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1.
公开(公告)号:US20190039022A1
公开(公告)日:2019-02-07
申请号:US16084472
申请日:2016-09-20
Applicant: KURITA WATER INDUSTRIES LTD.
Inventor: Hidekuni KAMEDA , Hideyuki KOMORI
Abstract: The formation of scale in a reverse osmosis membrane apparatus is reduced at low water temperatures without the necessity of pH adjustment or addition of a scale dispersant to continue a consistent operation for a long period of time. The operation of a reverse osmosis membrane apparatus is controlled on the basis of the concentration of aluminum ions and/or iron ions in the feed to the reverse osmosis membrane apparatus and/or the concentrate from the reverse osmosis membrane apparatus. Not only silica but also aluminum ions and iron ions that are also present in the water significantly affect the reduction in the flux of a reverse osmosis membrane which is caused by silica scale. It is necessary to appropriately control the concentration of aluminum ions and/or iron ions in the feed and/or the concentrate to consistently operate a reverse osmosis membrane apparatus for a long period of time.
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公开(公告)号:US20160086812A1
公开(公告)日:2016-03-24
申请号:US14961028
申请日:2015-12-07
Applicant: KURITA WATER INDUSTRIES LTD.
Inventor: Hideyuki KOMORI , Nobuhiro ORITA
IPC: H01L21/306
CPC classification number: H01L21/30604 , B01D61/027 , B01D61/12 , B01D61/145 , B01D61/22 , B01D61/58 , B01D2311/06 , C02F1/52 , C02F1/66 , C02F11/12 , C02F2001/5218 , C02F2103/346 , Y02W10/37 , B01D2311/12 , B01D2311/24 , B01D2311/18 , B01D2311/243 , B01D2311/10
Abstract: A method for treating an etching solution in order to circulate and reuse an etching solution used in etching treatment of silicon includes (1) selectively removing multivalent ions having a valence of two or more, or (2) removing multivalent ions having a valence of two or more, 20-50% of alkali metal ions having a valence of one relative to a total amount of the alkali metal ions, and hydroxide ions, through a membrane separation unit comprising a nanofiltration membrane. A permeated solution of the membrane separation unit is circulated to the etching bath.
Abstract translation: 用于处理蚀刻溶液以便循环和再利用用于硅的蚀刻处理的蚀刻溶液的方法包括(1)选择性地除去两价或更多价的多价离子,或(2)除去二价离子的二价离子 以上,通过包含纳滤膜的膜分离单元,相对于碱金属离子的总量和氢氧离子,具有1价的碱金属离子的20-50%以上。 膜分离单元的渗透溶液循环到蚀刻浴。
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3.
公开(公告)号:US20190381456A1
公开(公告)日:2019-12-19
申请号:US16489173
申请日:2017-09-08
Applicant: KURITA WATER INDUSTRIES LTD.
Inventor: Hidekuni KAMEDA , Hideyuki KOMORI
Abstract: A method for managing an operation of a reverse osmosis membrane device, includes managing the operation of the reverse osmosis membrane device based on an aluminum ion concentration and/or an iron ion concentration of a feed water and/or a concentrated water of the reverse osmosis membrane device. Any one or more of suitability of a raw water as the feed water, a water temperature of the feed water, a concentration ratio (recovery rate), a pressure (feed water supply pressure, concentrated water pressure, or treated water pressure of the reverse osmosis membrane), an amount of the concentrated water, a continuous operation period, a washing time, a wash frequency, and a timing of replacement of the reverse osmosis membrane are managed based on the aluminum ion concentration and/or the iron ion concentration of the feed water and/or the concentrated water.
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公开(公告)号:US20180079663A1
公开(公告)日:2018-03-22
申请号:US15562750
申请日:2016-03-30
Inventor: Shingo MIYAMOTO , Mami HIROSE , Mamoru IWASAKI , Hideyuki KOMORI , Motohiro AIZAWA , Nobuyuki OTA , Takako SUMIYA , Kazushige ISHIDA
CPC classification number: C02F1/4695 , B01D61/48 , C02F1/469 , C02F2101/203 , C25C1/08 , C25C7/04 , G21F9/06 , G21F9/12
Abstract: A method in which an anode chamber and a cathode chamber are separated by a cation exchange membrane, an acid solution containing metal ions is introduced into the anode chamber, a cathode solution is introduced into the cathode chamber, and a current is applied across the anode and the cathode, whereby the metal ions in the solution in the anode chamber pass through the cation exchange membrane, move into the cathode solution, and precipitate as metal onto the cathode, wherein there are minimal instances where electrodeposition is impossible or the electrodeposition rate decreases. Pre-adding a salt of the acid contained in the acid solution makes it possible to suppress concentration-diffusion of the acid from the acid solution. Adding a salt of the acid into the cathode chamber makes it possible to reduce the impressed voltage, reduce the amount of hydrogen generated on the cathode, and reduce the amount of power.
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