公开(公告)号：US20240363304A1

公开(公告)日：2024-10-31

申请号：US18509205

申请日：2023-11-14

Applicant: FEI Company

Inventor： Jaroslav Velcovský ,  Remco T. J. P. Geurts ,  Marek Melichar

IPC: H01J37/10 ,  H01J37/04 ,  H01J37/22 ,  H01J37/305

CPC classification number: H01J37/10 ,  H01J37/045 ,  H01J37/22 ,  H01J37/3053 ,  H01J2237/006

Abstract: Surface contamination and debris deposition associated with laser ablation or ion beam milling is reduced by combining a directed flow to a workpiece with suction at a suitable vacuum pressure. The vacuum pressure is typically selected so that any contaminants or debris have relatively short mean free paths to avoid build-up on distant surfaces in a vacuum chamber. A shutter can be used to shield portions of a charged-particle-beam optical column during processing. Processing at vacuum pressures associated with the relatively short MFPs can be combined with processing at vacuum pressures associated with relatively long MFPs to provide coarse and fine milling or ablation.

公开(公告)号：US20240339292A1

公开(公告)日：2024-10-10

申请号：US18748758

申请日：2024-06-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Yan REN ,  Marijke SCOTUZZI ,  Albertus Victor Gerardus MANGNUS ,  Erwin Paul SMAKMAN

IPC: H01J37/244 ,  H01J37/10 ,  H01J37/28

CPC classification number: H01J37/244 ,  H01J37/10 ,  H01J37/28

Abstract: There is provided a charged particle device for a charged particle inspection apparatus for projecting an array of sub-beams towards a sample, the charged particle device comprising: a charged particle optical element and a detector. The charged particle optical element has an up-beam surface having a plurality of openings to generate an array of sub-beams from a charged particle beam. In the charged particle optical element are defined: sub-beam apertures and monitoring apertures. The sub-beam aperture extend through the charged particle element for paths of the array of sub-beams towards a sample. The monitoring aperture extends through the charged particle element. The detector is in the monitoring aperture. At least part of the detector is down-beam of the up-beam surface. The detector measures a parameter of a portion of the charged particle beam incident on the detector.

公开(公告)号：US20240321547A1

公开(公告)日：2024-09-26

申请号：US18580269

申请日：2022-07-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Marco Jan-Jaco WIELAND

IPC: H01J37/22 ,  H01J37/10 ,  H01J37/147 ,  H01J37/244 ,  H01J37/317

CPC classification number: H01J37/226 ,  H01J37/10 ,  H01J37/1474 ,  H01J37/244 ,  H01J37/3177 ,  H01J2237/0453 ,  H01J2237/2443 ,  H01J2237/24592

Abstract: Charged-particle optical devices are disclosed. In one arrangement, a device includes a charged particle column and a light sensor. An objective lens array projects a plurality of beams towards a sample and has a plurality of electrodes arranged along a path of the plurality of beams. A plurality of scintillators receives signal particles emitted from the sample. Light is generated in response to the received signal particles. A light guiding arrangement guides light generated by the scintillators to the light sensor. The light guiding arrangement includes a mirror defining a plurality of apertures to allow passage of the plurality of beams through the mirror towards the sample.

公开(公告)号：US12057290B2

公开(公告)日：2024-08-06

申请号：US17572767

申请日：2022-01-11

Applicant: Carl Zeiss MultiSEM GmbH

Inventor： Hans Fritz ,  Ingo Mueller

IPC: H01J37/317 ,  H01J37/10 ,  H01J37/145 ,  H01J37/147 ,  H01J37/26 ,  H01J37/302

CPC classification number: H01J37/3177 ,  H01J37/10 ,  H01J37/145 ,  H01J37/147 ,  H01J37/263 ,  H01J37/3023 ,  H01J2237/0453 ,  H01J2237/04926

Abstract: A method includes operating a multiple particle beam system at different working points. The numerical aperture can be set for each of the working points in such a way that the resolution of the multiple particle beam system is optimal. In the process, the beam pitch between adjacent individual particle beams on the sample to be scanned is kept constant as a boundary condition. There are no mechanical reconfigurations of the system whatsoever for the purposes of varying the numerical aperture.

