摘要:
An magnetic resonance imaging (MRI) device includes at least one amplifier, a control module which controls an operating module of the at least one amplifier, a back-up control module, a determination unit for determining whether the control module is operating normally, and a switching module for performing a switching operation to switch operations of the control module to the at least one back-up control module in the event of abnormal operation of the control module.
摘要:
A bit rate control method may include calculating a quality measure of a current frame and a mean of quality measures of two or more previous frames in order to calculate a deviation of the quality measure of the current frame from the mean of the quality measures of the two or more previous frames; comparing the deviation to a critical value measure; and controlling a quantization parameter in response to a result of the comparison. A bit rate control apparatus may include a quality measure calculator that calculates the quality measure of the current frame and the mean of the quality measures of the two or more previous frames in order to calculate the deviation; a comparator that compares the deviation to the critical value measure; and a quantization parameter setting unit that controls the quantization parameter in response to the result of the comparison.
摘要:
A method of manufacturing a wire grid device is provided. The method includes: forming SAM (self assembly monomer) nano patterns on a substrate; and forming a wire grid between neighboring SAM nano patterns on the substrate on which the SAM nano patterns are formed by using an electroless plating technique or forming the wire grid on the SAM nano patterns on the SAM nano patterns by using the SAM nano patterns as a seed layer by using the electroless plating technique.
摘要:
A photomask having small pitch images of openings for fabricating an opening of a semiconductor memory device includes a plurality of images of openings arranged in a row direction with a predetermined pitch to be used to transfer the images of openings onto a photoresist layer, and is used for a photolithographic process employing a photoresist flow process. The distance between the centers of the images of openings arranged in the photomask is larger than the pitch. A photolithographic method for fabricating reduced size openings and a semiconductor memory device having openings fabricated using the same method is also provided.
摘要:
A bit rate control method may include calculating a quality measure of a current frame and a mean of quality measures of two or more previous frames in order to calculate a deviation of the quality measure of the current frame from the mean of the quality measures of the two or more previous frames; comparing the deviation to a critical value measure; and controlling a quantization parameter in response to a result of the comparison. A bit rate control apparatus may include a quality measure calculator that calculates the quality measure of the current frame and the mean of the quality measures of the two or more previous frames in order to calculate the deviation; a comparator that compares the deviation to the critical value measure; and a quantization parameter setting unit that controls the quantization parameter in response to the result of the comparison.