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公开(公告)号：US20240274401A1
公开(公告)日：2024-08-15
申请号：US18434139
申请日：2024-02-06
Applicant: KLA Corporation
Inventor： James Richard Bella , Earl Jensen , Alexander Buettner , Emanuel Saerchen
CPC classification number: H01J37/222 , G06T7/13 , G06T7/55 , H01J37/32715 , H01L21/681 , G06T2207/30164 , H01J2237/024 , H01J2237/2007 , H01J2237/2445 , H01J2237/24578
Abstract: An instrumented substrate is used in a substrate processing system to determine offsets to a chuck and a focus ring. The instrumented substrate includes line sensors which generate line images and a controller which determines the offsets based on the line images. A substrate handler then repositions the instrumented substrate to reduce the offsets.
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公开(公告)号：US11302590B2
公开(公告)日：2022-04-12
申请号：US16691843
申请日：2019-11-22
Applicant: KLA CORPORATION
Inventor： Emanuel Saerchen , Donald W. Pettibone , Oscar Florendo , Li-Min Chen , Martin Brutsch
IPC: H01L21/66 , G01R31/311 , H01L21/67 , G01N21/95
Abstract: A system for laser enhanced voltage contrast using an optical fiber is provided. The system includes a vacuum chamber with a stage that secures a wafer. A laser light source outside the vacuum chamber directs light to an optical fiber. The optical fiber transmits all wavelengths of light from the laser light source into the vacuum chamber through a wall of the vacuum chamber.
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公开(公告)号：US20200266116A1
公开(公告)日：2020-08-20
申请号：US16691843
申请日：2019-11-22
Applicant: KLA CORPORATION
Inventor： Emanuel Saerchen , Donald W. Pettibone , Oscar Florendo , Li-Min Chen , Martin Brutsch
IPC: H01L21/66 , G01N21/95 , H01L21/67 , G01R31/311
Abstract: A system for laser enhanced voltage contrast using an optical fiber is provided. The system includes a vacuum chamber with a stage that secures a wafer. A laser light source outside the vacuum chamber directs light to an optical fiber. The optical fiber transmits all wavelengths of light from the laser light source into the vacuum chamber through a wall of the vacuum chamber.
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