Fire-fighting robot
    1.
    发明申请
    Fire-fighting robot 有权
    消防机器人

    公开(公告)号:US20060185858A1

    公开(公告)日:2006-08-24

    申请号:US10566706

    申请日:2003-08-21

    IPC分类号: A62C27/00

    摘要: Provided is a fire-fighting robot that can quickly start to fight a fire occurring at a hazardous location, which firefighters cannot access, and extinguish fires occurring at any location without receiving a supply of fire extinguishing water. The fire-fighting robot (1) of the present invention is self-propelled and remote-controlled via wireless or mobile communications to fight a fire. The robot includes one or more fire extinguisher storage portions (24a, 24b) for storing fire extinguishers (24c, 24d) which provide a jet of a fire-fighting agent from a jet outlet (26) by depressing a lever, a jet control portion disposed in the fire extinguisher storage portion (24a, 24b) for depressing the lever, and a jet outlet securing portion (26a) for detachably securing the jet outlet (26) of the fire extinguisher (24c, 24d).

    摘要翻译: 提供了一种消防机器人,可以迅速开始在危险场所发生的火灾,消防员不能进入,并且在没有接收到灭火水的情况下熄灭任何地方发生的火灾。 本发明的消防机器人(1)通过无线或移动通信进行自推进和远程控制以防火。 机器人包括一个或多个灭火器存储部分(24a,24b),用于储存通过按压杆从喷射出口(26)提供灭火剂的喷射的灭火器(24c,24d) 设置在用于按压杆的灭火器收纳部(24a,24b)中的喷射控制部以及用于可拆卸地固定灭火器(24c)的喷射出口(26)的喷射出口固定部(26a) 24 d)。

    Fire-fighting robot
    2.
    发明授权
    Fire-fighting robot 有权
    消防机器人

    公开(公告)号:US07182144B2

    公开(公告)日:2007-02-27

    申请号:US10566706

    申请日:2003-08-21

    IPC分类号: A62C27/00

    摘要: Provided is a fire-fighting robot that can quickly start to fight a fire occurring at a hazardous location, which firefighters cannot access, and extinguish fires occurring at any location without receiving a supply of fire extinguishing water.The fire-fighting robot (1) of the present invention is self-propelled and remote-controlled via wireless or mobile communications to fight a fire. The robot includes one or more fire extinguisher storage portions (24a, 24b) for storing fire extinguishers (24c, 24d) which provide a jet of a fire-fighting agent from a jet outlet (26) by depressing a lever, a jet control portion disposed in the fire extinguisher storage portion (24a, 24b) for depressing the lever, and a jet outlet securing portion (26a) for detachably securing the jet outlet (26) of the fire extinguisher (24c, 24d).

    摘要翻译: 提供了一种消防机器人,可以迅速开始在危险场所发生的火灾,消防员不能进入,并且在没有接收到灭火水的情况下熄灭任何地方发生的火灾。 本发明的消防机器人(1)通过无线或移动通信进行自推进和远程控制以防火。 机器人包括一个或多个灭火器存储部分(24a,24b),用于储存通过按压杆从喷射出口(26)提供灭火剂的喷射的灭火器(24c,24d) 设置在用于按压杆的灭火器收纳部(24a,24b)中的喷射控制部以及用于可拆卸地固定灭火器(24c)的喷射出口(26)的喷射出口固定部(26a) 24 d)。

    Robot system and remote operation system of robot
    3.
    发明申请
    Robot system and remote operation system of robot 审中-公开
    机器人系统和远程操作系统

    公开(公告)号:US20060293786A1

    公开(公告)日:2006-12-28

    申请号:US10566707

    申请日:2003-08-21

    IPC分类号: G06F19/00

    摘要: The invention provides a robot apparatus not requiring any incidental equipment in a building since an autonomous behavior is enabled, and capable of coping with abnormal phenomena. The robot apparatus includes means (112) for judging an autonomous mode or an autonomous/remote collaboration mode, means (113) for executing an autonomous motion when the mode judging means judges that the mode is an autonomous mode, means (117) for judging the collaboration ratio when the mode judging means judges that the mode is an autonomous/remote collaboration mode, means (118) for executing a complete remote motion when the judged collaboration ratio is 100% remote, and means (119) for executing an autonomous/remote collaboration motion when the judged collaboration ratio is not 100% remote.

