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1.发明申请POSITIVE PHOTOSENSITIVE INSULATING RESIN COMPOSITION AND CURED PRODUCT THEREOF 有权阳离子光敏绝缘树脂组合物及其固化产品公开(公告)号：US20070166632A1
公开(公告)日：2007-07-19
申请号：US11692486
申请日：2007-03-28
IPC分类号： G03C3/00
CPC分类号： G03F7/0226 , G03F7/0047 , G03F7/0233 , G03F7/0236
摘要： Positive photosensitive insulating resin compositions of the invention contain at least (A) an alkali soluble resin having a phenolic hydroxyl group, (B) a compound having a quinonediazido group, (C) crosslinked fine particles, (D) a compound containing at least two alkyletherified amino groups in the molecule, and (F) a solvent The resin compositions have excellent resolution, electrical insulating properties and thermal shock properties. Cured products of the invention are obtained by curing these resin compositions, and they show good adhesive properties.
摘要翻译： 本发明的正性感光性绝缘性树脂组合物至少含有（A）具有酚性羟基的碱溶性树脂，（B）具有醌二叠氮基的化合物，（C）交联微粒，（D）含有至少两个 分子中的烷基醚化氨基，（F）溶剂树脂组合物具有优异的分辨率，电绝缘性和热冲击性。 通过固化这些树脂组合物获得本发明的固化产物，它们显示出良好的粘合性能。
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2.发明授权公开(公告)号：US07214454B2
公开(公告)日：2007-05-08
申请号：US10475084
申请日：2003-01-15
IPC分类号： G03F7/023
CPC分类号： G03F7/0226 , G03F7/0047 , G03F7/0233 , G03F7/0236
摘要： Positive photosensitive insulating resin compositions of the invention contain at least (A) an alkali soluble resin having a phenolic hydroxyl group, (B) a compound having a quinonediazido group, (C) crosslinked fine particles, (D) a compound containing at least two alkyletherified amino groups in the molecule, and (F) a solvent. The resin compositions have excellent resolution, electrical insulating properties and thermal shock properties. Cured products of the invention are obtained by curing these resin compositions, and they show good adhesive properties.
摘要翻译： 本发明的正性感光性绝缘性树脂组合物至少含有（A）具有酚性羟基的碱溶性树脂，（B）具有醌二叠氮基的化合物，（C）交联微粒，（D）含有至少两个 分子中的烷基醚化的氨基，和（F）溶剂。 树脂组合物具有优异的分辨率，电绝缘性能和热冲击性能。 通过固化这些树脂组合物获得本发明的固化产物，它们显示出良好的粘合性能。
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3.发明授权公开(公告)号：US07371500B2
公开(公告)日：2008-05-13
申请号：US11692486
申请日：2007-03-28
IPC分类号： G03F7/023
CPC分类号： G03F7/0226 , G03F7/0047 , G03F7/0233 , G03F7/0236
摘要： Positive photosensitive insulating resin compositions of the invention contain at least (A) an alkali soluble resin having a phenolic hydroxyl group, (B) a compound having a quinonediazido group, (C) crosslinked fine particles, (D) a compound containing at least two alkyletherified amino groups in the molecule, and (F) a solvent The resin compositions have excellent resolution, electrical insulating properties and thermal shock properties. Cured products of the invention are obtained by curing these resin compositions, and they show good adhesive properties.
