公开(公告)号：US20160274468A1

公开(公告)日：2016-09-22

申请号：US14840818

申请日：2015-08-31

Applicant: KABUSHIKI KAISHA TOSHIBA

Inventor： Ryoichi SUZUKI ,  Sachiko KOBAYASHI

IPC: G03F7/20

CPC classification number: G03F7/70408

Abstract: According to an embodiment, a method for forming a pattern includes selectively forming a first film on a first region on a substrate. The first region is included in an optical interference area of a first light and a second light on the substrate. The first light passes through a first passing portion of a diffraction mask and the second light passes through a second passing portion of the diffraction mask. The method further includes exposing the first film to optical interference light generated by at least the first light and the second light.

Abstract translation: 根据实施例，用于形成图案的方法包括在基板上的第一区域上选择性地形成第一膜。 第一区域被包括在基板上的第一光和第二光的光学干涉区域中。 第一光通过衍射掩模的第一通过部分，并且第二光通过衍射掩模的第二通过部分。 该方法还包括将第一膜暴露于由至少第一光和第二光产生的光学干涉光。

公开(公告)号：US20140346701A1

公开(公告)日：2014-11-27

申请号：US14454955

申请日：2014-08-08

Applicant: Kabushiki Kaisha Toshiba

Inventor： Sachiko KOBAYASHI ,  Kazuhiro TAKAHATA ,  Yingkang ZHANG ,  Masafumi ASANO ,  Shigeki NOJIMA

IPC: B29C59/02 ,  B29C59/00 ,  B29C71/04

CPC classification number: B29C59/026 ,  B29C59/002 ,  B29C71/04 ,  B29K2105/246 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

Abstract: According to one embodiment, a pattern formation device that presses a template that includes a concave and convex part onto a transferring object and that forms a pattern in which a shape of the concave and convex part is transferred is provided. The device includes: a calculation part; an adjustment part; and a transfer. The calculation part calculates, using design information of the pattern, the distribution of force applied to the pattern at a time of releasing the template pressed onto the transferring object from the transferring object. The adjustment part adjusts forming conditions of the pattern in order to uniformly approach the distribution of force calculated by the calculation part. The transfer part transfers the shape of the concave and convex part to the transferring object according to the forming conditions adjusted by the adjustment part.

Abstract translation: 根据一个实施例，提供了一种图案形成装置，其将包括凹凸部分的模板按压到转印体上并形成其中转移了凹凸部分的形状的图案。 该装置包括：计算部分; 调整部分; 和转移。 所述计算部使用所述图案的设计信息，计算从所述转印体上释放压印在所述转印体上的所述模板时施加到所述图案的力的分布。 调整部调整图案的成形条件，以均匀地接近由计算部计算出的力的分布。 转印部件根据由调节部件调整的成形条件将凹凸部的形状转印到转印体上。

公开(公告)号：US20150261904A1

公开(公告)日：2015-09-17

申请号：US14464797

申请日：2014-08-21

Applicant: KABUSHIKI KAISHA TOSHIBA

Inventor： Sachiko KOBAYASHI ,  Yoshihiro Naka ,  Masafumi Asano ,  Shoji Mimotogi ,  Katsuyoshi Kodera

IPC: G06F17/50 ,  H01L21/033

CPC classification number: G03F7/0002

Abstract: According to one embodiment, a pattern data generation method includes: decomposing data of a pattern to be formed into first guide pattern data and first DSA pattern data; generating a plurality of combinations of second guide pattern data and second DSA pattern data based on combinations of the first guide pattern data and the first DSA pattern data; carrying out simulation for each of the plurality of combinations of the second guide pattern data and the second DSA pattern data, and evaluating the simulation results using a predetermined evaluation function; and extracting one set or a plurality of sets of combinations that are suitable for forming the pattern to be formed, from among the plurality of combinations of the second guide pattern data and the second DSA pattern data, based on the evaluation results.

