MULTI-BEAM ELECTRONICS SCAN
    1.
    发明申请

    公开(公告)号:US20220199352A1

    公开(公告)日:2022-06-23

    申请号:US17540169

    申请日:2021-12-01

    Abstract: A multi-beam electronics scanning system using swathing. The system includes an electron emitter source configured to emit an illumination beam. The illumination beam is split into multiple electron beams by a beam splitter lens array. The system also includes an electronic deflection system configured to deflect each of the electron beams in a plurality of directions, including a first direction, along two different axes. Last, a swathing stage is used to move a sample with a constant velocity in a second direction that is parallel to the first direction.

    Multi-beam electronics scan
    2.
    发明授权

    公开(公告)号:US12014895B2

    公开(公告)日:2024-06-18

    申请号:US17540169

    申请日:2021-12-01

    CPC classification number: H01J37/10 H01J37/20 H01J37/28

    Abstract: A multi-beam electronics scanning system using swathing. The system includes an electron emitter source configured to emit an illumination beam. The illumination beam is split into multiple electron beams by a beam splitter lens array. The system also includes an electronic deflection system configured to deflect each of the electron beams in a plurality of directions, including a first direction, along two different axes. Last, a swathing stage is used to move a sample with a constant velocity in a second direction that is parallel to the first direction.

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