公开(公告)号：US20210159127A1

公开(公告)日：2021-05-27

申请号：US17093621

申请日：2020-11-09

Applicant: KLA CORPORATION

Inventor： Boshi Huang ,  Hucheng Lee ,  Vladimir Tumakov ,  Sangbong Park ,  Bjorn Brauer ,  Erfan Soltanmohammadi

IPC: H01L21/66 ,  G06T7/00 ,  G06K9/62 ,  G06F17/18 ,  G06F7/22

Abstract: A care area is determined in an image of a semiconductor wafer. The care area is divided into sub-care areas based on the shapes of polygons in a design file associated with the care area. A noise scan of a histogram for the sub-care areas is then performed. The sub-care areas are clustered into groups based on the noise scan of the histogram.

公开(公告)号：US11615993B2

公开(公告)日：2023-03-28

申请号：US17093621

申请日：2020-11-09

Applicant: KLA CORPORATION

Inventor： Boshi Huang ,  Hucheng Lee ,  Vladimir Tumakov ,  Sangbong Park ,  Bjorn Brauer ,  Erfan Soltanmohammadi

IPC: G06T7/00 ,  H01L21/66 ,  G06K9/62 ,  G06F17/18 ,  G06F7/22

Abstract: A care area is determined in an image of a semiconductor wafer. The care area is divided into sub-care areas based on the shapes of polygons in a design file associated with the care area. A noise scan of a histogram for the sub-care areas is then performed. The sub-care areas are clustered into groups based on the noise scan of the histogram.

公开(公告)号：US11431976B2

公开(公告)日：2022-08-30

申请号：US16744301

申请日：2020-01-16

Applicant: KLA Corporation

Inventor： Nurmohammed Patwary ,  Richard Wallingford ,  James A. Smith ,  Xiaochun Li ,  Vladimir Tumakov ,  Bjorn Brauer

IPC: G06K9/00 ,  H04N19/126 ,  H04N19/60 ,  G01N21/95

Abstract: A sample characterization system is disclosed. In embodiments, the sample characterization system includes a controller communicatively coupled to an inspection sub-system, the controller including one or more processors configured to execute a set of program instructions stored in memory, the set of program instructions configured to cause the one or more processors to: acquire one or more target image frames of a sample; generate a target tensor with the one or more acquired target image frames; perform a first set of one or more decomposition processes on the target tensor to generate one or more reference tensors including one or more reference image frames; identify one or more differences between the one or more target image frames and the one or more reference image frames; and determine one or more characteristics of the sample based on the one or more identified differences.

公开(公告)号：US20200244963A1

公开(公告)日：2020-07-30

申请号：US16744301

申请日：2020-01-16

Applicant: KLA Corporation

Inventor： Nurmohammed Patwary ,  Richard Wallingford ,  James A. Smith ,  Xiaochun Li ,  Vladimir Tumakov ,  Bjorn Brauer

IPC: H04N19/126 ,  G01N21/95 ,  H04N19/60

Abstract: A sample characterization system is disclosed. In embodiments, the sample characterization system includes a controller communicatively coupled to an inspection sub-system, the controller including one or more processors configured to execute a set of program instructions stored in memory, the set of program instructions configured to cause the one or more processors to: acquire one or more target image frames of a sample; generate a target tensor with the one or more acquired target image frames; perform a first set of one or more decomposition processes on the target tensor to form generate one or more reference tensors including one or more reference image frames; identify one or more differences between the one or more target image frames and the one or more reference image frames; and determine one or more characteristics of the sample based on the one or more identified differences.