公开(公告)号：US20110275675A1

公开(公告)日：2011-11-10

申请号：US13097100

申请日：2011-04-29

申请人： Kai Rist ,  Ulrich Salz ,  Volker Rheinberger

发明人： Kai Rist ,  Ulrich Salz ,  Volker Rheinberger

IPC分类号： A01N43/40 ,  A01P1/00 ,  C07D401/06

CPC分类号： A61K6/0005 ,  A61K6/0008 ,  A61K6/0067 ,  A61K6/0088 ,  A61K6/0091 ,  A61K6/0205 ,  A61K6/0023 ,  C08L33/10 ,  C08L33/26 ,  A61K6/0017 ,  A61K6/083 ,  C08L33/08

摘要： Dental material which contains an antimicrobial active ingredient according to general formula (I), in which R1=H, C1 to C3 alkylene residue; R2=a linear or branched C4 to C20 alkylene residue; R3=a C6 to C20 alkylene residue; and A−=Cl−, Br−, I−, F−, OH−, alkyl and aryl alcoholate, thiolate, NO3−, BO33−, PO43−, HPO42−, H2PO4−, alkyl and aryl phosphate, alkyl and aryl phosphonate, PF6−, TiF62−, BF4−, acetylacetonate, β-diketonate or anion of a β-keto ester. The dental material is suitable in particular as tooth filling material, material for inlays or onlays, tooth cement, enamel/dentine adhesive, veneering material for crowns and bridges, or as material for false teeth.

摘要翻译： 含有根据通式（I）的抗微生物活性成分的牙科材料，其中R1 = H，C1-C3亚烷基残基; R2 =直链或支链C4至C20亚烷基残基; R3 = C6〜C20亚烷基残基; 和A- = Cl-，Br-，I-，F-，OH-，烷基和芳基醇化物，硫醇盐，NO 3 - ，BO 33-，PO 43 - ，HPO 42 - ，H 2 PO 4 - ，烷基和芳基磷酸酯，烷基和芳基膦酸酯 ，PF6-，TiF62-，BF4-，乙酰丙酮化物和β-酮酸酯或β-酮酯的阴离子。 牙科材料特别适用于牙齿填充材料，嵌体或镶嵌材料，牙膏，牙釉质/牙质粘合剂，冠和桥的饰面材料，或作为假牙的材料。

公开(公告)号：US20140371341A1

公开(公告)日：2014-12-18

申请号：US14343300

申请日：2012-09-10

申请人： Norbert Moszner ,  Thomas Hirt ,  Kai Rist ,  Ulrich Salz ,  Christoph Weder ,  Gina Fiore ,  Christian Heinzmann ,  Volker Rheinberger

发明人： Norbert Moszner ,  Thomas Hirt ,  Kai Rist ,  Ulrich Salz ,  Christoph Weder ,  Gina Fiore ,  Christian Heinzmann ,  Volker Rheinberger

IPC分类号： A61K6/083 ,  C07D239/47 ,  C08F122/22 ,  C07F3/06

CPC分类号： A61K6/0835 ,  A61K6/0002 ,  A61K6/0023 ,  A61K6/083 ,  C07D239/47 ,  C07F3/06 ,  C08F122/22 ,  C08L33/00

摘要： The invention relates to a dental restorative material which comprises a thermolabile compound of Formula I: [(Z1)m-Q1-X)]k-T-[Y-Q2-(Z2)n]l  Formula I, in which T represents a thermolabile unit which contains at least one thermolabile group based on non-covalent interactions, Z1 and Z2 in each case independently represent a polymerizable group selected from vinyl groups, CH2═CR1—CO—O— and CH2═CR1—CO—NR2— or an adhesive group selected from —Si(OR)3, —COOH, —O—PO(OH)2, —PO(OH)2, —SO2OH and —SH, Q1 in each case independently is missing or represents an (m+1)-valent linear or branched aliphatic C1-C20 radical which can be interrupted by —O—, —S—, —CO—O—, —O—CO—, —CO—NR3—, —NR3—CO—, —O—CO—NR3—, —NR3—CO—O— or —NR3—CO—NR3—, Q2 in each case independently is missing or represents an (n+1)-valent linear or branched aliphatic C1-C20 radical which can be interrupted by —O—, —S—, —CO—O—, —O—CO—, —CO—NR3—, —NR3—CO—, —O—CO—NR3—, —NR3—CO—O— or —NR3—CO—NR3—, X and Y in each case independently are missing or represent —O—, —S—, CO—O—, —O—CO—, —CO—NR3— or —NR3—CO—, R, R1, R2 and R3 in each case independently represent H or a C1-C7 alkyl radical, k and l in each case independently are 0, 1, 2 or 3 and m and n in each case independently are 1, 2 or 3.

公开(公告)号：US09320686B2

公开(公告)日：2016-04-26

申请号：US14343300

申请日：2012-09-10

申请人： Norbert Moszner ,  Thomas Hirt ,  Kai Rist ,  Ulrich Salz ,  Christoph Weder ,  Gina Fiore ,  Christian Heinzmann ,  Volker Rheinberger

发明人： Norbert Moszner ,  Thomas Hirt ,  Kai Rist ,  Ulrich Salz ,  Christoph Weder ,  Gina Fiore ,  Christian Heinzmann ,  Volker Rheinberger

IPC分类号： A61K6/083 ,  A61C7/00 ,  A61K6/00 ,  C07D239/47 ,  C07F3/06 ,  C08F122/22

CPC分类号： A61K6/0835 ,  A61K6/0002 ,  A61K6/0023 ,  A61K6/083 ,  C07D239/47 ,  C07F3/06 ,  C08F122/22 ,  C08L33/00

摘要： The invention relates to a dental restorative material which comprises a thermolabile compound of Formula I: [(Z1)m-Q1-X)]k-T-[Y-Q2-(Z2)n]l  Formula I, in which T represents a thermolabile unit which contains at least one thermolabile group based on non-covalent interactions, Z1 and Z2 in each case independently represent a polymerizable group selected from vinyl groups, CH2═CR1—CO—O— and CH2═CR1—CO—NR2— or an adhesive group selected from —Si(OR)3, —COOH, —O—PO(OH)2, —PO(OH)2, —SO2OH and —SH, Q1 in each case independently is missing or represents an (m+1)-valent linear or branched aliphatic C1-C20 radical which can be interrupted by —O—, —S—, —CO—O—, —O—CO—, —CO—NR3—, —NR3—CO—, —O—CO—NR3—, —NR3—CO—O— or —NR3—CO—NR3—, Q2 in each case independently is missing or represents an (n+1)-valent linear or branched aliphatic C1-C20 radical which can be interrupted by —O—, —S—, —CO—O—, —O—CO—, —CO—NR3—, —NR3—CO—, —O—CO—NR3—, —NR3—CO—O— or —NR3—CO—NR3—, X and Y in each case independently are missing or represent —O—, —S—, CO—O—, —O—CO—, —CO—NR3— or —NR3—CO—, R, R1, R2 and R3 in each case independently represent H or a C1-C7 alkyl radical, k and l in each case independently are 0, 1, 2 or 3 and m and n in each case independently are 1, 2 or 3.