摘要翻译： 本发明的正性感光性绝缘性树脂组合物至少含有（A）具有酚性羟基的碱溶性树脂，（B）具有醌二叠氮基的化合物，（C）交联微粒，（D）含有至少两个 分子中的烷基醚化氨基，（F）溶剂树脂组合物具有优异的分辨率，电绝缘性和热冲击性。 通过固化这些树脂组合物获得本发明的固化产物，它们显示出良好的粘合性能。
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公开(公告)号：US20120092120A1
公开(公告)日：2012-04-19
申请号：US13259658
申请日：2010-02-26
CPC分类号： H01F37/00 , H01F3/14 , H01F27/022 , H01F27/06 , H01F27/292 , H01F27/327 , H01F2017/046
摘要： A compact reactor with excellent productivity and heat dissipation is provided. Reactor 1α includes a coil formed by spirally winding a wire 2w and a magnetic core 3 having an inside core portion inserted into the coil and an outside core portion 32 coupled to the inside core portion. These core portions form a closed magnetic circuit. The coil is covered with an inside resin portion 4 on the outer circumference thereof to form a coil molded unit 20α with its shape being held. The outer circumference of a combination unit 10 of the coil molded unit 20α and the magnetic core 3 is covered with an outside resin portion 5α. Reactor 1α does not have a case and is thus compact. A surface of the outside core portion 32 on the installation side (core installation surface 32d) is exposed form the outside resin portion 5α and is in direct contact with a fixed object, thereby achieving excellent heat dissipation. The provision of the coil molded unit 20α facilitates the handling of the coil during assembly of reactor 1α, thereby achieving good productivity.
摘要翻译： 提供了具有优异的生产率和散热性的紧凑型反应堆。 反应器1α包括通过螺旋地卷绕线2w而形成的线圈和具有插入到线圈中的内芯部分的磁芯3和耦合到内芯部分的外芯部分32。 这些芯部形成封闭的磁路。 线圈在其外周被内部树脂部分4覆盖，以形成保持其形状的线圈模制单元20α。 线圈成型单元20α和磁芯3的组合单元10的外周被外侧树脂部5α覆盖。 反应器1α不具有壳体并且因此是紧凑的。 安装侧的外芯部32的表面（芯安装面32d）从外侧树脂部5α露出，与固定体直接接触，从而实现良好的散热。 设置线圈成型单元20α有助于在组装反应器1α期间处理线圈，从而实现良好的生产率。
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5.发明授权Cleaning solution for substrate for semiconductor device and process for producing substrate for semiconductor device 有权半导体装置用基板用清洗液及半导体装置用基板的制造方法公开(公告)号：US08110534B2
公开(公告)日：2012-02-07
申请号：US12600545
申请日：2008-05-16
申请人： Yasuhiro Kawase , Makoto Ikemoto , Atsushi Itou , Makoto Ishikawa
发明人： Yasuhiro Kawase , Makoto Ikemoto , Atsushi Itou , Makoto Ishikawa
IPC分类号： C11D1/66
CPC分类号： H01L21/0206 , C11D3/2075 , C11D11/0047 , H01L21/02074
摘要： To provide a cleaning solution for a substrate for a semiconductor device which is excellent in the ability to remove particles, organic contaminants, metal contaminants and composite contaminants of an organic matter and a metal attached on a substrate surface, whereby the substrate surface can be highly cleaned, without being corroded. Particularly, to provide a cleaning solution which is excellent in the ability to clean low dielectric constant (Low-k) materials on which liquid is easily repelled due to hydrophobic and of which the ability to remove particles is poor.A cleaning solution for a substrate for a semiconductor device, which comprises the following components (A) and (B): (A) an organic acid (B) a nonionic surfactant having an HLB value of from 5 to less than 13.
摘要翻译： 为了提供一种用于半导体器件用基板的清洗液，其具有除去颗粒，有机污染物，金属污染物以及附着在基板表面上的有机物和金属的复合污染物的能力优异，从而基板表面可以是高度的 清洁，不被腐蚀。 特别是提供一种清洁液，该清洗溶液清洁低介电常数（Low-k）材料的能力优异，其中由于疏水性而容易排斥液体并且其中去除颗粒的能力差。 一种半导体器件用基板用清洗液，其特征在于，含有以下成分（A）和（B）：（A）有机酸（B）HLB值为5〜13以下的非离子性表面活性剂。
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6.发明申请公开(公告)号：US20090105980A1
公开(公告)日：2009-04-23
申请号：US12025095
申请日：2008-02-04
申请人： Tsutomu TETSUKA , Naoshi Itabashi , Atsushi Itou
发明人： Tsutomu TETSUKA , Naoshi Itabashi , Atsushi Itou
CPC分类号： H01J37/32082 , H01J37/321 , H01J37/32174 , H01J37/32935
摘要： The invention provides a method for detecting and managing the status of a plasma processing apparatus with high sensitivity so as to enable long-term stable processing. In a plasma processing apparatus comprising a vacuum processing chamber 10, a plasma generating high frequency power supply 16, and a measurement device unit 3 for estimating the status of the apparatus via reflected waves 54 of the incident waves 53 reflected from the processing apparatus including a waveform generator 32, a VCO 33, a directional coupler 34, a detector 35 and a measurement data processing unit 36, frequency-swept high frequency waves 53 for measurement are introduced to the processing chamber where no plasma discharge is performed, so as to monitor the change of absorption spectrum frequency of the reflected waves 54 to thereby monitor the change in status of the processing apparatus.