公开(公告)号：US20240096585A1

公开(公告)日：2024-03-21

申请号：US17768802

申请日：2020-10-20

Applicant: Technische Universiteit Delft ,  Applied Materials Israel, Ltd.

Inventor： Pieter KRUIT

IPC: H01J37/147 ,  H01J37/10

CPC classification number: H01J37/147 ,  H01J37/10

Abstract: Disclosed are an apparatus and method for generating a plurality of substantially collimated charged particle beamlets. The apparatus includes a charged particle source for generating a diverging charged particle beam, a beam splitter for splitting the charged particle beam in an array of charged particle beamlets, a deflector array includes an array of deflectors including one deflector for each charged particle beamlet of said array of charged particle beamlets, wherein the deflector array is configured for substantially collimating the array of diverging charged particle beamlets. The apparatus further includes a beam manipulation device configured for generating electric and/or magnetic fields at least in an area between the charged particle source and the deflector array. The apparatus has a central axis, and the beam manipulation device is configured for generating electric and/or magnetic fields substantially parallel to the central axis and substantially perpendicular to the central axis.

公开(公告)号：US11887807B2

公开(公告)日：2024-01-30

申请号：US18158444

申请日：2023-01-23

Applicant: ASML Netherlands B.V.

Inventor： Weiming Ren ,  Xuedong Liu ,  Xuerang Hu ,  Zhongwei Chen

IPC: H01J37/147 ,  H01J37/06 ,  H01J37/10 ,  H01J37/28

CPC classification number: H01J37/1474 ,  H01J37/06 ,  H01J37/10 ,  H01J37/1477 ,  H01J37/1478 ,  H01J37/28 ,  H01J2237/024 ,  H01J2237/0453 ,  H01J2237/0492 ,  H01J2237/103 ,  H01J2237/1205 ,  H01J2237/1516 ,  H01J2237/1534 ,  H01J2237/1536

Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit forms plural and parallel images of one single electron source by deflecting plural beamlets of a parallel primary-electron beam therefrom, and one objective lens focuses the plural deflected beamlets onto a sample surface and forms plural probe spots thereon. A movable condenser lens is used to collimate the primary-electron beam and vary the currents of the plural probe spots, a pre-beamlet-forming means weakens the Coulomb effect of the primary-electron beam, and the source-conversion unit minimizes the sizes of the plural probe spots by minimizing and compensating the off-axis aberrations of the objective lens and condenser lens.

公开(公告)号：US20230317404A1

公开(公告)日：2023-10-05

申请号：US17757133

申请日：2022-01-26

Applicant: FOCUS-EBEAM TECHNOLOGY (BEIJING) CO., LTD.

Inventor： Shuai LI

IPC: H01J37/147 ,  H01J37/28 ,  H01J37/244 ,  H01J37/10

CPC classification number: H01J37/1474 ,  H01J37/10 ,  H01J37/244 ,  H01J37/28

Abstract: Provided is an electron beam system, including: an electron source, configured to generate an electron beam; a first beam guide, configured to accelerate the electron beam; a second beam guide, configured to accelerate the electron beam; a first control electrode arranged between the first beam guide and the second beam guide, configured to change movement directions of backscattered electrons and secondary electrons generated by the electron beam acting on a specimen to be tested; a first detector arranged between the first beam guide and the first control electrode, configured to receive the backscattered electrons generated by the electron beam acting on the specimen to be tested. The first control electrode according to the embodiments of the present disclosure changes the movement directions of the backscattered electrons and secondary electrons generated by the electron beam generated by the electron source acting on the specimen to be tested, so that the first detector arranged between the first beam guide and the first control electrode can receive pure backscattered electrons generated by the electron beam acting on the specimen to be tested.

