公开(公告)号：US20140284718A1

公开(公告)日：2014-09-25

申请号：US14196058

申请日：2014-03-04

Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY

Inventor： Jung Ah LIM ,  Yong-Won SONG ,  Jae-Min HONG ,  Joo Young CHANG

IPC: H01L29/49 ,  H01L29/786 ,  C01B31/04

CPC classification number: C01B32/192 ,  H01L21/0237 ,  H01L21/02527 ,  H01L21/02601 ,  H01L21/02628 ,  H01L21/02664 ,  H01L29/1606 ,  H01L29/401 ,  H01L29/41725 ,  H01L29/41733 ,  H01L29/458 ,  H01L29/66477 ,  Y10T428/24802

Abstract: Disclosed are a method of manufacturing a reduced graphene oxide pattern which includes forming a graphene oxide pattern on a substrate and providing the graphene oxide pattern with a white light pulse to reduce the graphene oxide, a reduced graphene oxide obtained by the method, and an electronic device and a thin film transistor including the reduced graphene oxide.

Abstract translation: 公开了一种制造还原型石墨烯氧化物图案的方法，该方法包括在基底上形成石墨烯氧化物图案，并提供具有白光脉冲的石墨烯氧化物图案以减少氧化石墨烯，通过该方法获得的还原石墨烯氧化物和电子 器件和包括还原石墨烯氧化物的薄膜晶体管。