公开(公告)号：US09881764B2

公开(公告)日：2018-01-30

申请号：US15255314

申请日：2016-09-02

Applicant: KLA-Tencor Corporation

Inventor： Xinrong Jiang ,  Christopher Sears ,  Douglas Larson

IPC: H01J37/26 ,  G21K5/04 ,  H01J37/04 ,  H01J37/21 ,  H01J37/147

CPC classification number: H01J37/045 ,  H01J37/147 ,  H01J37/21 ,  H01J2237/0451 ,  H01J2237/0492 ,  H01J2237/1505 ,  H01J2237/24592

Abstract: An electron beam apparatus addresses blanking issues resulting from sinking high-power heat onto an aperture diaphragm by evenly spreading heat on the aperture diaphragm. The apparatus can include an aperture diaphragm and a deflector that deflects the electron beam on the aperture diaphragm. The electron beam is directed at the aperture diaphragm in a pattern around the aperture. The pattern may be a circle, square, or polygon. The pattern also may include a variable locus relative to the aperture.

公开(公告)号：US20170200581A1

公开(公告)日：2017-07-13

申请号：US15255314

申请日：2016-09-02

Applicant: KLA-Tencor Corporation

Inventor： Xinrong Jiang ,  Christopher Sears ,  Douglas Larson

IPC: H01J37/04 ,  H01J37/147 ,  H01J37/21

CPC classification number: H01J37/045 ,  H01J37/147 ,  H01J37/21 ,  H01J2237/0451 ,  H01J2237/0492 ,  H01J2237/1505 ,  H01J2237/24592

Abstract: An electron beam apparatus addresses blanking issues resulting from sinking high-power heat onto an aperture diaphragm by evenly spreading heat on the aperture diaphragm. The apparatus can include an aperture diaphragm and a deflector that deflects the electron beam on the aperture diaphragm. The electron beam is directed at the aperture diaphragm in a pattern around the aperture. The pattern may be a circle, square, or polygon. The pattern also may include a variable locus relative to the aperture.