公开(公告)号：US06850676B2

公开(公告)日：2005-02-01

申请号：US10193433

申请日：2002-07-11

Applicant: Jong-Youl Kim ,  Seung-Jin Baek ,  Jae-Wan Kim

Inventor： Jong-Youl Kim ,  Seung-Jin Baek ,  Jae-Wan Kim

IPC: G02B6/24 ,  G02B6/12 ,  G02B6/30 ,  G02B6/36 ,  G03F1/00 ,  G03F1/70 ,  G02B6/00 ,  G03F9/00

CPC classification number: G02B6/3636 ,  G02B6/3652 ,  G02B6/3692 ,  G03F1/38 ,  G03F1/80

Abstract: A photomask is disclosed for the fabrication of an optical fiber block including a first section provided with slit arrays adapted to form an optical fiber alignment region of the optical fiber block while having a uniform slit pitch, partition portions arranged between adjacent ones of the slit arrays while having a pitch larger than the slit pitch, and end portions arranged outside the slit arrays while having a pitch larger than the slit pitch. The photomask also includes a second section adapted to form a stress-reducing recessed region of the optical fiber block etched to a desired depth from the level of the optical fiber alignment region. The photomask also includes auxiliary slit arrays arranged at an interface between the first and second sections. The auxiliary slit array includes at least one slit.

Abstract translation: 公开了一种用于制造光纤块的光掩模，该光纤块包括：第一部分，其设置有狭缝阵列，该狭缝阵列适于形成光纤块的光纤对准区域，同时具有均匀的狭缝间距;分隔部分布置在相邻的狭缝阵列之间 同时具有大于狭缝间距的间距，以及设置在狭缝阵列外侧的端部，同时具有大于狭缝间距的间距。 光掩模还包括第二部分，其适于形成从光纤对准区域的水平面蚀刻到期望深度的光纤块的应力减小凹陷区域。 光掩模还包括布置在第一和第二部分之间的界面处的辅助狭缝阵列。 辅助狭缝阵列包括至少一个狭缝。

公开(公告)号：US06859588B2

公开(公告)日：2005-02-22

申请号：US10074528

申请日：2002-02-12

Applicant: Hyun-Ki Kim ,  Moon-Koog Song ,  Jae-Wan Kim ,  Jong-Youl Kim

Inventor： Hyun-Ki Kim ,  Moon-Koog Song ,  Jae-Wan Kim ,  Jong-Youl Kim

IPC: G02B6/24 ,  G02B6/30 ,  G02B6/34 ,  G02B6/36 ,  G02B6/40

CPC classification number: G02B6/3636 ,  G02B6/30 ,  G02B6/3652

Abstract: This invention provides an optical fiber block that includes an optical-fiber-alignment portion and a stress-reduction-depth portion. In the optical-fiber-alignment portion, a V groove array is arranged to accommodate the non-coated fiber portion of a ribbon fiber. The V groove array is formed by primary and secondary wet-etching processes on a silicon wafer, and further includes first V grooves at both sides and second V grooves different from the first V grooves disposed between the first V grooves. Meanwhile, the stress-reduction-depth portion is formed by another wet etching, extending to a predetermined depth from the optical-fiber-alignment portion, for reducing stress caused by a variation in the coating thickness of the optical fibers.

Abstract translation: 本发明提供一种光纤块，其包括光纤对准部和应力减少深度部。 在光纤取向部中，配置V槽阵列以容纳带状光纤的未涂覆光纤部分。 V沟槽阵列通过在硅晶片上的初级和次级湿蚀刻工艺形成，并且还包括两侧的第一V槽和与设置在第一V槽之间的第一V槽不同的第二V槽。 同时，通过另一湿法蚀刻形成应力减小深度部分，从光纤取向部延伸至预定深度，以减少由于光纤的涂层厚度变化引起的应力。