LIQUID PRECURSOR DELIVERY SYSTEM
    2.
    发明申请
    LIQUID PRECURSOR DELIVERY SYSTEM 审中-公开
    液体前列件输送系统

    公开(公告)号:US20170056912A1

    公开(公告)日:2017-03-02

    申请号:US14760227

    申请日:2014-12-30

    CPC classification number: B05B17/06 B05B9/002 C23C16/4486 C23C16/45561

    Abstract: Disclosed is a liquid precursor delivery system that enables a thin film deposition process to be performed at a low temperature like 350° C. or lower in a process of manufacturing semiconductor devices or displays. The liquid precursor delivery system includes an aerosol generator, a vaporizer, and a vapor storage tank. The aerosol generator changes a liquid precursor into an aerosol precursor using ultrasonic vibrations. The vaporizer has a heater block in which a plurality of sloped plate-shaped heaters is arranged in a zigzag form and in which the aerosol precursor changes into a gas precursor by colliding with the heaters and thus obtaining heat energy. The vapor storage tank stores the gas precursor while maintaining a constant pressure and temperature of the gas precursor and delivers the gas precursor to a process chamber when a thin film deposition process is performed.

    Abstract translation: 公开了一种液体前体输送系统,其能够在制造半导体器件或显示器的过程中在350℃或更低的低温下进行薄膜沉积工艺。 液体前体输送系统包括气溶胶发生器,蒸发器和蒸汽储存罐。 气溶胶发生器使用超声波振动将液体前体改变成气溶胶前体。 蒸发器具有加热器块,其中多个倾斜的板状加热器以锯齿形布置,并且其中气溶胶前体通过与加热器碰撞而变成气体前体,从而获得热能。 当进行薄膜沉积处理时,蒸汽储存罐储存气体前体,同时保持气体前体的恒定压力和温度,并将气体前体输送到处理室。

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