公开(公告)号：US20230212481A1

公开(公告)日：2023-07-06

申请号：US17996148

申请日：2021-01-26

Applicant: KAO CORPORATION

Inventor： Takuya HANDA ,  Tomoya SATOU

IPC: C11D3/37 ,  C11D3/20

CPC classification number: C11D3/3757 ,  C11D3/2006 ,  C11D3/2041

Abstract: A cleaning composition for an oral appliance, including (A) and (B). (A) 0.05 mass % or more and 8 mass % or less of an anionic homopolymer or copolymer which has a mass average molecular weight of 2,000 or higher and 500,000 or lower and includes a constituent unit derived from (a1) an anionic monomer having a carboxyl group, a sulfo group, or a phosphoric acid group. (B) one or more surfactants selected from the group consisting of an anionic surfactant, a nonionic surfactant, and an amphoteric surfactant.

公开(公告)号：US20230203402A1

公开(公告)日：2023-06-29

申请号：US18001057

申请日：2021-01-26

Applicant: KAO CORPORATION

Inventor： Atsunori SONOI ,  Takuya HANDA ,  Tomoya SATOU

IPC: C11D3/20 ,  C11D1/36 ,  C11D3/00 ,  C11D11/00

CPC classification number: C11D3/2075 ,  C11D1/36 ,  C11D3/0047 ,  C11D11/0023

Abstract: A cleaning composition for an oral appliance, including the following components (A) and (B): (A) an unsaturated fatty acid having 10 or more and 20 or less carbon atoms or a salt thereof in an amount of 0.5 mass % or more and 14 mass % or less in terms of the fatty acid, and (B) one or more surfactants selected from the group consisting of an anionic surfactant (b1), a nonionic surfactant (b2), and an amphoteric surfactant (b3), and the composition has a pH at 25° C. of 5.5 or higher and 14 or lower.