公开(公告)号：US20080305410A1

公开(公告)日：2008-12-11

申请号：US12030959

申请日：2008-02-14

Applicant: Jung-Mok BAE

Inventor： Jung-Mok BAE

IPC: G03F1/00

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

Abstract: An imprinting device includes a first substrate, a light blocking layer formed on the first substrate corresponding to a light blocking area, and a patterned layer formed on the first substrate. The patterned layer includes an etch pattern and a flow control pattern formed on the first substrate corresponding to a transmittance area and the light blocking area, respectively. When the patterned layer presses a resin layer, the resin layer pressed by the etch pattern moves towards the flow control pattern or a photosensitive resin layer pressed by the flow control pattern moves towards the etch pattern according to a shape of the flow control pattern. Thus, when the shape of the flow control pattern is controlled, the resin layer pressed by the patterned layer may be formed with a uniform thickness.

Abstract translation: 压印装置包括第一基板，形成在对应于遮光区域的第一基板上的遮光层和形成在第一基板上的图案层。 图案化层包括分别在对应于透射区域和遮光区域的第一基板上形成的蚀刻图案和流动控制图案。 当图案化层按压树脂层时，被蚀刻图案按压的树脂层朝向流动控制图案移动，或者由流动控制图案按压的感光性树脂层根据流动控制图案的形状向蚀刻图案移动。 因此，当控制流动控制图案的形状时，由图案化层压制的树脂层可以形成均匀的厚度。

公开(公告)号：US20080268378A1

公开(公告)日：2008-10-30

申请号：US12034983

申请日：2008-02-21

Applicant: Jung-Mok BAE

Inventor： Jung-Mok BAE

IPC: G03F1/14 ,  B29D11/00

CPC classification number: G02B3/0012 ,  B23K26/066 ,  B23K26/40 ,  B23K2103/172 ,  B23K2103/30 ,  B23K2103/50 ,  Y10S430/146

Abstract: A method for manufacturing a lens forming master includes coating an organic insulation material on a substrate to form an organic insulation layer, removing a portion of the organic insulation layer with a laser which is irradiated through a first mask to form a lens shape on a surface of the organic insulation layer, and removing portions of the organic insulation layer with a laser irradiated through a second mask to form a contact hole and a bank area in the organic insulation layer.

Abstract translation: 用于制造透镜成形主体的方法包括在基板上涂覆有机绝缘材料以形成有机绝缘层，用激光照射部分有机绝缘层，通过第一掩模照射以在表面上形成透镜形状 的有机绝缘层，并且通过用第二掩模照射的激光去除有机绝缘层的部分，以在有机绝缘层中形成接触孔和堤岸区域。

公开(公告)号：US20080265447A1

公开(公告)日：2008-10-30

申请号：US12034800

申请日：2008-02-21

Applicant: Jung-Mok BAE

Inventor： Jung-Mok BAE

IPC: B29C43/02

CPC classification number: B29C43/021 ,  B29C37/0053 ,  B29C43/06 ,  B29C43/18 ,  B29C43/3697 ,  B29C2035/0827 ,  B29C2043/3488 ,  B29C2043/3652 ,  B29K2105/0002 ,  B29L2011/0016 ,  B29L2031/3475 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F9/7042 ,  G03F9/7053

Abstract: A method of imprinting patterns, which is capable of enhancing the arrangement accuracy of a mold. The method includes spreading a resin on a substrate, temporarily compressing a mold toward the substrate having the resin spread thereon, moving the mold and the substrate relative to each other to arrange the mold and the substrate with respect to each other, compressing the mold toward the substrate, and curing the resin

Abstract translation: 一种压印图案的方法，其能够提高模具的布置精度。 该方法包括将树脂铺展在基板上，将模具暂时压向具有树脂铺展在其上的基板上，相对于彼此移动模具和基板，以使模具和基板彼此相对布置，将模具压缩 基板，并固化树脂