公开(公告)号：US20230230801A1

公开(公告)日：2023-07-20

申请号：US18099127

申请日：2023-01-19

Applicant: JEOL Ltd.

Inventor： Yuichiro Ohori ,  Keiji Tajima

IPC: H01J37/304 ,  H01J37/305 ,  H01J37/10 ,  H01J37/21

CPC classification number: H01J37/304 ,  H01J37/10 ,  H01J37/21 ,  H01J37/305 ,  H01J2237/0492 ,  H01J2237/2448 ,  H01J2237/30483 ,  H01J2237/31749

Abstract: An FIB system includes an ion source for producing the ion beam, a lens system which includes an objective lens and which is operative to focus the ion beam onto a sample such that secondary electrons are produced from the sample, a detector for detecting the secondary electrons, and a controller for controlling the lens system. The controller operates i) to provide control so that a focus of the ion beam is varied by directing the ion beam onto the sample, ii) to measure a signal intensity from the secondary electrons produced from the sample during the variation of the strength of the objective lens, iii) to adjust the focus of the ion beam, iv) to acquire a secondary electron image containing an image of a trace of a spot, and v) to correct the deviation of the field of view of the ion beam.

公开(公告)号：US11651930B2

公开(公告)日：2023-05-16

申请号：US17540442

申请日：2021-12-02

Applicant: Hitachi High-Tech Corporation

Inventor： Makoto Kuwahara ,  Koh Saitoh

IPC: H01J37/073 ,  H01J37/10 ,  H01J37/153 ,  H01J37/26 ,  H03F1/02 ,  H03F3/24 ,  H04B1/04 ,  H04L25/03 ,  H04L27/08 ,  H04L27/26 ,  H04L27/36 ,  H04W56/00 ,  H04W74/00 ,  H04W88/02 ,  H04W88/08

CPC classification number: H01J37/073 ,  H01J37/10 ,  H01J37/153 ,  H01J37/26 ,  H03F1/02 ,  H03F3/24 ,  H04B1/04 ,  H04L25/03012 ,  H04L25/03343 ,  H04L27/08 ,  H04L27/2647 ,  H04L27/368 ,  H04W56/0035 ,  H01J2237/1534 ,  H04B2001/045 ,  H04B2001/0408 ,  H04W74/004 ,  H04W74/006 ,  H04W88/02 ,  H04W88/08

Abstract: The present invention is to generate a spatially phase modulated electron wave. A laser radiating apparatus, a spatial light phase modulator, and a photocathode are provided. The photocathode has a semiconductor film having an NEA film formed on a surface thereof, and a thickness of the semiconductor film is smaller than a value obtained by multiplying a coherent relaxation time of electrons in the semiconductor film by a moving speed of the electrons in the semiconductor film. According to the configuration, a spatial distribution of phase and a spatial distribution of intensity of spatial phase modulated light are transferred to an electron wave, and the electron wave emitted from an NEA film is modulated into the spatial distribution of phase and the spatial distribution of intensity of the light. Since the spatial distribution of phase of the light can be modulated as intended by a spatial phase modulation technique for light, it is possible to generate an electron wave having a spatial distribution of phase modulated as intended.

公开(公告)号：US20180323034A1

公开(公告)日：2018-11-08

申请号：US15587720

申请日：2017-05-05

Applicant: KLA-Tencor Corporation

Inventor： Alan D. Brodie

IPC: H01J37/04 ,  H01J37/10

CPC classification number: H01J37/045 ,  H01J37/10 ,  H01J2237/0435

Abstract: Performance of a multi-electron-beam system can be improved by reducing Coulomb effects in the illumination path of a multi-beam inspection system. A beam-limiting aperture with multiple holes can be positioned between an electron beam source and a multi-lens array, such as in a field-free region. The beam-limiting aperture is configured to reduce Coulomb interactions between the electron beam source and the multi-lens array. An electron beam system with the beam-limiting aperture can be used in a scanning electron microscope.