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    Nonaqueous Electrolyte for Battery
    1.
    发明申请
    Nonaqueous Electrolyte for Battery 审中-公开
    电池非水电解液

    公开(公告)号：US20090226820A1

    公开(公告)日：2009-09-10

    申请号：US11718031

    申请日：2004-10-27

    申请人： Jong Ho Jeon ,  Ho Seok Yang ,  Jung Kang Oh ,  Hak Soo Kim ,  Jong Seob Kim

    发明人： Jong Ho Jeon ,  Ho Seok Yang ,  Jung Kang Oh ,  Hak Soo Kim ,  Jong Seob Kim

    IPC分类号： H01M6/16

    CPC分类号： H01M10/4235 ,  H01M10/052 ,  H01M10/0567 ,  H01M10/0569 ,  H01M2300/0025

    摘要： The present invention relates to a nonaqueous electrolyte for a battery, and more particularly to a novel nonaqueous electrolyte for a battery in which a furanone based derivative is added to a conventional nonaqueous electrolyte for the lithium battery to inhibit decomposition of the electrolyte, and thereby the rate of increase of the battery thickness when it is allowed to stand at a high temperature is significantly decreased and capacity storage characteristics at high temperature are improved.

    摘要翻译： 本发明涉及一种电池用非水电解质，更具体地说，涉及一种新型的电池用非水电解质，其中，将呋喃酮系衍生物添加到用于锂电池的常规非水电解质中以抑制电解质的分解，由此， 当高温放置时电池厚度的增加率显着降低，高温下的容量存储特性提高。

    Nonaqueous electrolyte including Diphenyl ether and lithium secondary battery using thereof
    2.
    发明申请
    Nonaqueous electrolyte including Diphenyl ether and lithium secondary battery using thereof 审中-公开
    包括使用二苯醚和锂二次电池的非水电解质

    公开(公告)号：US20090023075A1

    公开(公告)日：2009-01-22

    申请号：US12216691

    申请日：2008-07-09

    申请人： Jung Kang Oh ,  Young Jai Cho ,  Jeong Min Lee ,  Hak Soo Kim ,  Ho Seok Yang

    发明人： Jung Kang Oh ,  Young Jai Cho ,  Jeong Min Lee ,  Hak Soo Kim ,  Ho Seok Yang

    IPC分类号： H01M6/16 ,  H01G9/022 ,  H02J7/00

    CPC分类号： H01M10/0567 ,  H01M10/052 ,  H01M10/0569 ,  H01M10/4235

    摘要： A non-aqueous electrolyte for a lithium secondary battery includes a lithium salt, a basic organic solvent including a carbonate-based solvent, and a halogenated diphenyl ether compound represented by Formula 1: wherein Y is —O— or —R1—OR2—, where R1 and R2 are the same or different, and R1 and R2 are a C1-C5 alkyl group, an alkenyl group, or an alkoxy group, and only one of the phenyl rings is substituted with a halogen X1, where n is equal to 1, 2, 3, or 4 and the halogens in di-, tri-, and tetra-halogen substitutions are the same or different.

    摘要翻译： 用于锂二次电池的非水电解质包括锂盐，含有碳酸酯类溶剂的碱性有机溶剂和由式1表示的卤代二苯醚化合物：其中Y是-O-或-R1-OR2-， 其中R1和R2相同或不同，R1和R2是C1-C5烷基，烯基或烷氧基，只有一个苯环被卤素X1取代，其中n等于 1,2,3或4，二 - ，三 - 和四 - 卤代替中的卤素相同或不同。

    Wet etching solution
    6.
    发明授权
    Wet etching solution 有权
    湿蚀刻溶液

    公开(公告)号：US08043525B2

    公开(公告)日：2011-10-25

    申请号：US11892076

    申请日：2007-08-20

    申请人： Jung In La ,  Myung Kook Park ,  Ho Seok Yang

    发明人： Jung In La ,  Myung Kook Park ,  Ho Seok Yang

    IPC分类号： C09K13/00

    CPC分类号： C03C15/00 ,  C09K13/08 ,  H01L21/31111

    摘要： A wet etching solution includes hydrogen fluoride in an amount of about 0.1% to about 3% by weight of the etching solution, an inorganic acid in an amount of about 10% to about 40% by weight of the etching solution, the inorganic acid being one or more of nitric acid, sulfuric acid, and/or hydrochloric acid, a surfactant in an amount of about 0.0001% to about 5% by weight of the etching solution, the nonionic surfactant including one or more of alkylphenol ethoxylate and/or ammonium lauryl sulfate, and water.

    摘要翻译： 湿式蚀刻溶液包括以蚀刻溶液重量计约0.1％至约3％的量的氟化氢，蚀刻溶液的约10重量％至约40重量％的无机酸，无机酸为 硝酸，硫酸和/或盐酸中的一种或多种，​​表面活性剂的量为蚀刻溶液重量的约0.0001％至约5％，非离子表面活性剂包括一种或多种烷基酚乙氧基化物和/或铵 月桂基硫酸盐和水。

    Wet etching solution
    7.
    发明申请
    Wet etching solution 有权
    湿蚀刻溶液

    公开(公告)号：US20080041823A1

    公开(公告)日：2008-02-21

    申请号：US11892076

    申请日：2007-08-20

    申请人： Jung In La ,  Myung Kook Park ,  Ho Seok Yang

    发明人： Jung In La ,  Myung Kook Park ,  Ho Seok Yang

    IPC分类号： C09K13/08 ,  C03C15/00

    CPC分类号： C03C15/00 ,  C09K13/08 ,  H01L21/31111

    摘要： A wet etching solution includes hydrogen fluoride in an amount of about 0.1% to about 3% by weight of the etching solution, an inorganic acid in an amount of about 10% to about 40% by weight of the etching solution, the inorganic acid being one or more of nitric acid, sulfuric acid, and/or hydrochloric acid, a nonionic surfactant in an amount of about 0.0001% to about 5% by weight of the etching solution, the nonionic surfactant including one or ore of alkylphenol ethoxylate and/or ammonium lauryl sulfate, and water.

    摘要翻译： 湿式蚀刻溶液包括以蚀刻溶液重量计约0.1％至约3％的量的氟化氢，蚀刻溶液的约10重量％至约40重量％的无机酸，无机酸为 一种或多种硝酸，硫酸和/或盐酸，非离子表面活性剂，其量为蚀刻溶液重量的约0.0001％至约5％，非离子表面活性剂包括一种或多种烷基酚乙氧基化物和/或 月桂基硫酸铵和水。