Automatic wafer edge inspection and review system
    1.
    发明授权
    Automatic wafer edge inspection and review system 失效
    自动晶圆边缘检查和审查系统

    公开(公告)号:US07508504B2

    公开(公告)日:2009-03-24

    申请号:US11891657

    申请日:2007-08-09

    IPC分类号: G01N21/00

    CPC分类号: G01N21/4738 G01N21/9503

    摘要: A substrate illumination and inspection system provides for illuminating and inspecting a substrate particularly the substrate edge. The system uses a light diffuser with a plurality of lights disposed at its exterior or interior for providing uniform diffuse illumination of a substrate. An optic and imaging system exterior of the light diffuser are used to inspect the plurality of surfaces of the substrate including specular surfaces. The optic can be rotated radially relative to a center point of the substrate edge to allow for focused inspection of all surfaces of the substrate edge.

    摘要翻译: 衬底照明和检查系统提供用于照明和检查衬底,特别是衬底边缘。 该系统使用具有设置在其外部或内部的多个光的光漫射器,用于提供衬底的均匀漫射照明。 光扩散器的光学和成像系统外部用于检查包括镜面的基板的多个表面。 光学元件可以相对于基板边缘的中心点径向旋转,以允许对基板边缘的所有表面进行聚焦检查。