Thin-film transistor, method of manufacturing the same, and display device

    公开(公告)号:US10763371B2

    公开(公告)日:2020-09-01

    申请号:US15813735

    申请日:2017-11-15

    Applicant: Joled Inc.

    Abstract: A thin film transistor is provided. The thin film transistor includes an oxide semiconductor layer including a source region, a drain region, and a channel region wherein a portion of the source and drain regions has an oxygen concentration less than the channel region. Further provided is a thin film transistor that includes an oxide semiconductor layer including a source region, a drain region, and a channel region, wherein a portion of the source and drain regions includes a dopant selected from the group consisting of aluminum, boron, gallium, indium, titanium, silicon, germanium, tin, lead, and combinations thereof.

    THIN-FILM TRANSISTOR, METHOD OF MANUFACTURING THE SAME, AND DISPLAY DEVICE

    公开(公告)号:US20180076330A1

    公开(公告)日:2018-03-15

    申请号:US15813735

    申请日:2017-11-15

    Applicant: Joled Inc.

    Abstract: A thin film transistor is provided. The thin film transistor includes an oxide semiconductor layer including a source region, a drain region, and a channel region wherein a portion of the source and drain regions has an oxygen concentration less than the channel region. Further provided is a thin film transistor that includes an oxide semiconductor layer including a source region, a drain region, and a channel region, wherein a portion of the source and drain regions includes a dopant selected from the group consisting of aluminum, boron, gallium, indium, titanium, silicon, germanium, tin, lead, and combinations thereof.

    Thin film transistor and display device
    5.
    发明授权
    Thin film transistor and display device 有权
    薄膜晶体管和显示装置

    公开(公告)号:US09178072B2

    公开(公告)日:2015-11-03

    申请号:US13665487

    申请日:2012-10-31

    Applicant: JOLED INC.

    Abstract: Provided is a thin film transistor capable of improving reliability in the thin film transistor including an oxide semiconductor layer. A thin film transistor including: a gate electrode; a gate insulating film formed on the gate electrode; an oxide semiconductor layer forming a channel region corresponding to the gate electrode on the gate insulating film; a channel protective film formed at least in a region corresponding to the channel region on the oxide semiconductor layer; and a source/drain electrode. A top face and a side face of the oxide semiconductor layer are covered with the source/drain electrode and the channel protective layer on the gate insulating film.

    Abstract translation: 提供了能够提高包括氧化物半导体层的薄膜晶体管的可靠性的薄膜晶体管。 一种薄膜晶体管,包括:栅电极; 形成在栅电极上的栅极绝缘膜; 形成与所述栅极绝缘膜上的所述栅电极对应的沟道区域的氧化物半导体层; 至少形成在与氧化物半导体层上的沟道区对应的区域中的沟道保护膜; 和源/漏电极。 氧化物半导体层的顶面和侧面被栅极绝缘膜上的源极/漏极电极和沟道保护层覆盖。

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