公开(公告)号：US06178974B2

公开(公告)日：2001-01-30

申请号：US09572227

申请日：2000-05-17

申请人： Kanji Kobayashi ,  Masao Yamaguchi ,  Shinya Yoshihara ,  Toshio Kubota ,  Jun Kudo

发明人： Kanji Kobayashi ,  Masao Yamaguchi ,  Shinya Yoshihara ,  Toshio Kubota ,  Jun Kudo

IPC分类号： B08B312

CPC分类号： H01L21/67057 ,  B08B3/10 ,  B08B3/12 ,  Y10S134/902

摘要： A cleaning apparatus includes a cleaning tank for reserving cleaning fluid, an object to be cleaned being immersed in the cleaning fluid, a vibrator for vibrating the cleaning fluid in the cleaning tank, and two micro-vibration sources for minutely vibrating the object to be cleaned in two different directions.

摘要翻译： 一种清洁装置，包括：用于储存清洗液的清洗槽，待清洗物体浸入清洗液中;振动器，用于振动清洗槽中的清洗液;以及两个微振动源，用于使待清洗物体微小振动 在两个不同的方向。

公开(公告)号：US6085764A

公开(公告)日：2000-07-11

申请号：US98751

申请日：1998-06-17

申请人： Kanji Kobayashi ,  Masao Yamaguchi ,  Shinya Yoshihara ,  Toshio Kubota ,  Jun Kudo

发明人： Kanji Kobayashi ,  Masao Yamaguchi ,  Shinya Yoshihara ,  Toshio Kubota ,  Jun Kudo

IPC分类号： B08B3/10 ,  B08B3/12 ,  H01L21/00

CPC分类号： H01L21/67057 ,  B08B3/10 ,  B08B3/12 ,  Y10S134/902

摘要： A cleaning apparatus includes a cleaning tank for reserving cleaning fluid, an object to be cleaned being immersed in the cleaning fluid, a vibrator for vibrating the cleaning fluid in the cleaning tank, and two micro-vibration sources for minutely vibrating the object to be cleaned in two different directions.

摘要翻译： 一种清洁装置，包括：用于储存清洗液的清洗槽，待清洗物体浸入清洗液中;振动器，用于振动清洗槽中的清洗液;以及两个微振动源，用于使待清洗物体微小振动 在两个不同的方向。

公开(公告)号：US06247198B1

公开(公告)日：2001-06-19

申请号：US09661435

申请日：2000-09-13

申请人： Kanji Kobayashi ,  Jun Kudo ,  Masao Yamaguchi ,  Shinya Yoshihara

发明人： Kanji Kobayashi ,  Jun Kudo ,  Masao Yamaguchi ,  Shinya Yoshihara

IPC分类号： B08B312

CPC分类号： H01L21/67057 ,  B08B1/04 ,  B08B3/12 ,  H01L21/67046 ,  Y10S134/902

摘要： For cleaning a wafer by a cleaning apparatus, a cleaning liquid is contained in a cleaning bath. Leaving two brushes open, the wafer is inserted to the cleaning bath, placed on oscillation and rotation rollers and retained by the rollers. The brushes are closed and the wafer is held by the brushes. Next, the two brushes are rotated while the wafer is oscillated and rotated by the rollers and so on. Furthermore, ultrasonic vibrations are applied to the cleaning liquid in the cleaning bath by an ultrasonic generator. Scrub cleaning with the two brushes and ultrasonic cleaning by ultrasonic vibrations are thereby performed on the wafer.

摘要翻译： 为了通过清洁装置清洁晶片，清洗液中含有清洗液。 使两个电刷打开，将晶片插入清洗槽中，放置在摆动和旋转辊上并由辊保持。 电刷被关闭，晶片被电刷保持。 接下来，两个电刷旋转，同时晶片由辊等摆动并旋转。 此外，超声波振动通过超声波发生器施加到清洗槽中的清洗液。 由此在晶片上进行用两个刷子进行的擦洗和超声波振动的超声波清洗。

