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公开(公告)号：US20210317282A1
公开(公告)日：2021-10-14
申请号：US17304653
申请日：2021-06-24
摘要： Various embodiments disclosed relate to pore inducers and porous abrasive forms made using the same. In various embodiments, the present invention provides a method of forming a porous abrasive form including heating an abrasive composition including pore inducers to form the porous abrasive form. During the heating the pore inducers in the porous abrasive form reduce in volume to form induced pores in the porous abrasive form.
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公开(公告)号：US10702970B2
公开(公告)日：2020-07-07
申请号：US15863552
申请日：2018-01-05
发明人： Chung-Chih Feng , I-Peng Yao , Lyang-Gung Wang , Wei-Te Liu , Wen-Chieh Wu , Yung-Chang Hung
IPC分类号： B24B37/22 , B24D3/32 , B24B37/24 , H01L21/306
摘要： The present invention relates to a polishing having a polishing layer, an elastic base layer and a binder layer. The binder layer binds the elastic base layer to the polishing layer. A compressibility of the elastic base layer is greater than a compressibility of the polishing layer. The present invention further provides a polishing apparatus and a method for polishing a substrate.
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3.发明授权公开(公告)号：US10518383B2
公开(公告)日：2019-12-31
申请号：US15989403
申请日：2018-05-25
申请人： SKC CO., LTD.
发明人： Jaein Ahn , Jang Won Seo , Sunghoon Yun , Su Young Moon , Myung-Ok Kyun
IPC分类号： B24B37/24 , C08G18/10 , C08J9/32 , B24D3/32 , H01L21/306 , B24B37/20 , H01L21/321 , H01L23/532
摘要： The embodiments relate to a porous polyurethane polishing pad and a process for preparing a semiconductor device by using the same. The porous polyurethane polishing pad comprises a urethane-based prepolymer and a curing agent, and has a thickness of 1.5 to 2.5 mm, a number of pores whose average diameter is 10 to 60 μm, a specific gravity of 0.7 to 0.9 g/cm3, a surface hardness at 25° C. of 45 to 65 Shore D, a tensile strength of 15 to 25 N/mm2, an elongation of 80 to 250%, an AFM (atomic force microscope) elastic modulus of 101 to 250 MPa measured from a polishing surface in direct contact with an object to be polished to a predetermined depth wherein the predetermined depth is 1 to 10 μm.
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公开(公告)号：US20190283216A1
公开(公告)日：2019-09-19
申请号：US16318655
申请日：2017-07-19
摘要： An abrasive agglomerate particle includes fused aluminum oxide mineral bonded in a vitreous matrix. The fused aluminum oxide mineral is present in a range from 70 percent by weight to 95 percent by weight and the vitreous matrix is present at least at five percent by weight, based on the weight of the abrasive agglomerate particle. The fused aluminum oxide mineral has an average particle size of up to 300 micrometers, and the abrasive agglomerate particle has a frusto-pyramidal shape with side walls having a taper angle in a range from 2 to 15 degrees and a dimension of at least 400 micrometers. The abrasive agglomerate particles are useful in abrasive articles. The method includes contacting the workpiece with an abrasive article and moving the workpiece and the abrasive article relative to each other to abrade the workpiece.
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公开(公告)号：US10414023B2
公开(公告)日：2019-09-17
申请号：US14780913
申请日：2014-03-19
摘要： Nonwoven abrasive articles comprise a nonwoven abrasive member having an overlayer composition comprising a fatty acid metal salt disposed thereon adjacent to a working surface. The nonwoven abrasive member comprises abrasive particles adhered to a fiber web by a binder. The abrasive particles may be exposed and/or the nonwoven abrasive member may have suitable frictional properties. Methods of making the same are also disclosed.
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公开(公告)号：US10040226B2
公开(公告)日：2018-08-07
申请号：US14584548
申请日：2014-12-29
申请人： ENTEGRIS, INC.
