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1.发明授权公开(公告)号：US09151718B2
公开(公告)日：2015-10-06
申请号：US13782785
申请日：2013-03-01
Applicant: KLA-Tencor Corporation
Inventor： Daimian Wang , Tao-Yi Fu , Damon F. Kvamme
IPC: G01N21/00 , G01N21/88 , G01N21/956
CPC classification number: G01N21/8806 , G01N21/956 , G01N2021/95676
Abstract: The disclosure is directed to a system and method of providing illumination for reticle inspection. According to various embodiments of the disclosure, a multiplexing mirror system receives pulses of illumination from a plurality of illumination sources and directs the pulses of illumination along an illumination path to a plurality of field mirror facets. The field mirror facets receive at least a portion of illumination from the illumination path and direct at least a portion of the illumination to a plurality of pupil mirror facets. The pupil mirror facets receive at least a portion of illumination reflected from the field mirror facets and direct the portion of illumination along a delivery path to a reticle for imaging and/or defect inspection.
Abstract translation: 本公开涉及一种为掩模版检查提供照明的系统和方法。 根据本公开的各种实施例，复用镜系统从多个照明源接收照明脉冲，并将照明脉冲沿照明路径引导到多个场镜面。 场面镜面从照明路径接收照明的至少一部分，并将照明的至少一部分引导到多个光瞳镜面。 瞳孔镜面接收从场镜镜面反射的照明的至少一部分，并将照射部分沿着传送路径引导到掩模版用于成像和/或缺陷检查。
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2.发明授权公开(公告)号：US10324046B1
公开(公告)日：2019-06-18
申请号：US15241005
申请日：2016-08-18
Applicant: KLA-Tencor Corporation
Inventor： Tao-Yi Fu , Steve Lange , Lisheng Gao , Xuguang Jiang , Ping Gu , Sylvain Muckenhirn
Abstract: Methods and systems for monitoring a non-defect related characteristic of a patterned wafer are provided. One computer-implemented method includes generating output responsive to light from a patterned wafer using an inspection system. The method also includes determining differences between a value of a non-defect related characteristic of the patterned wafer and a known value of the non-defect related characteristic based on differences between one or more attributes of the output and one or more attributes of other output of the inspection system for a different patterned wafer having the known value of the non-defect related characteristic.
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3.发明申请公开(公告)号：US20130242295A1
公开(公告)日：2013-09-19
申请号：US13782785
申请日：2013-03-01
Applicant: KLA-TENCOR CORPORATION
Inventor： Daimian Wang , Tao-Yi Fu , Damon F. Kvamme
IPC: G01N21/88
CPC classification number: G01N21/8806 , G01N21/956 , G01N2021/95676
Abstract: The disclosure is directed to a system and method of providing illumination for reticle inspection. According to various embodiments of the disclosure, a multiplexing mirror system receives pulses of illumination from a plurality of illumination sources and directs the pulses of illumination along an illumination path to a plurality of field mirror facets. The field mirror facets receive at least a portion of illumination from the illumination path and direct at least a portion of the illumination to a plurality of pupil mirror facets. The pupil mirror facets receive at least a portion of illumination reflected from the field mirror facets and direct the portion of illumination along a delivery path to a reticle for imaging and/or defect inspection.
Abstract translation: 本公开涉及一种为掩模版检查提供照明的系统和方法。 根据本公开的各种实施例，复用镜系统从多个照明源接收照明脉冲，并将照明脉冲沿照明路径引导到多个场镜面。 场面镜面从照明路径接收照明的至少一部分，并将照明的至少一部分引导到多个光瞳镜面。 瞳孔镜面接收从场镜镜面反射的照明的至少一部分，并将照射部分沿着传送路径引导到掩模版用于成像和/或缺陷检查。
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