公开(公告)号：US06254688B1

公开(公告)日：2001-07-03

申请号：US09204547

申请日：1998-12-03

申请人： Kanji Kobayashi ,  Jun Kudo ,  Masao Yamaguchi ,  Shinya Yoshihara

发明人： Kanji Kobayashi ,  Jun Kudo ,  Masao Yamaguchi ,  Shinya Yoshihara

IPC分类号： B08B312

CPC分类号： H01L21/67057 ,  B08B1/04 ,  B08B3/12 ,  H01L21/67046 ,  Y10S134/902

摘要： For cleaning a wafer by a cleaning apparatus, a cleaning liquid is contained in a cleaning bath. Leaving two brushes open, the wafer is inserted to the cleaning bath, placed on oscillation and rotation rollers and retained by the rollers. The brushes are closed and the wafer is held by the brushes. Next, the two brushes are rotated while the wafer is oscillated and rotated by the rollers and so on. Furthermore, ultrasonic vibrations are applied to the cleaning liquid in the cleaning bath by an ultrasonic generator. Scrub cleaning with the two brushes and ultrasonic cleaning by ultrasonic vibrations are thereby performed on the wafer.

摘要翻译： 为了通过清洁装置清洁晶片，清洗液中含有清洗液。 使两个电刷打开，将晶片插入清洗槽中，放置在摆动和旋转辊上并由辊保持。 电刷被关闭，晶片被电刷保持。 接下来，两个电刷旋转，同时晶片由辊等摆动并旋转。 此外，超声波振动通过超声波发生器施加到清洗槽中的清洗液。 由此在晶片上进行用两个刷子进行的擦洗和超声波振动的超声波清洗。

公开(公告)号：US08251966B2

公开(公告)日：2012-08-28

申请号：US12307109

申请日：2007-07-05

申请人： Jun Kudo ,  Akira Hashino

发明人： Jun Kudo ,  Akira Hashino

IPC分类号： A61F13/15 ,  A61F13/20

CPC分类号： A61F13/4704 ,  A61F13/47218 ,  A61F13/505

摘要： Provided is an absorptive article having absorption elements capable of following the body of a user. This absorptive article (1) comprises a generally rectangular base absorption element (2), a top absorption element (3) disposed on one surface of the base absorption element (2) at substantially lateral center of the base absorption element (2) and along the longitudinal direction of the base absorption element (2), and a fixing part (4) for fixing the base absorption element (2) to the top absorption element (3) so that at least one end of the top absorption element (3) in the longitudinal direction thereof is made to be a free end (31). A temporary locking part (5) for restricting the movement of the top absorption element (3) is provided on the top absorption element (3) near a free end part (32) thereof at least before application of the absorptive article to the body of the user.

摘要翻译： 提供了具有能够跟随使用者身体的吸收元件的吸收性物品。 该吸收性物品（1）包括大致矩形的基底吸收元件（2），位于基底吸收元件（2）的基本吸收元件（2）的大致侧向中心的一个表面上的顶部吸收元件（3） 基底吸收元件（2）的纵向方向和用于将基底吸收元件（2）固定到顶部吸收元件（3）的固定部分（4），使得顶部吸收元件（3）的至少一个端部 在其长度方向上形成自由端（31）。 至少在将吸收性物品施加到身体的主体之前，用于限制顶部吸收元件（3）的运动的临时锁定部分（5）设置在顶部吸收元件（3）的自由端部（32）附近， 用户。

公开(公告)号：US20120046630A1

公开(公告)日：2012-02-23

申请号：US13143678

申请日：2010-01-07

申请人： Jun Kudo ,  Hideyuki Kinoshita ,  Yuji Takahashi ,  Mari Minami ,  Sarinee Phichetkitjawat ,  Akira Hashino

发明人： Jun Kudo ,  Hideyuki Kinoshita ,  Yuji Takahashi ,  Mari Minami ,  Sarinee Phichetkitjawat ,  Akira Hashino

IPC分类号： A61F13/475

CPC分类号： A61F13/4753 ,  A61F13/5616

摘要： An absorbent article includes a front wing unit which is provided outside in a widthwise direction of the absorbent article more than an absorber, and extends to the outside in the widthwise direction of the absorber in an inside leg region which corresponds to an inside leg portion of a wearer; and a gather which is provided at each of edges of the absorber, which extends along a longitudinal direction of the absorbent article, and which prevents a bodily fluid of the wearer from leaking from the absorbent article. The front wing unit has a base part which is positioned at an innermost side in a widthwise direction of the absorbent article in the front wing unit; and the leakage gather extends to the outside in the widthwise direction of the absorbent article more than the base part as seen in plan view of the absorbent article.