Abstract translation: 根据一个实施例，图案数据生成方法包括：将要形成的图案的数据分解为第一引导图案数据和第一DSA图案数据; 基于第一引导图案数据和第一DSA图案数据的组合，生成第二引导图案数据和第二DSA图案数据的多个组合; 对所述第二引导图案数据和所述第二DSA图案数据的所述多个组合中的每一个执行模拟，以及使用预定的评估函数来评估所述模拟结果; 以及基于评估结果从第二引导图案数据和第二DSA图案数据的多个组合中提取适合于形成要形成的图案的一组或多组组合。

公开(公告)号：US20140284846A1

公开(公告)日：2014-09-25

申请号：US14015803

申请日：2013-08-30

Applicant: KABUSHIKI KAISHA TOSHIBA

Inventor： Yoko TAKEKAWA ,  Ryouichi INANAMI ,  Masafumi ASANO ,  Kazuhiro TAKAHATA ,  Sachiko KOBAYASHI ,  Shigeki NOJIMA ,  Yohko FURUTONO ,  Masato SUZUKI ,  Kenji KONOMI

IPC: B29C59/02

CPC classification number: B29C33/0055 ,  B29C33/424 ,  B29C2033/422 ,  G03F7/0002 ,  G03F9/7042 ,  G03F9/7076 ,  G03F9/7084

Abstract: According to one embodiment, a mold includes a base, a first concave pattern, a second concave pattern, and a third concave pattern. The base includes a first surface and a pedestal projecting from the first surface. The pedestal includes a first region and a second region disposed outside the first region. The first concave pattern is formed in the first region. The second concave pattern is formed in the second region. The third concave pattern extends from the first region to the second region.

Abstract translation: 根据一个实施例，模具包括基座，第一凹形图案，第二凹形图案和第三凹形图案。 底座包括从第一表面突出的第一表面和基座。 基座包括设置在第一区域外的第一区域和第二区域。 第一凹形图案形成在第一区域中。 第二凹形图案形成在第二区域中。 第三凹形图案从第一区域延伸到第二区域。

公开(公告)号：US20160064368A1

公开(公告)日：2016-03-03

申请号：US14630672

申请日：2015-02-25

Applicant: KABUSHIKI KAISHA TOSHIBA

Inventor： Mitsuko SHIMIZU ,  Sachiko KOBAYASHI

IPC: H01L27/02 ,  G05B19/418

CPC classification number: G05B19/418 ,  G03F7/0002 ,  G05B2219/45031

Abstract: According to one embodiment, a pattern data creating method includes a calculation process, a determination process, and a correction process. In the calculation process, it is calculated a stress distribution of stresses that are applied to a template when a distance between the template and a substrate on which resist are disposed is predetermined, the template including a template pattern. In the determination process, it is determined whether or not there is a stress concentration spot in the template pattern at which a stress value larger than a predetermined criterion value is to appear. If the stress concentration spot is present, in the correction process, it is a corrected pattern data of the template pattern such that the stress value at the stress concentration spot becomes a stress value not larger than the predetermined criterion value.

Abstract translation: 根据一个实施例，图案数据创建方法包括计算处理，确定处理和校正处理。 在计算过程中，计算当模板与其上设置有抗蚀剂的基板之间的距离是预定时施加到模板的应力的应力分布，该模板包括模板图案。 在确定处理中，确定在模板图案中是否存在应力值大于预定标准值的应力集中点。 如果存在应力集中点，则在校正处理中，是模板图案的校正图案数据，使得应力集中点处的应力值成为不大于预定标准值的应力值。

公开(公告)号：US20150048559A1

公开(公告)日：2015-02-19

申请号：US14180864

申请日：2014-02-14

Applicant: Kabushiki Kaisha Toshiba

Inventor： Sachiko KOBAYASHI ,  Satoshi Tanaka ,  Kazuhiro Takahata

IPC: B29C59/02

CPC classification number: G03F7/0002

Abstract: According to one embodiment, a mold manufacturing method includes obtaining a first distribution, obtaining a second distribution, generating a correction data, and forming a second mold. The first distribution is a distribution of level difference included in a first layer on a substrate. The obtaining the second distribution obtains the second distribution when a first mold having the concave-convex pattern is brought into contact with a photosensitive resin applied on the first layer and the resin is cured. The second distribution is a distribution of film thickness of the resin remaining between the substrate and a convex pattern feature of a concave-convex pattern. The correction data is a data for suppressing a difference between one of the first distribution and the second distribution, and a film thickness of a reference set beforehand. The second mold is different from the first mold using the correction data.

Abstract translation: 根据一个实施例，模具制造方法包括获得第一分布，获得第二分布，产生校正数据和形成第二模具。 第一分布是包括在基板上的第一层中的电平差的分布。 当具有凹凸图案的第一模具与施加在第一层上的感光树脂接触并且树脂固化时，获得第二分布获得第二分布。 第二分布是残留在基板和凹凸图案的凸形图案特征之间的树脂的膜厚分布。 校正数据是用于抑制第一分布和第二分布中的一个之间的差异的数据以及预先参考的组合的膜厚度。 使用校正数据，第二模具与第一模具不同。