公开(公告)号：US6085764A

公开(公告)日：2000-07-11

申请号：US98751

申请日：1998-06-17

申请人： Kanji Kobayashi ,  Masao Yamaguchi ,  Shinya Yoshihara ,  Toshio Kubota ,  Jun Kudo

发明人： Kanji Kobayashi ,  Masao Yamaguchi ,  Shinya Yoshihara ,  Toshio Kubota ,  Jun Kudo

IPC分类号： B08B3/10 ,  B08B3/12 ,  H01L21/00

CPC分类号： H01L21/67057 ,  B08B3/10 ,  B08B3/12 ,  Y10S134/902

摘要： A cleaning apparatus includes a cleaning tank for reserving cleaning fluid, an object to be cleaned being immersed in the cleaning fluid, a vibrator for vibrating the cleaning fluid in the cleaning tank, and two micro-vibration sources for minutely vibrating the object to be cleaned in two different directions.

摘要翻译： 一种清洁装置，包括：用于储存清洗液的清洗槽，待清洗物体浸入清洗液中;振动器，用于振动清洗槽中的清洗液;以及两个微振动源，用于使待清洗物体微小振动 在两个不同的方向。

公开(公告)号：US06178974B2

公开(公告)日：2001-01-30

申请号：US09572227

申请日：2000-05-17

申请人： Kanji Kobayashi ,  Masao Yamaguchi ,  Shinya Yoshihara ,  Toshio Kubota ,  Jun Kudo

发明人： Kanji Kobayashi ,  Masao Yamaguchi ,  Shinya Yoshihara ,  Toshio Kubota ,  Jun Kudo

IPC分类号： B08B312

CPC分类号： H01L21/67057 ,  B08B3/10 ,  B08B3/12 ,  Y10S134/902

摘要： A cleaning apparatus includes a cleaning tank for reserving cleaning fluid, an object to be cleaned being immersed in the cleaning fluid, a vibrator for vibrating the cleaning fluid in the cleaning tank, and two micro-vibration sources for minutely vibrating the object to be cleaned in two different directions.

摘要翻译： 一种清洁装置，包括：用于储存清洗液的清洗槽，待清洗物体浸入清洗液中;振动器，用于振动清洗槽中的清洗液;以及两个微振动源，用于使待清洗物体微小振动 在两个不同的方向。

公开(公告)号：US06254688B1

公开(公告)日：2001-07-03

申请号：US09204547

申请日：1998-12-03

申请人： Kanji Kobayashi ,  Jun Kudo ,  Masao Yamaguchi ,  Shinya Yoshihara

发明人： Kanji Kobayashi ,  Jun Kudo ,  Masao Yamaguchi ,  Shinya Yoshihara

IPC分类号： B08B312

CPC分类号： H01L21/67057 ,  B08B1/04 ,  B08B3/12 ,  H01L21/67046 ,  Y10S134/902

摘要： For cleaning a wafer by a cleaning apparatus, a cleaning liquid is contained in a cleaning bath. Leaving two brushes open, the wafer is inserted to the cleaning bath, placed on oscillation and rotation rollers and retained by the rollers. The brushes are closed and the wafer is held by the brushes. Next, the two brushes are rotated while the wafer is oscillated and rotated by the rollers and so on. Furthermore, ultrasonic vibrations are applied to the cleaning liquid in the cleaning bath by an ultrasonic generator. Scrub cleaning with the two brushes and ultrasonic cleaning by ultrasonic vibrations are thereby performed on the wafer.

摘要翻译： 为了通过清洁装置清洁晶片，清洗液中含有清洗液。 使两个电刷打开，将晶片插入清洗槽中，放置在摆动和旋转辊上并由辊保持。 电刷被关闭，晶片被电刷保持。 接下来，两个电刷旋转，同时晶片由辊等摆动并旋转。 此外，超声波振动通过超声波发生器施加到清洗槽中的清洗液。 由此在晶片上进行用两个刷子进行的擦洗和超声波振动的超声波清洗。

公开(公告)号：US06247198B1

公开(公告)日：2001-06-19

申请号：US09661435

申请日：2000-09-13

申请人： Kanji Kobayashi ,  Jun Kudo ,  Masao Yamaguchi ,  Shinya Yoshihara

发明人： Kanji Kobayashi ,  Jun Kudo ,  Masao Yamaguchi ,  Shinya Yoshihara

IPC分类号： B08B312

CPC分类号： H01L21/67057 ,  B08B1/04 ,  B08B3/12 ,  H01L21/67046 ,  Y10S134/902

摘要： For cleaning a wafer by a cleaning apparatus, a cleaning liquid is contained in a cleaning bath. Leaving two brushes open, the wafer is inserted to the cleaning bath, placed on oscillation and rotation rollers and retained by the rollers. The brushes are closed and the wafer is held by the brushes. Next, the two brushes are rotated while the wafer is oscillated and rotated by the rollers and so on. Furthermore, ultrasonic vibrations are applied to the cleaning liquid in the cleaning bath by an ultrasonic generator. Scrub cleaning with the two brushes and ultrasonic cleaning by ultrasonic vibrations are thereby performed on the wafer.

