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公开(公告)号:US06921727B2
公开(公告)日:2005-07-26
申请号:US10387160
申请日:2003-03-11
申请人: Kang-Lie Chiang , Mahmoud Dahimene , Xiaoye Zhao , Yan Ye , Gerardo A. Delgadino , Hoiman Hung , Li-Qun Xia , Giuseppina R. Conti
发明人: Kang-Lie Chiang , Mahmoud Dahimene , Xiaoye Zhao , Yan Ye , Gerardo A. Delgadino , Hoiman Hung , Li-Qun Xia , Giuseppina R. Conti
IPC分类号: H01L21/3105 , H01L21/311 , H01L21/768 , H01L21/31 , H01L21/469
CPC分类号: H01L21/31138 , H01L21/3105 , H01L21/31058 , H01L21/31111 , H01L21/31116 , H01L21/31133 , H01L21/76814 , H01L21/76826 , H01L21/76828 , H01L21/76831
摘要: A method of treating a dielectric layer having a low dielectric constant, where the dielectric layer has been processed in a manner that causes a change in the dielectric constant of an affected region of the layer. The treatment of the affected region may comprise etching, sputtering, annealing, or combinations thereof. The treatment returns the dielectric constant of the dielectric layer to substantially the dielectric constant that existed before processing.
摘要翻译: 一种处理具有低介电常数的电介质层的方法,其中介电层已经以导致该层的受影响区域的介电常数变化的方式被处理。 受影响区域的处理可以包括蚀刻,溅射,退火或其组合。 处理使介电层的介电常数恢复到加工前存在的介电常数。