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公开(公告)号:US20080295662A1
公开(公告)日:2008-12-04
申请号:US11935195
申请日:2007-11-05
申请人: Jurgen Dopping , Matthias Reinecke , Holger Brosche , Hans-Joachim Gretzschel , Steffen Pollack
发明人: Jurgen Dopping , Matthias Reinecke , Holger Brosche , Hans-Joachim Gretzschel , Steffen Pollack
IPC分类号: B26D7/06
CPC分类号: B28D5/0082 , Y10T83/2092
摘要: The invention relates to a device for catching a plurality of slices to be detached from a holding element, having a frame, a holder, attached to the frame, for accommodating the holding element holding the slices, at least two guiding elements on the sides and at least one bottom catching element, the guiding elements on the sides each being arranged on the frame in pairs on the right and the left.
摘要翻译: 本发明涉及一种用于捕捉要从保持元件分离的多个切片的装置,具有框架,附接到框架的保持器,用于容纳保持切片的保持元件,在侧面上具有至少两个引导元件,以及 至少一个底部捕获元件,侧面上的引导元件各自在右侧和左侧成对地布置在框架上。
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公开(公告)号:US20080105247A1
公开(公告)日:2008-05-08
申请号:US11935269
申请日:2007-11-05
申请人: Jurgen Dopping , Matthias Reinecke , Holger Brosche , Hans-Joachim Gretzschel , Steffen Pollack
发明人: Jurgen Dopping , Matthias Reinecke , Holger Brosche , Hans-Joachim Gretzschel , Steffen Pollack
IPC分类号: B28D1/06
CPC分类号: B28D5/0082 , B28D5/04 , H01L21/67313
摘要: The invention relates to a device for manufacturing semiconductor material wafers with a sawing device for the sawing of slices attached to a saw holder, a pre-cleaning device arranged in the process direction downstream of the sawing device for pre-cleaning the surfaces of the slices hanging on the saw holder, and a degluing device arranged downstream in the process direction for detaching the slices from the saw holder.
摘要翻译: 本发明涉及一种用于制造半导体材料晶片的装置,其具有锯切装置,用于锯切安装在锯保持器上的切片,预清洁装置沿锯切装置的下游方向布置,用于预清洁切片表面 悬挂在锯架上,以及脱模装置,其沿着处理方向布置在下游,以将切片从锯保持器上分离。
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公开(公告)号:US08201814B2
公开(公告)日:2012-06-19
申请号:US11935195
申请日:2007-11-05
申请人: Jürgen Döpping , Matthias Reinecke , Holger Brosche , Hans-Joachim Gretzschel , Steffen Pollack
发明人: Jürgen Döpping , Matthias Reinecke , Holger Brosche , Hans-Joachim Gretzschel , Steffen Pollack
IPC分类号: B23Q3/00
CPC分类号: B28D5/0082 , Y10T83/2092
摘要: The invention relates to a device for catching a plurality of slices to be detached from a holding element, having a frame, a holder, attached to the frame, for accommodating the holding element holding the slices, at least two guiding elements on the sides and at least one bottom catching element, the guiding elements on the sides each being arranged on the frame in pairs on the right and the left.
摘要翻译: 本发明涉及一种用于捕捉要从保持元件分离的多个切片的装置,具有框架,附接到框架的保持器,用于容纳保持切片的保持元件,在侧面上具有至少两个引导元件,以及 至少一个底部捕获元件,侧面上的引导元件各自在右侧和左侧成对地布置在框架上。
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公开(公告)号:US08123866B2
公开(公告)日:2012-02-28
申请号:US11935269
申请日:2007-11-05
申请人: Jürgen Döpping , Matthias Reinecke , Holger Brosche , Hans-Joachim Gretzschel , Steffen Pollack
发明人: Jürgen Döpping , Matthias Reinecke , Holger Brosche , Hans-Joachim Gretzschel , Steffen Pollack
CPC分类号: B28D5/0082 , B28D5/04 , H01L21/67313
摘要: The invention relates to a device for manufacturing semiconductor material wafers with a sawing device for the sawing of slices attached to a saw holder, a pre-cleaning device arranged in the process direction downstream of the sawing device for pre-cleaning the surfaces of the slices hanging on the saw holder, and a degluing device arranged downstream in the process direction for detaching the slices from the saw holder.
摘要翻译: 本发明涉及一种用于制造半导体材料晶片的装置,其具有锯切装置,用于锯切安装在锯保持器上的切片,预清洁装置沿锯切装置的下游方向布置,用于预清洁切片表面 悬挂在锯架上,以及脱模装置,其沿着处理方向布置在下游,以将切片从锯保持器上分离。
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公开(公告)号:US08168036B2
公开(公告)日:2012-05-01
申请号:US12330652
申请日:2008-12-09
申请人: Lothar Andritzke , Holger Brosche , Steffen Krueger , Steffen Pollack , Klaus-Peter Weiss , Hans-Joachim Gretzschel
发明人: Lothar Andritzke , Holger Brosche , Steffen Krueger , Steffen Pollack , Klaus-Peter Weiss , Hans-Joachim Gretzschel
IPC分类号: B32B38/10
CPC分类号: G03F1/64 , H01L21/68707 , Y10S156/922 , Y10S156/937 , Y10T156/1153 , Y10T156/1168 , Y10T156/1911 , Y10T156/1978
摘要: An apparatus and a method for the removal of pellicles from masks which can be used for photolithographic purposes. The pellicles are removed from masks in a universal manner without them being further contaminated or damaged. In an apparatus, at least one grip is present for the manipulation of masks provided with pellicles which has at least two fixing elements which engage at the edge of a mask with exerted pressure force. There are moreover present in this connection at least one detector for the contactless determination of the position of mounts formed at the radially outer edge of pellicles, and a heating device for the heating of an adhesive with which pellicles are fastened to a mask with material continuity, and a removal apparatus of the pellicles from a mask having a mask fixing unit and a pellicle removal unit.
