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    POLISHING APPARATUS
    2.
    发明公开
    POLISHING APPARATUS 审中-公开

    公开(公告)号：US20240139911A1

    公开(公告)日：2024-05-02

    申请号：US18384141

    申请日：2023-10-26

    申请人： Samsung Display Co., LTD.

    发明人： JUNHEE BAE ,  JINSOO SHIN ,  HYUNHEE LEE ,  SEUNGPYO HONG

    IPC分类号： B24D3/20 ,  B24D3/34

    CPC分类号： B24D3/20 ,  B24D3/34

    摘要： A polishing apparatus includes a shank including a rotation shaft extending in a first direction, a first cushion unit covering a side surface of the shank and having a first hardness, a first film unit adjacent to the first cushion unit in a second direction crossing the first direction and covering a side surface of the first cushion unit, a second cushion unit disposed below the shank, having a second hardness different from the first hardness, and including a first part and a second part. The first part has a cylindrical shape and the second part is disposed below the first part and has a conical shape protruding in a direction opposite to the first part, and a second film unit covering the second part.

    ABRASIVE ARTICLES
    6.
    发明申请
    ABRASIVE ARTICLES 审中-公开
    磨砂文章

    公开(公告)号：US20170021473A1

    公开(公告)日：2017-01-26

    申请号：US15197195

    申请日：2016-06-29

    申请人： SAINT-GOBAIN ABRASIVES, INC. ,  SAINT-GOBAIN ABRASIFS

    发明人： Canfeng WANG ,  Guodong CHEN ,  Zhen ZHOU ,  Xiaochao SONG ,  Andrew B. SCHOCH

    IPC分类号： B24D3/34 ,  B24D18/00 ,  C09K3/14

    CPC分类号： B24D3/34 ,  B24D3/344 ,  B24D18/0009 ,  C09K3/1436

    摘要： An abrasive article can include a body including a bond material and abrasive particles contained within the bond material. The body can include a filler composition. In a particular embodiment, the filler composition can include at least one filler from a first filler class and at least one filler from a second filler class. The first filler class can include pyrite, potassium sulfate (K2SO4), potassium chloride (KCl), and lime (CaO), and a combination thereof, and the second filler class includes basalt, mullite, zinc sulfide (ZnS), barium sulfate (BaSO4), potassium titanate (K2O.nTiO2) or a combination thereof. In another particular embodiment, the filler composition can include a second filler class including basalt in a content within a range between 1 wt % and not greater than 30 wt % for a total weight of the body. In another particular embodiment, the filler composition can include a second filler class including zinc sulfide (ZnS) in a content within a range between 1 wt % and not greater than 30 wt % for a total weight of the body. In still another particular embodiment, the filler composition can include a second filler class including barium sulfate (BaSO4) in a content within a range between 1 wt % and not greater than 30 wt % for a total weight of the body. In another particular embodiment, the filler composition can include a second filler class including potassium titanate (K2O.nTiO2) in a content within a range between 0.1 wt % and not greater than 30 wt % for a total weight of the body. In another particular embodiment, the filler composition can include a second filler class including mullite in a content within a range between 1 wt % and not greater than 30 wt % for a total weight of the body.

    摘要翻译： 研磨制品可以包括包含粘合材料的主体和包含在粘合材料内的磨料颗粒。 身体可以包括填充剂组合物。 在一个具体实施方案中，填料组合物可以包括来自第一填料类的至少一种填料和来自第二填料类的至少一种填料。 第一种填料类可包括黄铁矿，硫酸钾（K 2 SO 4），氯化钾（KCl）和石灰（CaO）及其组合，第二类填料类包括玄武岩，莫来石，硫化锌（ZnS），硫酸钡 BaSO 4），钛酸钾（K 2 O·nTiO 2）或其组合。 在另一个具体实施方案中，填料组合物可以包括第二填料类，其包括对于体重的总重量，含量在1重量％至不大于30重量％范围内的玄武岩。 在另一个具体实施方案中，填料组合物可包括第二填料级，其包含在体重总重量的1重量％至不大于30重量％范围内的硫化锌（ZnS）。 在另一个具体实施方案中，填料组合物可以包括第二填料级，其包括在体积总重量的1重量％至不大于30重量％的范围内的硫酸钡（BaSO 4）。 在另一个具体实施方案中，填料组合物可包括第二填料级，包括钛酸钾（K 2 O·nO 2 O 2），其含量在体重总重量的0.1重量％至不大于30重量％的范围内。 在另一个具体实施方案中，填料组合物可以包括第二填料级，其包括对于体重的总重量，含量在1重量％至不大于30重量％之间的范围内的莫来石。

    ABRASIVE GRINDSTONE
    7.
    发明申请
    ABRASIVE GRINDSTONE 审中-公开
    磨砂磨石

    公开(公告)号：US20160236325A1

    公开(公告)日：2016-08-18

    申请号：US15042556

    申请日：2016-02-12

    申请人： DISCO CORPORATION

    发明人： Ryuji Oshima ,  Ryogo Maji

    IPC分类号： B24D3/34

    CPC分类号： B24D3/34 ,  B24D3/06

    摘要： An abrasive grindstone for grinding a workpiece is disclosed. The abrasive grindstone includes diamond abrasive grains and a boron compound. The diamond abrasive grains and the boron compound are compounded at a predetermined volume ratio. The average grain size Y of the diamond abrasive grains is set to 0 μm

    摘要翻译： 公开了一种用于研磨工件的研磨砂轮。 研磨磨石包括金刚石磨粒和硼化合物。 金刚石磨粒和硼化合物以预定的体积比混合。 金刚石磨粒的平均粒径Y设定为0μm

    POLISHING PAD AND METHOD OF MANUFACTURING THE SAME
    10.
    发明申请
    POLISHING PAD AND METHOD OF MANUFACTURING THE SAME 审中-公开
    抛光垫及其制造方法

    公开(公告)号：US20140364044A1

    公开(公告)日：2014-12-11

    申请号：US14464985

    申请日：2014-08-21

    申请人： KPX CHEMICAL CO., LTD. ,  SAMSUNG ELECTRONICS CO., LTD.

    发明人： Bong-Su AHN ,  Young-Jun JANG ,  Sang-Mok LEE ,  Hwi-Kuk CHUNG ,  Kee-Cheon SONG ,  Seung-Geun KIM ,  Jang-Won SEO ,  Jeong-Seon CHOO

    IPC分类号： B24D3/32 ,  B24D11/00

    CPC分类号： B24D3/32 ,  B24B37/24 ,  B24D3/34 ,  B24D11/003

    摘要： Polishing pad and method of manufacturing the same, the method including: (a) mixing materials for forming a polishing layer; (b) mixing at least two from among inert gas, a capsule type foaming agent, a chemical foaming agent, and liquid microelements that are capable of controlling sizes of pores, with the mixture in (a) so as to form two or more types of pores; (c) performing gelling and hardening of the mixture generated in (b) so as to form a polishing layer including the two or more types of pores; and (d) processing the polishing layer so as to distribute micropores defined by opening the two or more types of pores on a surface of the polishing layer.

    摘要翻译： 抛光垫及其制造方法，该方法包括：（a）混合用于形成抛光层的材料; （b）混合来自惰性气体，胶囊型发泡剂，化学发泡剂和能够控制孔尺寸的液体微量元素中的至少两种，（a）中的混合物形成两种或更多种 的毛孔; （c）进行（b）中生成的混合物的凝胶化和硬化，以形成包含两种或多种类型的孔的抛光层; 以及（d）处理抛光层以便在抛光层的表面上分布通过打开两种或多种类型的孔所限定的微孔。