摘要翻译： 吸收性物品包括前翼单元，该前翼单元在吸收性物品的宽度方向上设置在吸收体的宽度方向外侧，并且在吸收体的宽度方向上延伸到与腿部的内侧腿部对应的内侧腿部的外侧 穿戴者 以及设置在吸收体的沿着吸收性物品的长度方向延伸的各边缘的褶皱，并且防止穿用者的体液从吸收性物品泄漏。 前翼单元具有基部，其位于前翼单元中的吸收性物品的宽度方向的最内侧; 并且如在吸收性物品的平面图中看到的那样，泄漏聚集体在吸收性物品的宽度方向上比基部延伸到外侧。

公开(公告)号：US20110125117A1

公开(公告)日：2011-05-26

申请号：US12865065

申请日：2009-01-28

申请人： Jun Kudo

发明人： Jun Kudo

IPC分类号： A61F13/47 ,  A61F13/56 ,  A61L15/62

CPC分类号： A61F13/472 ,  A61F13/511 ,  A61F13/5514 ,  A61F13/84

摘要： An absorbent article having a napkin body (2) comprising as the essentials a liquid-permeable top sheet (3), a liquid-impermeable back sheet (4), and a liquid-absorbing member (5) placed between the top sheet (3) and the back sheet (4), wherein a removable cover sheet (20A) having a length and a width which do not exceed respectively the length and width of the napkin body (2) is provided on the top sheet (3) side of the napkin body (2) in contact with the top sheet (3).

摘要翻译： 一种具有卫生巾体（2）的吸收性物品，该卫生巾主体（2）包括透液性顶片（3），不透液性底片（4）和放置在顶片（3）之间的液体吸收构件 ）和背片（4），其中，具有不超过卫生巾本体（2）的长度和宽度的长度和宽度的可移除覆盖片（20A）设置在卫生巾主体（2）的顶片（3）侧 卫生巾本体（2）与顶片（3）接触。

公开(公告)号：US20070249493A1

公开(公告)日：2007-10-25

申请号：US11589739

申请日：2006-10-31

申请人： Tomohisa Kawata ,  Jun Kudo ,  Hajime Tamon ,  Shin Mukai

发明人： Tomohisa Kawata ,  Jun Kudo ,  Hajime Tamon ,  Shin Mukai

IPC分类号： B01J21/00 ,  B01J20/00

CPC分类号： B01J37/036 ,  B01J20/103 ,  B01J20/183 ,  B01J20/28007 ,  B01J20/28023 ,  B01J20/28026 ,  B01J20/28045 ,  B01J20/28047 ,  B01J20/28057 ,  B01J20/28085 ,  B01J20/3234 ,  B01J20/3295 ,  B01J21/063 ,  B01J21/08 ,  B01J21/18 ,  B01J21/185 ,  B01J29/084 ,  B01J35/004 ,  B01J35/10 ,  B01J37/32 ,  B82Y30/00

摘要： A novel porous honeycomb structure highly functionalized as compared with the conventional example, manufacturing method thereof and an air cleaner using the structure are provided. The functionalized porous honeycomb structure is a silica gel form, and fine powder for adding the function is dispersed in the form. Further the method of manufacturing in accordance with the present invention includes the steps of (a) preparing silica sol by mixing ion exchange resin in sodium silicate aqueous solution; (b) removing said ion exchange resin and adjusting pH; (c) dispersing fine powder for adding a function to the silica sol; (d) gelating the silica sol to provide silica wet gel; and (e) freezing the silica wet gel.