摘要翻译: 从可用于光刻目的的掩模中除去薄膜的装置和方法。 防护薄膜以普遍的方式从面罩中取出,而不会进一步污染或损坏。 在装置中,存在至少一个把手,用于操纵设置有防护薄膜的掩模,所述防护薄膜具有至少两个固定元件,所述至少两个固定元件在施加的压力下接合在掩模的边缘。 此外,还存在至少一个检测器,用于非接触式地确定形成在防护薄膜的径向外边缘处的安装件的位置,以及加热装置,用于加热粘合剂,将薄膜紧固到具有材料连续性的掩模 以及具有掩模固定单元和防护薄膜组件的掩模的防护薄膜组件的去除装置。
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公开(公告)号:US20090239156A1
公开(公告)日:2009-09-24
申请号:US12330652
申请日:2008-12-09
申请人: Lothar Andritzke , Holger Brosche , Steffen Krueger , Steffen Pollack , Klaus-Peter Weiss , Hans-Joachim Gretzschel
发明人: Lothar Andritzke , Holger Brosche , Steffen Krueger , Steffen Pollack , Klaus-Peter Weiss , Hans-Joachim Gretzschel
CPC分类号: G03F1/64 , H01L21/68707 , Y10S156/922 , Y10S156/937 , Y10T156/1153 , Y10T156/1168 , Y10T156/1911 , Y10T156/1978
摘要: An apparatus and a method for the removal of pellicles from masks which can be used for photolithographic purposes. The pellicles are removed from masks in a universal manner without them being further contaminated or damaged. In an apparatus, at least one grip is present for the manipulation of masks provided with pellicles which has at least two fixing elements which engage at the edge of a mask with exerted pressure force. There are moreover present in this connection at least one detector for the contactless determination of the position of mounts formed at the radially outer edge of pellicles, and a heating device for the heating of an adhesive with which pellicles are fastened to a mask with material continuity, and a removal apparatus of the pellicles from a mask having a mask fixing unit and a pellicle removal unit.
摘要翻译: 从可用于光刻目的的掩模中除去薄膜的装置和方法。 防护薄膜以普遍的方式从面罩中取出,而不会进一步污染或损坏。 在装置中,存在至少一个把手,用于操纵设置有防护薄膜的掩模,所述防护薄膜具有至少两个固定元件,所述至少两个固定元件在施加的压力下接合在掩模的边缘。 此外,还存在至少一个检测器,用于非接触式地确定形成在防护薄膜的径向外边缘处的安装件的位置,以及加热装置,用于加热粘合剂,将薄膜紧固到具有材料连续性的面罩 以及具有掩模固定单元和防护薄膜组件的掩模的防护薄膜组件的去除装置。
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公开(公告)号:US20050123387A1
公开(公告)日:2005-06-09
申请号:US10963901
申请日:2004-10-13
申请人: Steffen Pollack , Steffen Kruger
发明人: Steffen Pollack , Steffen Kruger
CPC分类号: H01L21/68728 , H01L21/681 , H01L21/68785
摘要: The invention relates to an apparatus for transporting and aligning disk-shaped elements in particular wafers which have to be removed from the processing devices and transported to further processing devices and inserted therein during the manufacturing process as a result of technologic unemployment, and which have to be removed again after processing. Such an apparatus should be simply and solidly built, and which can be produced at a reasonable price and which is versatile. On the apparatus a carriage is arranged on a rotatable carriage support. The carriage support can be laterally moved. In addition, a holder for a disk-shaped element is guided for alignment with the rotation axis of the carriage support and through the latter. The carriage and/or carriage support and the holder as well are movable relative to each other in the vertical direction, and at least one detector for determining the location of markers existing on a disk-shaped element is arranged on the carriage support.
摘要翻译: 本发明涉及一种用于运输和对准特定晶片中的盘形元件的装置,其必须从处理装置移除并被运送到另外的处理装置并且由于技术失业而在制造过程中插入其中,并且必须 加工后再次被取出。 这种装置应该简单而牢固地构建,并且可以以合理的价格生产并且是多用途的。 在装置上,滑架布置在可旋转的托架支架上。 滑架支架可以横向移动。 此外,用于盘形元件的保持器被引导以与托架支撑件的旋转轴线对齐并且通过该支架支架的旋转轴线。 滑架和/或滑架支撑件以及支架也可在垂直方向上彼此相对移动,并且用于确定存在于盘形元件上的标记的位置的至少一个检测器布置在托架支撑件上。
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