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公开(公告)号：US20240230555A9
公开(公告)日：2024-07-11
申请号：US18452457
申请日：2023-08-18
Applicant: KLA Corporation
Inventor： Chunhai Wang , Guoheng Zhao , Anatoly Romanovsky , Yihua Hao , Monica Ji
IPC: G01N21/95
CPC classification number: G01N21/9501 , G01N2201/0233
Abstract: Methods and systems for inspecting a specimen are provided. One system includes an inspection subsystem configured for directing light to an area on the specimen and for generating output responsive to light from the area on the specimen. The system also includes a first gas flow subsystem configured for replacing a gas in a first local volume surrounding the area on the specimen with a first medium that scatters less of the light than the gas. In addition, the system includes a second gas flow subsystem configured for replacing the gas in a second local volume proximate the first local volume with a second medium different than the first medium. The system further includes a computer subsystem configured for detecting abnormalities on the specimen based on the output.
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公开(公告)号：US20240133825A1
公开(公告)日：2024-04-25
申请号：US18452457
申请日：2023-08-17
Applicant: KLA Corporation
Inventor： Chunhai Wang , Guoheng Zhao , Anatoly Romanovsky , Yihua Hao , Monica Ji
IPC: G01N21/95
CPC classification number: G01N21/9501 , G01N2201/0233
Abstract: Methods and systems for inspecting a specimen are provided. One system includes an inspection subsystem configured for directing light to an area on the specimen and for generating output responsive to light from the area on the specimen. The system also includes a first gas flow subsystem configured for replacing a gas in a first local volume surrounding the area on the specimen with a first medium that scatters less of the light than the gas. In addition, the system includes a second gas flow subsystem configured for replacing the gas in a second local volume proximate the first local volume with a second medium different than the first medium. The system further includes a computer subsystem configured for detecting abnormalities on the specimen based on the output.
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公开(公告)号：US20210356406A1
公开(公告)日：2021-11-18
申请号：US17313703
申请日：2021-05-06
Applicant: KLA Corporation
Inventor： Anatoly Romanovsky , Jenn-Kuen Leong , Daniel Kavaldjiev , Chunhai Wang , Bret Whiteside , Steve Xu
IPC: G01N21/88
Abstract: A dark-field optical system may include a rotational objective lens assembly with a dark-field objective lens to collect light from a sample within a collection numerical aperture, where the dark-field objective lens includes an entrance aperture and an exit aperture at symmetrically-opposed azimuth angles with respect to an optical axis, a rotational bearing to allow rotation of at least a part of the dark-field objective lens including the entrance aperture and the exit aperture around the optical axis, and a rotational driver to control a rotational angle of the entrance aperture. The system may also include a multi-angle illumination sub-system to illuminate the sample with an illumination beam through the entrance aperture at two or more illumination azimuth angles, where an azimuth angle of the illumination beam on the sample is selectable by rotating the objective lens to any of the two or more illumination azimuth angles.
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Patent Agency Ranking
公开(公告)号：US11733172B2
公开(公告)日：2023-08-22
申请号：US17313703
申请日：2021-05-06
Applicant: KLA Corporation
Inventor： Anatoly Romanovsky , Jenn-Kuen Leong , Daniel Kavaldjiev , Chunhai Wang , Bret Whiteside , Zhiwei Xu
IPC: G01N21/88
CPC classification number: G01N21/8806 , G01N2021/8822 , G01N2201/063
Abstract: A dark-field optical system may include a rotational objective lens assembly with a dark-field objective lens to collect light from a sample within a collection numerical aperture, where the dark-field objective lens includes an entrance aperture and an exit aperture at symmetrically-opposed azimuth angles with respect to an optical axis, a rotational bearing to allow rotation of at least a part of the dark-field objective lens including the entrance aperture and the exit aperture around the optical axis, and a rotational driver to control a rotational angle of the entrance aperture. The system may also include a multi-angle illumination sub-system to illuminate the sample with an illumination beam through the entrance aperture at two or more illumination azimuth angles, where an azimuth angle of the illumination beam on the sample is selectable by rotating the objective lens to any of the two or more illumination azimuth angles.
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公开(公告)号：US20220091047A1
公开(公告)日：2022-03-24
申请号：US17224913
申请日：2021-04-07
Applicant: KLA Corporation
Inventor： Anatoly Romanovsky , Zhiwei Xu , Yury Yuditsky , Yifeng Cui , Mandar Paranjape
Abstract: A semiconductor wafer is inspected using a main laser beam and a secondary laser beam. The secondary laser beam leads the main laser beam and has lower power than the main laser beam. Using the secondary laser beam, a particle is detected on the semiconductor wafer having a size that satisfies a threshold. In response to detecting the particle, the power of the main laser beam and the power of the secondary laser beam are reduced. The particle passes through the main laser beam with the main laser beam at reduced power. After the particle has passed through the main laser beam with the main laser beam at the reduced power, the power of the main laser beam and the power of the secondary laser beam are restored in a controlled manner that is slower than a single step.
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公开(公告)号：US20200132608A1
公开(公告)日：2020-04-30
申请号：US16584370
申请日：2019-09-26
Applicant: KLA CORPORATION
Inventor： Raymond Chu , Andrew Zeng , Donald Pettibone , Chunsheng Huang , Bret Whiteside , Fabrice Paccoret , Xuan Wang , Chuanyong Huang , Steve Xu , Anatoly Romanovsky
Abstract: The inspection system includes an illumination source, a TDI-CCD sensor, and a dark field/bright field sensor. A polarizer receives the light from the light source. The light from the polarizer is directed at a Wollaston prism, such as through a half wave plate. Use of the TDI-CCD sensor and the dark field/bright field sensor provide high spatial resolution, high defect detection sensitivity and signal-to-noise ratio, and fast inspection speed.
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公开(公告)号：US11374375B2
公开(公告)日：2022-06-28
申请号：US16988443
申请日：2020-08-07
Applicant: KLA Corporation
Inventor： Mandar Paranjape , Steve Yifeng Cui , Anatoly Romanovsky , Million Daniel , Nadine Asenbaum-Doerre , Jeff Chen
Abstract: A laser-beam power-modulation system includes an acousto-optic modulator (AOM) to receive a laser beam and separate the laser beam into a primary beam and a plurality of diffracted beams based on an input signal. The power of the primary beam depends on the input signal. The system also includes a slit to transmit the primary beam and dump the plurality of diffracted beams, a controller to generate a control signal based at least in part on feedback indicative of the power of the primary beam or the power of a beam generated using the primary beam, and a driver to generate the input signal based at least in part on the control signal.
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公开(公告)号：US20210050700A1
公开(公告)日：2021-02-18
申请号：US16988443
申请日：2020-08-07
Applicant: KLA Corporation
Inventor： Mandar Paranjape , Steve Yifeng Cui , Anatoly Romanovsky , Million Daniel , Nadine Asenbaum-Doerre , Jeff Chen
Abstract: A laser-beam power-modulation system includes an acousto-optic modulator (AOM) to receive a laser beam and separate the laser beam into a primary beam and a plurality of diffracted beams based on an input signal. The power of the primary beam depends on the input signal. The system also includes a slit to transmit the primary beam and dump the plurality of diffracted beams, a controller to generate a control signal based at least in part on feedback indicative of the power of the primary beam or the power of a beam generated using the primary beam, and a driver to generate the input signal based at least in part on the control signal.
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