EUV light source using cryogenic droplet targets in mask inspection
    1.
    发明授权
    EUV light source using cryogenic droplet targets in mask inspection 有权
    EUV光源在面罩检查中使用低温液滴靶

    公开(公告)号:US09295147B2

    公开(公告)日:2016-03-22

    申请号:US14180107

    申请日:2014-02-13

    Abstract: An apparatus for generating extreme ultra-violet (EUV) light, including a drive laser arranged to produce a laser pulse, a vacuum chamber, a set of focusing optics arranged to focus the laser pulse produced by the drive laser onto a target spot within the vacuum chamber, a target material generator arranged to deliver a series of droplets of a target material to the target spot by modulating a flow velocity of a supply of the target material through a nozzle tip and thereby inducing a formation process of the series of droplets which series of droplets from the nozzle tip are expelled through a triple point chamber, and a set of collector optics arranged to focus a quantity of EUV light generated when a droplet of the series of drople of the target material is exposed to the laser pulse at the target spot onto an intermediate focus spot.

    Abstract translation: 一种用于产生极紫外(EUV)光的装置,包括布置成产生激光脉冲的驱动激光器,真空室,一组聚焦光学元件,其被布置成将由驱动激光产生的激光脉冲聚焦到该激光脉冲内的目标点上 真空室,目标材料发生器,其布置成通过调节目标材料的供应通过喷嘴尖端的流速而将目标材料的一系列液滴输送到目标点,从而引起一系列液滴的形成过程, 来自喷嘴尖端的一系列液滴通过三点室排出,并且一组收集器光学器件被布置成将当目标材料的一系列喷雾的液滴暴露于激光脉冲时产生的一定数量的EUV光 目标点到中间焦点。

    EUV LIGHT SOURCE USING CRYOGENIC DROPLET TARGETS IN MASK INSPECTION
    2.
    发明申请
    EUV LIGHT SOURCE USING CRYOGENIC DROPLET TARGETS IN MASK INSPECTION 有权
    EUV光源在面板检测中使用低温滴定靶

    公开(公告)号:US20140246607A1

    公开(公告)日:2014-09-04

    申请号:US14180107

    申请日:2014-02-13

    Abstract: An apparatus for generating extreme ultra-violet (EUV) light for use in a lithography inspection tool, comprising a drive laser arranged to produce a laser pulse, a vacuum chamber, a set of focusing optics arranged to focus the laser pulse produced by the drive laser onto a target spot within the vacuum chamber with a beam target diameter of less than 100 μm, a target material generator arranged to deliver an amount of a target material to the target spot within the vacuum chamber, and a set of collector optics arranged to focus a quantity of EUV light generated when the amount of the target material is exposed to the laser pulse at the target spot onto an intermediate focus spot.

    Abstract translation: 一种用于产生用于光刻检查工具的极紫外(EUV)光的装置,包括布置成产生激光脉冲的驱动激光器,真空室,一组聚焦光学元件,其被布置成聚焦由驱动器产生的激光脉冲 激光到靶室直径小于100μm的真空室内的目标点上,目标材料发生器布置成将一定量的目标材料输送到真空室内的目标点,以及一组集光器,其被布置成 将当目标材料的量暴露于目标点处的激光脉冲的量的EUV光聚焦到中间焦点上。

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