摘要翻译： 为了通过清洁装置清洁晶片，清洗液中含有清洗液。 使两个电刷打开，将晶片插入清洗槽中，放置在摆动和旋转辊上并由辊保持。 电刷被关闭，晶片被电刷保持。 接下来，两个电刷旋转，同时晶片由辊等摆动并旋转。 此外，超声波振动通过超声波发生器施加到清洗槽中的清洗液。 由此在晶片上进行用两个刷子进行的擦洗和超声波振动的超声波清洗。

公开(公告)号：US5993290A

公开(公告)日：1999-11-30

申请号：US19804

申请日：1998-02-06

申请人： Shinya Yoshihara ,  Hiroshi Shindou ,  Yoshiaki Ito ,  Masao Yamaguchi

发明人： Shinya Yoshihara ,  Hiroshi Shindou ,  Yoshiaki Ito ,  Masao Yamaguchi

IPC分类号： B24B7/16 ,  B24B7/22 ,  G11B5/127 ,  G11B5/187 ,  G11B5/31 ,  B24B1/00

CPC分类号： G11B5/1871 ,  B24B41/06 ,  B24B7/16 ,  B24B7/22 ,  G11B5/3103 ,  G11B5/3116 ,  G11B5/3163 ,  Y10T29/49048 ,  Y10T29/4905

摘要： In the case where an object to be ground is ground by mounting a horizontally elongated jig onto a grinding head and by bringing the object into contact with a grinding surface of a grinding disk being driven and rotated, the attitude of the grinding head is controlled by an adjust ring that is in surface contact with the grinding surface of the grinding disk while moving the grinding head, the horizontally elongated jig holding thereon the object that has a plurality of thin film magnetic heads arrayed thereon. Thereby, the flatness of the object is improved and variations in the throat heights of many magnetic heads formed on the object to be ground are reduced by allowing the attitude of the object to be controlled with a grinding surface of a grinding disk as a reference.

摘要翻译： 在通过将水平细长的夹具安装在研磨头上并通过使物体与被驱动和旋转的研磨盘的研磨表面接触来研磨被研磨物体的情况下，磨削头的姿态由 在移动研磨头的同时与研磨盘的磨削表面表面接触的调节环，水平伸长的夹具夹持在其上排列有多个薄膜磁头的物体。 由此，能够提高物体的平坦度，并且通过以研磨盘的研磨面作为基准来控制物体的姿态来减少形成在被研磨物上的许多磁头的喉部高度的变化。

公开(公告)号：US06361399B1

公开(公告)日：2002-03-26

申请号：US09861621

申请日：2001-05-22

申请人： Kanji Kobayashi ,  Masao Yamaguchi

发明人： Kanji Kobayashi ,  Masao Yamaguchi

IPC分类号： B24B4900

摘要： It is an object of the invention to prevent a lapping member from being cut by an edge of a slider when the edge is chamfered by lapping it with the lapping member. A slider held by a slider holding jig according to the invention is put in contact with a diamond lapping sheet. A load applying portion moves weights provided in the form of a plurality of stages downward from a state in which the lower end of a shaft portion of the weight at the bottom stage is located above the slider holding jig without contacting the slider holding jig, thereby loading the slider holding jig with the weights sequentially from the bottom stage.

公开(公告)号：US6040959A

公开(公告)日：2000-03-21

申请号：US64745

申请日：1998-04-23

申请人： Kanji Kobayashi ,  Masao Yamaguchi

发明人： Kanji Kobayashi ,  Masao Yamaguchi

IPC分类号： G11B5/48 ,  G11B5/60 ,  G11B21/21

CPC分类号： G11B5/6005 ,  G11B5/48

摘要： A slider has a rail with a medium facing surface. At least part of a lateral wall of the rail is located closer to a center of the slider than a lateral wall of the slider. First edges between the medium facing surface of each of the rails and the lateral wall of the rail and a second edge between the lateral wall of the slider and the medium facing surface are each blunt.

摘要翻译： 滑块具有带有中等面向表面的导轨。 轨道的侧壁的至少一部分位于比滑块的侧壁更靠近滑块的中心。 每个轨道的介质相对表面和轨道的侧壁之间的第一边缘以及滑块的侧壁和介质面向表面之间的第二边缘都是钝的。

