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公开(公告)号:US12012537B2
公开(公告)日:2024-06-18
申请号:US17319095
申请日:2021-05-13
Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
Inventor: Seung Hee Han , Sung Ju Han , Min Seo , Min Gyeong Cho
IPC: C09K11/65 , B82B3/00 , B82Y20/00 , B82Y40/00 , C01B32/26 , C01B32/28 , C23C14/06 , C23C14/48 , C23C14/58 , C30B31/20 , C30B33/00 , G01N21/64
CPC classification number: C09K11/65 , B82B3/008 , C01B32/26 , C01B32/28 , C23C14/0611 , C23C14/48 , C23C14/5806 , C23C14/5853 , C30B31/20 , C30B33/00 , B82Y20/00 , B82Y40/00 , C01P2002/72 , C01P2002/86 , C01P2004/04 , C01P2004/64 , G01N2021/6439
Abstract: The present invention relates to a fluorescent nanodiamond preparing method including a first operation of preparing nanodiamonds having an average particle diameter of 10 nm or less, a second operation of implanting plasma ions into the nanodiamonds, a third operation of heat-treating the nanodiamonds implanted with the plasma ions under a vacuum or inert gas atmosphere, a fourth operation of oxygen treatment of the heat-treated nanodiamonds under a gas atmosphere including oxygen to oxidize the surfaces of the nanodiamonds, a fifth operation of acid-treating the oxygen-treated nanodiamonds, a sixth operation of centrifuging and cleaning the acid-treated nanodiamonds, and a seventh operation of drying the cleaned nanodiamonds, wherein, in the second operation, the plasma ions are implanted at an incident ion dose of 1013 ions/cm2 or more and 1020 ions/cm2 or less.
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公开(公告)号:US10566478B2
公开(公告)日:2020-02-18
申请号:US15705342
申请日:2017-09-15
Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
Inventor: Jeung-Hyun Jeong , Jong-Keuk Park , Won Mok Kim , Seung Hee Han , Doh Kwon Lee
IPC: H01L31/18 , H01L31/0463 , H01L31/0224 , H01L31/032 , H01L31/0392 , H01L31/0468
Abstract: Provided are a thin-film solar cell module structure and a method of manufacturing the same.
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公开(公告)号:US10337099B2
公开(公告)日:2019-07-02
申请号:US15240253
申请日:2016-08-18
Applicant: Korea Institute of Science and Technology
Inventor: Seung Hee Han , Se Hoon An , Geun Hyuk Lee , In Seol Song , Seong Woo Jang
Abstract: An apparatus and a method for coating an inner wall of a metal tube are provided. The apparatus for coating an inner wall of a metal tube includes mounting posts on which both end openings of a metal tube are mounted and configured to block the inside of the metal tube from the ambient air so that a pressure in the metal tube is adjustable by the vacuum exhaust and inflow of process gases, a sputtering target metal tube installed inside the metal tube coaxially with the metal tube, a pulse electromagnet installed around an outside perimeter of the metal tube coaxially with the metal tube to apply a pulse magnetic field in an axial direction of the metal tube, an electromagnetic pulse power supply unit configured to apply pulse power to the pulse electromagnet, and a sputtering pulse power supply unit configured to synchronize a negative high-voltage pulse with the pulse power applied to the pulse electromagnet and apply to the sputtering target metal tube.
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