摘要翻译： 提供了与传统实施例相比高度官能化的新型多孔蜂窝结构体，其制造方法和使用该结构的空气滤清器。 官能化多孔蜂窝结构体是硅胶形式，用于添加功能的细粉末以形式分散。 另外根据本发明的制造方法包括以下步骤：（a）通过在硅酸钠水溶液中混合离子交换树脂制备二氧化硅溶胶; （b）除去所述离子交换树脂并调节pH值; （c）将细粉末分散到二氧化硅溶胶中以添加功能; （d）使二氧化硅溶胶凝胶化以提供二氧化硅湿凝胶; 和（e）冷冻二氧化硅湿凝胶。

公开(公告)号：US06608383B2

公开(公告)日：2003-08-19

申请号：US09950804

申请日：2001-09-13

申请人： Seiichi Yokoyama ,  Shun Mitarai ,  Masaya Nagata ,  Jun Kudo ,  Nobuhito Ogata ,  Yasuyuki Itoh

发明人： Seiichi Yokoyama ,  Shun Mitarai ,  Masaya Nagata ,  Jun Kudo ,  Nobuhito Ogata ,  Yasuyuki Itoh

IPC分类号： H01L2348

CPC分类号： H01L27/11502 ,  H01L21/31683 ,  H01L21/76841 ,  H01L21/76864 ,  H01L21/7687 ,  H01L27/11507 ,  H01L28/55 ,  H01L28/75 ,  H01L2924/0002 ,  H01L2924/00

摘要： A semiconductor memory device includes: a capacitor formed on a substrate and including a lower electrode, a dielectric film and an upper electrode; a selection transistor formed at the substrate; an electrically conductive plug for providing electrical connection between the selection transistor and the capacitor; and a diffusion barrier film provided between the electrically conductive plug and the lower electrode of the capacitor. The diffusion barrier film is a TaxSi1−xNy film or a HfxSi1−xNy film (where 0.2

摘要翻译： 半导体存储器件包括：形成在衬底上并包括下电极，电介质膜和上电极的电容器; 形成在所述基板上的选择晶体管; 用于在所述选择晶体管和所述电容器之间提供电连接的导电插头; 以及设置在电容器的导电插头和下电极之间的扩散阻挡膜。 扩散阻挡膜是TaxSi1-xNy膜或HfxSi1-xNy膜（其中0.2

公开(公告)号：US06538272B2

公开(公告)日：2003-03-25

申请号：US09534352

申请日：2000-03-24

申请人： Shinobu Yamazaki ,  Kazuya Ishihara ,  Tetsu Miyoshi ,  Jun Kudo

发明人： Shinobu Yamazaki ,  Kazuya Ishihara ,  Tetsu Miyoshi ,  Jun Kudo

IPC分类号： H01L2976

CPC分类号： H01L28/75 ,  H01L21/28568 ,  H01L21/3212 ,  H01L27/10852 ,  H01L28/55

摘要： A contact plug electrically connected with a MOS transistor is formed in a first interlayer dielectric. Then, a barrier metal material is deposited over the first interlayer dielectric and the contact plug, and patterned into a barrier metal electrically connected with the contact plug. After a SiN film is formed as an anti-oxygen-permeation film over the barrier metal and the first interlayer dielectric, the film is abraded by a chemical mechanical polishing technique until a top surface of the barrier metal is exposed. Then, a lower electrode material, a dielectric material and an upper electrode material are deposited in this order on the SiN film and the barrier metal, and then patterned such that a resulting lower electrode covers at least the entire upper surface of the barrier metal. Thereafter a second interlayer dielectric is deposited, and a heat treatment is performed in an oxygen ambient to recover film quality of a capacitor dielectric.

摘要翻译： 在第一层间电介质中形成与MOS晶体管电连接的接触插塞。 然后，将阻挡金属材料沉积在第一层间电介质和接触插塞上，并被图案化成与接触插塞电连接的阻挡金属。 在阻挡金属和第一层间电介质上形成作为抗氧渗透膜的SiN膜之后，通过化学机械抛光技术对该膜进行研磨，直至暴露出阻挡金属的顶表面。 然后，在SiN膜和阻挡金属上依次沉积下电极材料，电介质材料和上电极材料，然后图案化，使得所得的下电极至少覆盖阻挡金属的整个上表面。 此后，沉积第二层间电介质，并在氧环境中进行热处理以恢复电容器电介质的膜质量。