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公开(公告)号:US08610878B2
公开(公告)日:2013-12-17
申请号:US12966448
申请日:2010-12-13
申请人: Johannes Jacobus Matheus Baselmans , Francis Fahrni , Gerardus Johannes Joseph Keijsers , Heine Melle Mulder , Willem Richard Pongers , Joost Cyrillus Lambert Hageman , Mattheus Johannes Van Bruggen , Johannes Franciscus Roosekrans , David James Butler , Patrick Marcel Maria Thomassen , Gabriela Vesselinova Paeva
发明人: Johannes Jacobus Matheus Baselmans , Francis Fahrni , Gerardus Johannes Joseph Keijsers , Heine Melle Mulder , Willem Richard Pongers , Joost Cyrillus Lambert Hageman , Mattheus Johannes Van Bruggen , Johannes Franciscus Roosekrans , David James Butler , Patrick Marcel Maria Thomassen , Gabriela Vesselinova Paeva
CPC分类号: G03B27/54 , G03F7/70066 , G03F7/70208
摘要: A lithographic apparatus includes an illumination system configured to provide a first beam of radiation, which forms a first mask illumination region, and configured to substantially simultaneously provide a second beam of radiation, which forms a second mask illumination region. The first and second illumination regions being configured to substantially simultaneously illuminate a same mask. The lithographic apparatus also includes a projection system configured to project the first radiation beam such that it forms a first substrate illumination region and configured to simultaneously project the second radiation beam such that it forms a second substrate illumination region.
摘要翻译: 光刻设备包括被配置为提供第一辐射束的照明系统,其形成第一掩模照射区域,并且被配置为基本上同时提供第二辐射束,其形成第二掩模照射区域。 第一和第二照明区域被配置为基本上同时照射相同的掩模。 光刻设备还包括投影系统,该投影系统配置成投射第一辐射束,使得其形成第一基板照明区域并且被配置为同时投射第二辐射束,使得其形成第二基板照明区域。
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公开(公告)号:US20110216297A1
公开(公告)日:2011-09-08
申请号:US12966448
申请日:2010-12-13
申请人: Johannes Jacobus Matheus BASELMANS , Francis Fahrni , Gerardus Johannes Joseph Keijsers , Heine Melle Mulder , Willem Richard Pongers , Joost Cyrillus Lambert Hageman , Mattheus Johannes Van Bruggen , Johannes Franciscus Roosekrans , David James Butler , Patrick Marcel Maria Thomassen , Gabriela Vesselinova Paeva
发明人: Johannes Jacobus Matheus BASELMANS , Francis Fahrni , Gerardus Johannes Joseph Keijsers , Heine Melle Mulder , Willem Richard Pongers , Joost Cyrillus Lambert Hageman , Mattheus Johannes Van Bruggen , Johannes Franciscus Roosekrans , David James Butler , Patrick Marcel Maria Thomassen , Gabriela Vesselinova Paeva
IPC分类号: G03B27/54
CPC分类号: G03B27/54 , G03F7/70066 , G03F7/70208
摘要: A lithographic apparatus includes an illumination system configured to provide a first beam of radiation, which forms a first mask illumination region, and configured to substantially simultaneously provide a second beam of radiation, which forms a second mask illumination region. The first and second illumination regions being configured to substantially simultaneously illuminate a same mask. The lithographic apparatus also includes a projection system configured to project the first radiation beam such that it forms a first substrate illumination region and configured to simultaneously project the second radiation beam such that it forms a second substrate illumination region.
摘要翻译: 光刻设备包括被配置为提供第一辐射束的照明系统,其形成第一掩模照射区域,并且被配置为基本上同时提供第二辐射束,其形成第二掩模照射区域。 第一和第二照明区域被配置为基本上同时照射相同的掩模。 光刻设备还包括投影系统,该投影系统配置成投射第一辐射束,使得其形成第一基板照明区域并且被配置为同时投射第二辐射束,使得其形成第二基板照明区域。
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