公开(公告)号：US09562287B2

公开(公告)日：2017-02-07

申请号：US14082831

申请日：2013-11-18

Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY

Inventor： Myung Jong Kim ,  Sungchan Park ,  Hyunjin Cho ,  Sukang Bae ,  Jin-Hyung Park ,  Jung Ho Kang ,  Sang Ook Kang ,  Changhyup Lee

IPC: C23C14/34 ,  C23C16/34 ,  C23C18/12 ,  C23C18/14

CPC classification number: C23C16/342 ,  C23C14/34 ,  C23C18/1204 ,  C23C18/1233 ,  C23C18/1241 ,  C23C18/1245 ,  C23C18/1275 ,  C23C18/1283 ,  C23C18/14

Abstract: Provided is a method for producing a high-quality boron nitride film grown by using a borazine oligomer as a precursor through a metal catalyst effect. The method solves the problems, such as control of a gaseous precursor and vapor pressure control, occurring in CVD (Chemical vapor deposition) according to the related art, and a high-quality hexagonal boron nitride film is obtained through a simple process at low cost. In addition, the hexagonal boron nitride film may be coated onto various structures and materials. Further, selective coating is allowed so as to carry out coating in a predetermined area and scale-up is also allowed. Therefore, the method may be useful for coating applications of composite materials and various materials.

Abstract translation: 本发明提供一种通过金属催化剂作用作为前体使用环硼烷低聚物生长的高品质氮化硼膜的制造方法。 该方法解决了根据现有技术在CVD（化学气相沉积）中发生的气态前体的控制和蒸汽压力控制的问题，并且通过简单的方法以低成本获得高质量的六方氮化硼膜 。 此外，六方氮化硼膜可以涂覆到各种结构和材料上。 此外，允许选择性涂布以在预定区域中进行涂布，并且还允许放大。 因此，该方法可用于复合材料和各种材料的涂覆应用。