摘要翻译： 本发明提供了一种用于检测和管理具有高灵敏度的等离子体处理装置的状态以便能够进行长期稳定处理的方法。 在包括真空处理室10，等离子体产生高频电源16和测量装置单元3的等离子体处理装置中，用于通过从包括a的处理装置反射的入射波53的反射波54估计装置的状态 波形发生器32，VCO33，定向耦合器34，检测器35和测量数据处理单元36，将用于测量的频率扫描高频波53引入到不进行等离子体放电的处理室中，以便监视 反射波54的吸收光谱频率的变化，从而监视处理装置的状态变化。
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公开(公告)号：USRE39775E1
公开(公告)日：2007-08-21
申请号：US10066747
申请日：2002-09-24
IPC分类号： F26B5/04
CPC分类号： H01L21/67748 , C23C14/564 , H01L21/67028 , H01L21/67167 , H01L21/67253
摘要： This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple. Furthermore, the dummy substrates used for dry cleaning and the substrates to be processed do not coexist, contamination of the substrates to be processed due to dust and remaining gas can be prevented and the production yield can be high.
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公开(公告)号：US07089680B1
公开(公告)日：2006-08-15
申请号：US09766596
申请日：2001-01-23
IPC分类号： F26R13/30
CPC分类号： H01L21/67748 , B41J2/36 , B41J2/365 , C23C14/564 , H01L21/67028 , H01L21/67167 , H01L21/67253 , Y10S134/902 , Y10S414/139 , Y10S414/14
摘要： A vacuum processing apparatus which includes a means for transferring substrates from a loader, with a transferring device, to a double lock chamber; and, then to a selected vacuum processing chamber. The substrates are returned to a substrate, by the vacuum loader, into their original position in the substrate table. The surfaces of the substrates are maintained in a horizontal position during processing.
摘要翻译： 一种真空处理装置，包括用于将基板从装载器与转印装置传送到双重锁定室的装置; 然后到选定的真空处理室。 基板通过真空装载机返回到基板到基板台中的原始位置。 在处理期间，基板的表面保持在水平位置。
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公开(公告)号：US20060032073A1
公开(公告)日：2006-02-16
申请号：US11204171
申请日：2005-08-16
CPC分类号： H01L21/67748 , B01J3/006 , B41J2/36 , B41J2/365 , C23C14/564 , H01L21/67028 , H01L21/67167 , H01L21/67253 , H01L21/67736 , Y10S134/902 , Y10S414/137 , Y10S414/139 , Y10S414/14
摘要： This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple. Furthermore, the dummy substrates used for dry cleaning and the substrates to be processed do not coexist, contamination of the substrates to be processed due to dust and remaining gas can be prevented and the production yield can be high.
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公开(公告)号：US06968630B2
公开(公告)日：2005-11-29
申请号：US10796195
申请日：2004-03-10
CPC分类号： H01L21/67748 , B01J3/006 , B41J2/36 , B41J2/365 , C23C14/564 , H01L21/67028 , H01L21/67167 , H01L21/67253 , H01L21/67736 , Y10S134/902 , Y10S414/137 , Y10S414/139 , Y10S414/14
摘要： This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple. Furthermore, the dummy substrates used for dry cleaning and the substrates to be processed do not coexist, contamination of the substrates to be processed due to dust and remaining gas can be prevented and the production yield can be high.
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