Multi-wavelength interferometry for defect classification

    公开(公告)号:US11017520B2

    公开(公告)日:2021-05-25

    申请号:US16551155

    申请日:2019-08-26

    Abstract: An inspection system may include a controller coupled to a differential interference contrast imaging tool for generating images of a sample based on illumination with two sheared illumination beams. The controller may determine a first defect-induced phase shift based on a first set of images of a defect on the sample with a first selected illumination spectrum and two or more selected induced phase differences between the two sheared illumination beams, determine a second defect-induced phase shift based a second set of images of the defect with a second selected illumination spectrum and two or more selected induced phase differences between the two sheared illumination beams, and classify the defect as a metal or a non-metal based on a comparison of the first phase shift to the second phase shift.

    Multi-Wavelength Interferometry for Defect Classification

    公开(公告)号:US20200074617A1

    公开(公告)日:2020-03-05

    申请号:US16551155

    申请日:2019-08-26

    Abstract: An inspection system may include a controller coupled to a differential interference contrast imaging tool for generating images of a sample based on illumination with two sheared illumination beams. The controller may determine a first defect-induced phase shift based on a first set of images of a defect on the sample with a first selected illumination spectrum and two or more selected induced phase differences between the two sheared illumination beams, determine a second defect-induced phase shift based a second set of images of the defect with a second selected illumination spectrum and two or more selected induced phase differences between the two sheared illumination beams, and classify the defect as a metal or a non-metal based on a comparison of the first phase shift to the second phase shift.

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