公开(公告)号：US20100078274A1

公开(公告)日：2010-04-01

申请号：US12562548

申请日：2009-09-18

申请人： Jonathan Leslie Christopher Jackson ,  Brendan Wilde ,  Martin Pors Taylor ,  Ralf Leiter ,  Paul Roberts ,  Gareth L. Shaw ,  Richard Edgar Thompson ,  Paul Bell ,  John D. Fieldhouse ,  Gareth L. Knox ,  Refaat A. El Malki

发明人： Jonathan Leslie Christopher Jackson ,  Brendan Wilde ,  Martin Pors Taylor ,  Ralf Leiter ,  Paul Roberts ,  Gareth L. Shaw ,  Richard Edgar Thompson ,  Paul Bell ,  John D. Fieldhouse ,  Gareth L. Knox ,  Refaat A. El Malki

IPC分类号： F16D65/21 ,  B60L7/00

CPC分类号： B60T17/083 ,  B60T13/04 ,  B60T13/743 ,  F16D65/28 ,  F16D2121/02 ,  F16D2121/12 ,  F16D2121/20 ,  F16D2123/00 ,  F16D2127/06 ,  F16D2129/10

摘要： A parking brake mechanism for an air-actuated disc brake includes an electrically powered actuator, an extensible device drivably connected to the electrically powered actuator and able to extend and retract and be held in place in an extended position to thereby apply a brake, and a resilient device arranged to act on the extensible device and maintain a desired level of force to be applied by the parking brake mechanism in the event of contraction of brake components due to cooling.

摘要翻译： 用于空气驱动的盘式制动器的驻车制动机构包括电动致动器，可驱动地连接到电动致动器并且能够延伸和缩回并且在延伸位置中保持就位的可伸展装置，从而施加制动器， 弹性装置布置成作用在可延伸装置上并且在由于冷却而在制动部件收缩的情况下保持由驻车制动机构施加的期望水平的力。

公开(公告)号：US4592132A

公开(公告)日：1986-06-03

申请号：US679506

申请日：1984-12-07

申请人： William W. Y. Lee ,  Gareth L. Shaw ,  James W. Clayton, deceased ,  Denise Bachino, administrator

发明人： William W. Y. Lee ,  Gareth L. Shaw ,  James W. Clayton, deceased ,  Denise Bachino, administrator

IPC分类号： H01L21/3213 ,  H01L21/768 ,  H01L23/528 ,  H01L21/47

CPC分类号： H01L21/76801 ,  H01L21/76826 ,  H01L23/5283 ,  H01L2924/0002

摘要： Inter-layer electrical shorting between layers of conductors of an integrated circuit caused by "hillocks" in the bottom layer is prevented by the use of a double layer photoresist coatings atop the insulating layer that separates the metal layers. The double layer photoresist insures that irregularities in the dielectric layer caused by hillocks in the underlying insulating layer do not cause a break in the photoresist and a subsequent undesired etching of a spurious "via" through the dielectric layer.

摘要翻译： 通过使用分离金属层的绝缘层上方的双层光致抗蚀剂涂层来防止在底层中由“小丘”引起的集成电路导体层之间的层间电短路。 双层光致抗蚀剂确保由下层绝缘层中的小丘引起的介电层中的不规则性不会导致光致抗蚀剂中断，并且随后不期望地蚀刻通过介电层的杂散“通孔”。