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    Projection exposure system
    8.
    发明授权
    Projection exposure system 有权
    投影曝光系统

    公开(公告)号：US06806942B2

    公开(公告)日：2004-10-19

    申请号：US10434952

    申请日：2003-05-08

    申请人： Karl-Heinz Schuster ,  Wilhelm Ulrich ,  Toralf Gruner ,  Daniel Kraehmer ,  Wolfgang Singer ,  Alexander Epple ,  Helmut Beierl ,  Reiner Garreis

    发明人： Karl-Heinz Schuster ,  Wilhelm Ulrich ,  Toralf Gruner ,  Daniel Kraehmer ,  Wolfgang Singer ,  Alexander Epple ,  Helmut Beierl ,  Reiner Garreis

    IPC分类号： G03B2754

    CPC分类号： G03F7/70241 ,  G02B13/143 ,  G02B13/24

    摘要： A projection exposure system is proposed which is positionable between a first object and a second object for imaging the first object in a region of the second object with light of a wavelength band having a width &dgr;&lgr; about a central working wavelength &lgr;, wherein a relative width &dgr;&lgr;/&lgr; of the wavelength band is larger than 0.002, in particular, larger than 0.005, for example, of the Hg-I-line. The projection exposure system is a so-called three-bulge system comprising three bulges having, as a whole, a positive refractive power and two waists having, as a whole, a negative refractive power. By applying suitable measures, in particular, by suitably selecting the material for the lenses forming the projection exposure system, the long-term stability of the system is increased.

    摘要翻译： 提出了一种投影曝光系统，其可定位在第一物体和第二物体之间，用于在具有围绕中心工作波长λ的宽度偏差的波长带的光的第二物体的区域内成像第一物体，其中相对宽度 波长带的偏差λ/λ大于0.002，特别是大于0.005，例如Hg-I线。 投影曝光系统是所谓的三凸起系统，其包括总体上具有正屈光力的三个凸起，以及整体上具有负屈光力的两个凸起。 通过适当的措施，特别是通过适当选择形成投影曝光系统的透镜的材料，可以提高系统的长期稳定性。

    Objectives as a microlithography projection objective with at least one liquid lens
    9.
    发明授权
    Objectives as a microlithography projection objective with at least one liquid lens 有权
    目标作为具有至少一个液体透镜的微光刻投影物镜

    公开(公告)号：US07428105B2

    公开(公告)日：2008-09-23

    申请号：US11758363

    申请日：2007-06-05

    申请人： David R. Shafer ,  Susanne Beder ,  Karl-Heinz Schuster ,  Wolfgang Singer

    发明人： David R. Shafer ,  Susanne Beder ,  Karl-Heinz Schuster ,  Wolfgang Singer

    IPC分类号： G02B9/00 ,  G02B1/06

    CPC分类号： G02B3/12 ,  G02B17/0812 ,  G02B17/0856 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70341 ,  G03F7/70958 ,  G03F7/70966

    摘要： The invention relates to an objective designed as a microlithography projection objective for an operating wavelength. The objective has a greatest adjustable image-side numerical aperture NA, at least one first lens made from a solid transparent body, in particular glass or crystal, with a refractive index nL and at least one liquid lens (F) made from a transparent liquid, with a refractive index nF. At the operating wavelength the first lens has the greatest refractive index nL of all solid lenses of the objective, the refractive index nF of the at least one liquid lens (F) is bigger than the refractive index nL of the first lens and the value of the numerical aperture NA is bigger than 1.

    摘要翻译： 本发明涉及被设计为用于工作波长的微光刻投射物镜的物镜。 目标具有最大的可调节图像侧数值孔径NA，由实心透明体，特别是玻璃或晶体制成的至少一个第一透镜，具有折射率n L L和至少一个液体透镜 （F）由透明液体制成，具有折射率n F F。 在工作波长下，第一透镜具有物镜的所有实心透镜的最大折射率n L L，所述至少一个液体透镜的折射率n F ）大于第一透镜的折射率nLL ，并且数值孔径NA的值大于1。