公开(公告)号：US20240271996A1

公开(公告)日：2024-08-15

申请号：US18408395

申请日：2024-01-09

Applicant: KLA Corporation

Inventor： Matthew Hoffman ,  Florian Melsheimer ,  Alon Rosenthal

IPC: G01J1/42 ,  G01N21/88 ,  G03F7/00 ,  G03F7/20

CPC classification number: G01J1/4257 ,  G01J1/429 ,  G01N21/8806 ,  G03F7/2039 ,  G03F7/70033 ,  G03F7/7055 ,  G03F7/706 ,  G03F7/706851

Abstract: Methods and systems for determining one or more characteristics of light in an optical system are provided. One system includes a detector positioned in a path of light between a light source in the optical system and a specimen for which the optical system performs a process. The detector includes a center cut-out configured to allow only a first portion of the light from the light source to pass therethrough and four or more detector segments positioned around the center cut-out and in a path of only a second portion of the light from the light source. The four or more detector segments are configured to separately generate output responsive to the light incident thereon. The system also includes a control subsystem configured for determining one or more characteristics of the light from the light source based on the output separately generated by the four or more detector segments.

公开(公告)号：US20250164895A1

公开(公告)日：2025-05-22

申请号：US18514874

申请日：2023-11-20

Applicant: KLA Corporation

Inventor： Rajeev Rajendran ,  Michael Xie ,  Farid Atry ,  Florian Melsheimer ,  Rui-Fang Shi

IPC: G03F7/00 ,  H01L21/67

Abstract: A substrate is mounted on a chuck in a chamber of an EUV tool. An illumination aperture in the chamber provides a beam of light to illuminate the substrate on the chuck. The beam of light includes extreme ultraviolet (EUV) in-band (IB) light and out-of-band (OOB) light. The OOB light has longer wavelengths than the EUV IB light. A beam-narrowing aperture in the chamber, which is switchable into and out of a path for the beam of light, selectively narrows the beam of light to illuminate the substrate. A band-selection filter filters out the OOB light or the EUV IB light. Imaging optics in the chamber relay light from the substrate to an imaging plane. A grating spectrally disperses the light from the substrate. A sensor detects the light from the substrate as relayed by the imaging optics and spectrally dispersed by the grating.

公开(公告)号：US20250164408A1

公开(公告)日：2025-05-22

申请号：US18941459

申请日：2024-11-08

Applicant: KLA CORPORATION

Inventor： Florian Melsheimer ,  Lauren Wilson ,  Alon Rosenthal ,  Matthew Hoffman

IPC: G01N21/88 ,  G01J1/44 ,  G01N21/01 ,  G02B26/08 ,  G05D3/12

Abstract: An assembly is in a path of a beam of light, which has a first and second spectral components at different wavelengths. A first spectral component and a second spectral component of the beam of light are projected through an aperture. A sensor is disposed around the aperture to only receive a second spectral component of the beam of light. A position of the beam of light relative to the aperture can be determined using information from the sensor.