公开(公告)号：US11966203B2

公开(公告)日：2024-04-23

申请号：US16872879

申请日：2020-05-12

Applicant: KLA Corporation

Inventor： Ankur Agarwal ,  Chad Huard ,  Yiting Zhang ,  Haifeng Pu ,  Xin Li ,  Premkumar Panneerchelvam ,  Fiddle Han ,  Yeurui Chen

IPC: G05B13/04 ,  G01B11/24 ,  G01B15/04 ,  G01N21/21 ,  G01N23/201 ,  G06F17/14

CPC classification number: G05B13/042 ,  G01B11/24 ,  G01B15/045 ,  G01N21/21 ,  G01N23/201 ,  G01N2223/054 ,  G01N2223/40 ,  G06F17/14

Abstract: A system is disclosed, in accordance with one or more embodiments of the present disclosure. The system includes a metrology tool configured to acquire one or more measurements of a portion of a sample. The system includes a controller including one or more processors configured to execute program instructions causing the one or more processors to: generate a surface kinetics model output based on a surface kinetics model; determine an expected response of the surface kinetics model output to excitation by polarized light; compare the determined expected response to the one or more measurements; generate one or more metrics based on the comparison between the determined expected response and the one or more measurements of the sample; adjust one or more parameters of the surface kinetics model to generate an adjusted surface kinetics model; and apply the adjusted surface kinetics model to simulate on-sample performance during plasma processing.

公开(公告)号：US11868689B2

公开(公告)日：2024-01-09

申请号：US17959712

申请日：2022-10-04

Applicant: KLA Corporation

Inventor： Chad Huard ,  Premkumar Panneerchelvam ,  Guy Parsey ,  Ankur Agarwal

IPC: G06F119/18 ,  G06F30/27

CPC classification number: G06F30/27 ,  G06F2119/18

Abstract: Systems and methods for setting up a physics-based model are provided. One system includes one or more components that are executed by one or more computer subsystems and that include a physics-based model describing a semiconductor fabrication-related process and a set up component configured for setting up the physics-based model in multiple phases in each of which only a subset of all of the parameters of the physics-based model are set up. A configuration of the set up component is changed between at least two of the multiple phases based on the subset of all of the parameters of the physics-based model set up in the at least two of the multiple phases. The set up component may perform a Bayesian optimization technique for cascaded model set up or calibration using multiple information sources and objective functions.

公开(公告)号：US20230112164A1

公开(公告)日：2023-04-13

申请号：US17959712

申请日：2022-10-04

Applicant: KLA Corporation

Inventor： Chad Huard ,  Premkumar Panneerchelvam ,  Guy Parsey ,  Ankur Agarwal

IPC: G06F30/27

Abstract: Systems and methods for setting up a physics-based model are provided. One system includes one or more components that are executed by one or more computer subsystems and that include a physics-based model describing a semiconductor fabrication-related process and a set up component configured for setting up the physics-based model in multiple phases in each of which only a subset of all of the parameters of the physics-based model are set up. A configuration of the set up component is changed between at least two of the multiple phases based on the subset of all of the parameters of the physics-based model set up in the at least two of the multiple phases. The set up component may perform a Bayesian optimization technique for cascaded model set up or calibration using multiple information sources and objective functions.

公开(公告)号：US20210055699A1

公开(公告)日：2021-02-25

申请号：US16872879

申请日：2020-05-12

Applicant: KLA Corporation

Inventor： Ankur A. Agarwal ,  Chad Huard ,  Yiting Zhang ,  Haifeng Pu ,  Xin Li ,  Premkumar Panneerchelvam ,  Fiddle Han ,  Yeurui Chen

IPC: G05B13/04 ,  G01N23/201 ,  G01B11/24 ,  G01B15/04 ,  G01N21/21

Abstract: A system is disclosed, in accordance with one or more embodiments of the present disclosure. The system includes a metrology tool configured to acquire one or more measurements of a portion of a sample. The system includes a controller including one or more processors configured to execute program instructions causing the one or more processors to: generate a surface kinetics model output based on a surface kinetics model; determine an expected response of the surface kinetics model output to excitation by polarized light; compare the determined expected response to the one or more measurements; generate one or more metrics based on the comparison between the determined expected response and the one or more measurements of the sample; adjust one or more parameters of the surface kinetics model to generate an adjusted surface kinetics model; and apply the adjusted surface kinetics model to simulate on-sample performance during plasma processing.