋转的滚筒,其被配置成在其上放置有其上具有可烧蚀层的UV固化印刷板; (b)至少一个激光束,以通过根据图像数据烧蚀一些可烧蚀层来成像所述滚筒上的板以形成成像板; (c)卸载区域,卸载时板可以移动; 和(d)多个UV LED,其被配置为在成像过程期间在至少成像部分上固化可UV固化材料,使得板的一部分成像和板的成像部分的固化同时发生 。 在另一个实施例中,多个LED将在UV成像板的卸载期间或之后施加UV辐射到UV​​可固化板的背面或UV可固化板的前后。

    System for direct application of dampening fluid for a variable data lithographic apparatus
    5.
    发明授权
    System for direct application of dampening fluid for a variable data lithographic apparatus 有权
    用于可变数据光刻设备的润版液的直接应用系统

    公开(公告)号:US08991310B2

    公开(公告)日:2015-03-31

    申请号:US13204548

    申请日:2011-08-05

    摘要: A system and corresponding methods are disclosed for applying a dampening fluid to a reimageable surface of an imaging member in a variable data lithography system, without a form roller. In one embodiment, the system includes subsystems for converting a dampening fluid from a liquid phase to a dispersed fluid phase, and for directing flow of a dispersed fluid comprising the dampening fluid in dispersed fluid phase to the reimageable surface. The dampening fluid reverts to the liquid phase directly on the reimageable surface. In another embodiment a continuous ribbon of dampening fluid may be applied directly to the reimageable surface. This embodiment includes a body structure having a port for delivering dampening fluid in a continuous fluid ribbon directly to the reimageable surface, and a mechanism, associated with the body structure, for stripping an entrained air layer over the reimageable surface when the reimageable surface is in motion.

    摘要翻译: 公开了一种用于将润版流体施加到可变数据光刻系统中的成像构件的可再成像表面的系统和相应方法,而没有成形辊。 在一个实施例中,该系统包括用于将润湿流体从液相转化为分散流体相的子系统,并且用于将包含分散流体相的润版液的分散流体的流动引导到可再成像的表面。 阻尼流体直接在可再成像的表面上回流到液相。 在另一个实施例中,连续的润版液体带可以直接施加到可再成像的表面。 该实施例包括具有端口的主体结构,该端口用于将连续流体带中的阻尼流体直接传送到可再成像的表面,以及与主体结构相关联的机构,用于当可再成像的表面处于可再成像的表面时,将夹带的空气层剥离在可再成像的表面上 运动。

    Evaporative systems and methods for dampening fluid control in a digital lithographic system
    7.
    发明授权
    Evaporative systems and methods for dampening fluid control in a digital lithographic system 有权
    用于抑制数字光刻系统中流体控制的蒸发系统和方法

    公开(公告)号:US08950322B2

    公开(公告)日:2015-02-10

    申请号:US13426209

    申请日:2012-03-21

    IPC分类号: B41F7/24 B41N3/08

    摘要: A system and corresponding methods are disclosed for controlling the thickness of a layer of dampening fluid applied to a reimageable surface of an imaging member in a variable data lithography system. Following deposition of the dampening fluid layer, a gas is passed over a region of the fluid layer prior to pattern forming. The gas causes a controlled amount of the dampening fluid layer to evaporate such that the remaining layer is of a desired and controlled thickness. Among other advantages, improved print quality is obtained.

    摘要翻译: 公开了一种用于控制在可变数据光刻系统中施加到成像构件的可再成像表面的阻尼流体层的厚度的系统和相应方法。 在沉积润湿流体层之后,在图案形成之前气体通过流体层的区域。 气体导致受控量的阻尼流体层蒸发,使得剩余的层具有期望和受控的厚度。 除了其他优点之外,还获得了改进的打印质量。