公开(公告)号：US20160064368A1

公开(公告)日：2016-03-03

申请号：US14630672

申请日：2015-02-25

Applicant: KABUSHIKI KAISHA TOSHIBA

Inventor： Mitsuko SHIMIZU ,  Sachiko KOBAYASHI

IPC: H01L27/02 ,  G05B19/418

CPC classification number: G05B19/418 ,  G03F7/0002 ,  G05B2219/45031

Abstract: According to one embodiment, a pattern data creating method includes a calculation process, a determination process, and a correction process. In the calculation process, it is calculated a stress distribution of stresses that are applied to a template when a distance between the template and a substrate on which resist are disposed is predetermined, the template including a template pattern. In the determination process, it is determined whether or not there is a stress concentration spot in the template pattern at which a stress value larger than a predetermined criterion value is to appear. If the stress concentration spot is present, in the correction process, it is a corrected pattern data of the template pattern such that the stress value at the stress concentration spot becomes a stress value not larger than the predetermined criterion value.

Abstract translation: 根据一个实施例，图案数据创建方法包括计算处理，确定处理和校正处理。 在计算过程中，计算当模板与其上设置有抗蚀剂的基板之间的距离是预定时施加到模板的应力的应力分布，该模板包括模板图案。 在确定处理中，确定在模板图案中是否存在应力值大于预定标准值的应力集中点。 如果存在应力集中点，则在校正处理中，是模板图案的校正图案数据，使得应力集中点处的应力值成为不大于预定标准值的应力值。

公开(公告)号：US20170235239A1

公开(公告)日：2017-08-17

申请号：US15255298

申请日：2016-09-02

Applicant: KABUSHIKI KAISHA TOSHIBA

Inventor： Mitsuko SHIMIZU ,  Takashi SATO ,  Akiko MIMOTOGI ,  Akiko YAMADA ,  Takeshi SUTO

IPC: G03F9/00 ,  C09K11/56 ,  C09K11/77 ,  G03F7/00

CPC classification number: G03F9/7042 ,  C09K11/565 ,  C09K11/7734 ,  G03F7/0002

Abstract: According to one embodiment, an imprint method is provided. In the imprint method, a template including a mechanoluminescent material is brought into contact with a resist on a substrate. The posture of the template is adjusted on the basis of the intensity of mechanoluminescence from the template. Light is emitted to the resist to harden the resist. The template is separated from the resist.