发明人： Briant Enoch Benson
IPC分类号： B29C44/12 , A46B13/00 , A46B13/02 , B08B1/04 , B24D3/32 , B24D5/10 , H01L21/02 , B29C37/00 , B29C44/00 , B29K29/00
CPC分类号： B29C44/12 , A46B13/008 , A46B13/02 , A46B2200/3086 , B08B1/04 , B24D3/32 , B24D5/10 , B29C37/0078 , B29C44/005 , B29C44/1209 , B29C44/1214 , B29K2029/04 , H01L21/02074 , H01L21/67046 , Y10S134/902 , Y10S438/906
摘要： The present invention includes methods and materials for cleaning materials, particles, or chemicals from a substrate with a brush or pad. The method comprising: engaging a surface of a rotating wafer with an outer circumferential surface of a rotating cylindrical foam roller, the cylindrical foam roller having a plurality of circumferentially and outwardly extending spaced apart nodules extending from the outer surface, each nodule defining a height extending from the outer surface of the cylindrical foam roller to a substrate engagement surface of the nodule, the substrate engagement surface of one or more of the nodules having a rounded configuration; and positioning the cylindrical foam roller on the substrate such that the one or more nodules are positioned to have only the rounded substrate engagement surface contact the substrate such that no linear surface of the one or more nodules contacts the substrate.
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公开(公告)号：US20170225300A1
公开(公告)日：2017-08-10
申请号：US15502942
申请日：2015-08-05
CPC分类号： B24D18/0027 , B24D3/02 , B24D3/20 , B24D3/32 , B24D5/04
摘要： A method of making an abrasive article comprises urging a malleable thermosetting melt-flowable composition through openings extending through a porous abrasive member to form an abrasive article precursor; which is heated to form the abrasive article. Multiple abrasive articles may be stacked prior to heating. Methods can be used to fabricate abrasive articles such as grinding wheels and cut-off wheels.
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公开(公告)号：US09669518B2
公开(公告)日：2017-06-06
申请号：US14468621
申请日：2014-08-26
发明人： Chung-Chih Feng , I-Peng Yao , Wen-Chieh Wu , Yung-Chang Hung
CPC分类号： B24D3/32 , B24B37/24 , B24D11/00 , B24D11/001 , B24D11/006
摘要： The present invention relates to a polishing pad and a method for making the same. The polishing pad has a grinding layer. The grinding layer includes a plurality of fibers and a main body. The fineness of the fibers is 0.001 den to 6 den. The main body is a foam and encloses the fibers. The main body has a plurality of first pores and a plurality of second pores, wherein the first pores are communicated with each other, and the second pores are independent from each other. The size of the first pores is at least 5 times greater than the size of the second pores. The hardness of the grinding layer is 30 to 90 shore D, and the compression ratio thereof is 1% to 10%.
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公开(公告)号：US09662768B2
公开(公告)日：2017-05-30
申请号：US14562144
申请日：2014-12-05
发明人： Muthukrishnan Sharmila , Adiseshaiah K. Sathyanarayanaiah , Srirangapattana Narasimhaiah Srihari , Sérgio Andrade De Melo , André Volpiani
CPC分类号： B24D11/02 , B24D3/004 , B24D3/32 , B24D11/005
摘要： A coated abrasive article including a body having a backing including a spunlace polyester-based material and a saturant contained in the spunlace polyester-based material, the saturant including a material selected from the group of phenolic resin, acrylic, urea resin, and a combination thereof, and an abrasive layer overlying the backing including abrasive particles.
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公开(公告)号：US20150231758A1
公开(公告)日：2015-08-20
申请号：US14184286
申请日：2014-02-19
发明人： George McClain , Alan Saikin , David Kolesar , Aaron Sarafinas , Robert L. Post
CPC分类号： B24B37/24 , B24D3/32 , B24D18/0009
摘要： A method of making a polishing layer for polishing a substrate selected from at least one of a magnetic substrate, an optical substrate and a semiconductor substrate is provided, comprising: providing a liquid prepolymer material; providing a plurality of hollow microspheres; exposing the plurality of hollow microspheres to a carbon dioxide atmosphere for an exposure period to form a plurality of treated hollow microspheres; combining the liquid prepolymer material with the plurality of treated hollow microspheres to form a curable mixture; allowing the curable mixture to undergo a reaction to form a cured material, wherein the reaction is allowed to begin ≦24 hours after the formation of the plurality of treated hollow microspheres; and, deriving at least one polishing layer from the cured material; wherein the at least one polishing layer has a polishing surface adapted for polishing the substrate.
摘要翻译： 提供了制造用于抛光选自磁性基板，光学基板和半导体基板中的至少一个的基板的抛光层的方法，包括：提供液体预聚物材料; 提供多个中空微球; 将多个中空微球暴露于二氧化碳气氛中曝光期以形成多个经处理的中空微球; 将液体预聚物材料与多个经处理的中空微球组合以形成可固化混合物; 允许可固化混合物经历反应以形成固化材料，其中允许反应在形成多个处理的中空微球后24小时开始; 并从所述固化材料得到至少一个抛光层; 其中所述至少一个抛光层具有适于抛光所述基底的抛光表面。
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