公开(公告)号：US5301077A

公开(公告)日：1994-04-05

申请号：US904679

申请日：1992-06-26

申请人： Masao Yamaguchi ,  Takamitsu Kamimura ,  Kanji Kobayashi

发明人： Masao Yamaguchi ,  Takamitsu Kamimura ,  Kanji Kobayashi

IPC分类号： G11B5/60

CPC分类号： G11B5/6005

摘要： At the time of polishing an air bearing surface 12 the edge of the air bearing surface 12 is simultaneously beveled to form edge surfaces 14. The air bearing surface 12 is preferably constituted as a flat planar surface 121 having a tapered surface 122 continuous therewith at the air inflow end. In this case, defining the bevel width in regions IV located at the edge surfaces 14 at opposite sides in a direction perpendicular to the air inflow direction and extending in the vicinity of a ridge portion 131 between the central flat planar surface 121 and the tapered inflow end surface 122 and the bevel width in regions II located ahead of an interface 171 between the slider 1 and a thin-film transducer element 17 as I.sub.4 and I.sub.2 respectively, the bevel width of an air inflow end edge surface 14 (region V) continuous with the tapered inflow end surface 122 as I.sub.5 and the bevel width of opposite side edge surfaces 14 (region III) continuous with the central flat planar surface 121 as I.sub.3, (I.sub.4 -I.sub.5)/I.sub.5 is restricted to not more than 0.4, (I.sub.3 -I.sub.2)/I.sub.3 is restricted to not more than 0.2, the bevel width of all edge surfaces 14 is restricted to 4-20 .mu.m, or the bevel width range R thereof is restricted to not more than 5 .mu.m. By in this way restricting the bevel width of the edge surfaces 14 over the entire perimeter of the air bearing surface 12 so as to be highly uniform, there are realized marked improvements in flying stability, particularly a reduction in the variation in roll angle in the flying attitude.

摘要翻译： 在研磨空气轴承表面12时，空气轴承表面12的边缘同时被倒角以形成边缘表面14.空气轴承表面12优选地构成为平坦的平坦表面121，平坦的平面121具有与其连续的锥形表面122 空气流入端。 在这种情况下，在垂直于空气流入方向的方向相对侧的区域IV中限定位于边缘表面14的区域IV中的斜面宽度，并且在中心平坦平面121和锥形流入物之间的脊部131附近延伸 端面122和位于滑块1和薄膜换能器元件17之间的接口171前方的区域II中的斜面宽度分别为I4和I2，空气流入端边缘表面14（区域V）的斜面宽度连续 锥形流入端面122为I5，与中心平面面121连续的相对侧缘面14（区域III）的倾斜宽度为I3，（I4-I5）/ I5限制在0.4以下（ I3-I2）/ I3限制在不超过0.2，所有边缘表面14的斜面宽度限制在4-20（m）m，或者其斜面宽度范围R被限制在不超过5（my） m。 通过以这种方式限制边缘表面14在空气轴承表面12的整个周边上的斜面宽度以使其高度均匀，实现了飞行稳定性的显着改进，特别是减小了在 飞行态度

公开(公告)号：US06257959B1

公开(公告)日：2001-07-10

申请号：US09397869

申请日：1999-09-17

申请人： Kanji Kobayashi ,  Masao Yamaguchi

发明人： Kanji Kobayashi ,  Masao Yamaguchi

IPC分类号： B24B100

CPC分类号： G11B5/102 ,  B24B37/048 ,  B24B49/16 ,  G11B5/1871 ,  G11B5/3106

摘要： It is an object of the invention to prevent a lapping member from being cut by an edge of a slider when the edge is chamfered by lapping it with the lapping member. A slider held by a slider holding jig according to the invention is put in contact with a diamond lapping sheet. A load applying portion moves weights provided in the form of a plurality of stages downward from a state in which the lower end of a shaft portion of the weight at the bottom stage is located above the slider holding jig without contacting the slider holding jig, thereby loading the slider holding jig with the weights sequentially from the bottom stage.

摘要翻译： 本发明的一个目的是防止当边缘通过与研磨构件研磨而被倒角时，滑块的边缘被切割。 由根据本发明的滑块保持夹具保持的滑块与金刚石研磨片接触。 负载施加部分从底部的重物的轴部的下端位于滑块保持夹具上方而不与滑块保持夹具接触的状态向下移动以多级的形式提供的重物，由此 从底部顺序装载具有重物的滑块夹具。

公开(公告)号：US6162114A

公开(公告)日：2000-12-19

申请号：US64734

申请日：1998-04-23

申请人： Kanji Kobayashi ,  Masao Yamaguchi

发明人： Kanji Kobayashi ,  Masao Yamaguchi

IPC分类号： G11B5/60 ,  G11B5/187 ,  G11B5/31 ,  G11B7/22 ,  G11B11/105 ,  G11B21/21 ,  G11B5/127

CPC分类号： G11B5/1871 ,  B24B37/048 ,  G11B5/3106 ,  G11B5/3116 ,  G11B7/122 ,  G11B7/22 ,  G11B11/1058 ,  Y10T29/49041 ,  Y10T29/4905

摘要： A method and an apparatus are provided for processing a slider having a rail forming part of a medium facing surface of the slider which faces a medium, at least part of an outer side of the rail being located inside a side of the slider. The slider includes at least first edges each between the medium facing surface of the rail and the outer side of the rail and a second edge located closer to the side of the slider than the first edges. At least the first edges and the second edge are removed.

摘要翻译： 提供了一种方法和装置，用于处理滑块，滑块具有形成滑块的面向介质的介质相对表面的一部分的轨道，轨道的外侧的至少一部分位于滑块的侧面内。 滑块包括在轨道的介质相对表面和轨道的外侧之间的至少第一边缘以及比第一边缘更靠近滑块侧的第二边缘。 至少第一边缘和第二边缘被去除。