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公开(公告)号：US20130212951A1
公开(公告)日：2013-08-22
申请号：US13761338
申请日：2013-02-07
发明人： Bong-Su AHN , Young-Jun JANG , Sang-Mok LEE , Hwi-Kuk CHUNG , Kee-Cheon SONG , Seung-Geun KIM , Jang-Won SEO , Jeong-Seon CHOO
IPC分类号： B24D3/32
CPC分类号： B24D3/32 , B24B37/24 , B24D3/34 , B24D11/003
摘要： Polishing pad and method of manufacturing the same, the method including: (a) mixing materials for forming a polishing layer; (b) mixing at least two from among inert gas, a capsule type foaming agent, a chemical foaming agent, and liquid microelements that are capable of controlling sizes of pores, with the mixture in (a) so as to form two or more types of pores; (c) performing gelling and hardening of the mixture generated in (b) so as to form a polishing layer including the two or more types of pores; and (d) processing the polishing layer so as to distribute micropores defined by opening the two or more types of pores on a surface of the polishing layer.
摘要翻译： 抛光垫及其制造方法，该方法包括：（a）混合用于形成抛光层的材料; （b）混合来自惰性气体，胶囊型发泡剂，化学发泡剂和能够控制孔尺寸的液体微量元素中的至少两种，（a）中的混合物形成两种或更多种 的毛孔; （c）进行（b）中生成的混合物的凝胶化和硬化，以形成包含两种或多种类型的孔的抛光层; 以及（d）处理抛光层以便在抛光层的表面上分布通过打开两种或多种类型的孔所限定的微孔。
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公开(公告)号：US20140364044A1
公开(公告)日：2014-12-11
申请号：US14464985
申请日：2014-08-21
发明人： Bong-Su AHN , Young-Jun JANG , Sang-Mok LEE , Hwi-Kuk CHUNG , Kee-Cheon SONG , Seung-Geun KIM , Jang-Won SEO , Jeong-Seon CHOO
CPC分类号： B24D3/32 , B24B37/24 , B24D3/34 , B24D11/003
摘要： Polishing pad and method of manufacturing the same, the method including: (a) mixing materials for forming a polishing layer; (b) mixing at least two from among inert gas, a capsule type foaming agent, a chemical foaming agent, and liquid microelements that are capable of controlling sizes of pores, with the mixture in (a) so as to form two or more types of pores; (c) performing gelling and hardening of the mixture generated in (b) so as to form a polishing layer including the two or more types of pores; and (d) processing the polishing layer so as to distribute micropores defined by opening the two or more types of pores on a surface of the polishing layer.
摘要翻译： 抛光垫及其制造方法，该方法包括：（a）混合用于形成抛光层的材料; （b）混合来自惰性气体，胶囊型发泡剂，化学发泡剂和能够控制孔尺寸的液体微量元素中的至少两种，（a）中的混合物形成两种或更多种 的毛孔; （c）进行（b）中生成的混合物的凝胶化和硬化，以形成包含两种或多种类型的孔的抛光层; 以及（d）处理抛光层以便在抛光层的表面上分布通过打开两种或多种类型的孔所限定的微孔。
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公开(公告)号：US20180118908A1
公开(公告)日：2018-05-03
申请号：US15534828
申请日：2016-04-06
发明人： Seung-Geun KIM , Hak-Su KANG , Jeong-Seon CHOO , Dae-Han JUNG , Gi-Young PARK
摘要： A method of manufacturing a polishing pad includes producing an urethane prepolymer having a viscosity of 20,000 cps (at 25° C.) to 40,000 cps (at 25° C.) by mixing a plurality of polymers, mixing the urethane prepolymer with an inert gas and a low-boiling blowing agent having a boiling point of 60° C. to 150° C., and manufacturing a polishing layer including porous pores by causing a mixture produced at the mixing to be subjected to gelation and curing in a predetermined cast.
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