    摘要翻译: 本发明提供了一种机器人装置,其不需要建筑物中的任何附带设备,因为能够进行自主行为,并且能够应付异常现象。 机器人装置包括用于判断自主模式或自主/远程协作模式的装置(112),当模式判断装置判断模式是自主模式时,执行自主动作的装置(113) 当所述模式判断装置判断出所述模式是自主/远程协作模式时,所述协同比率,当所述判断的协作率为100%远程时用于执行完整的远程运动的装置(118),以及用于执行自主/远程协作模式的装置(119) 远程协作运动当判断协作比例不是100%远程时。

    Microwave plasma processing process and apparatus
    4.
    发明授权
    Microwave plasma processing process and apparatus 失效
    微波等离子体处理工艺及装置

    公开(公告)号:US5364519A

    公开(公告)日:1994-11-15

    申请号:US54609

    申请日:1993-04-30

    IPC分类号: H01J37/32 C23C16/50 H01L21/00

    摘要: A microwave plasma processing process and apparatus useful in the fabrication of integrated circuit (IC) or similar semiconductor devices, wherein the object or material to be processed, such as a semiconductor wafer, is processed with plasma generated using microwaves transmitted through a microwave transmission window disposed perpendicular to an electric field of the progressive microwaves in the waveguide.

    摘要翻译: 一种用于制造集成电路(IC)或类似半导体器件的微波等离子体处理工艺和装置,其中待处理对象或诸如半导体晶片的材料使用通过微波透射窗口传输的微波产生的等离子体进行处理 垂直于波导中的逐行微波的电场设置。

    Method of removing photoresist on a semiconductor wafer
    5.
    发明授权
    Method of removing photoresist on a semiconductor wafer 失效
    去除半导体晶片上的光致抗蚀剂的方法

    公开(公告)号:US4938839A

    公开(公告)日:1990-07-03

    申请号:US257165

    申请日:1988-10-11

    CPC分类号: G03F7/427

    摘要: After a semiconductor wafer is processed, a photoresist on the semiconductor wafer is removed by an irradiation of oxygen plasma while the wafer is cooled by a cooling device. The cooling device can be a susceptor or a stage on which the wafer is placed, and coolant flows through a pipe or duct installed thereto. Cooling of the wafer prevents the photoresist from being softened by the heat from the plasma. Thus, the inner side of the photoresist remains hard enough to support the affected surface portion of the photoresist, which is also difficult to remove, preventing the affected surface portion from sticking onto the surface of the wafer. Therefore, the affected portion can be more effectively irradiated by the plasma, and can be decomposed without leaving residue on the wafer. Reduced residue on the wafer surface contributes to improve production yield and quality of the products made from this wafer.

    摘要翻译: 在处理半导体晶片之后,通过氧等离子体的照射去除半导体晶片上的光致抗蚀剂,同时通过冷却装置冷却晶片。 冷却装置可以是基座或放置晶片的台,冷却剂流过安装在其上的管道或管道。 晶片的冷却防止光致抗蚀剂被来自等离子体的热量软化。 因此,光致抗蚀剂的内侧保持足够的硬度,以支持光刻胶的受影响的表面部分,其也难以去除,从而防止受影响的表面部分粘附到晶片的表面上。 因此,受影响部分可以被等离子体更有效地照射,并且可以在晶片上不残留物分解。 在晶片表面上减少残留物有助于提高由该晶片制成的产品的产量和品质。

    Spin dryer
    6.
    发明授权
    Spin dryer 失效
    旋转烘干机

    公开(公告)号:US4637146A

    公开(公告)日:1987-01-20

    申请号:US640643

    申请日:1984-08-14

    CPC分类号: F26B5/08 F26B7/00 G03F7/40

    摘要: A spin dryer including a rotary stage for supporting a substrate to be dried, particularly adapted for use in producing semiconductor devices, and a stationary cover spaced from the substrate. The stationary cover has at least the same area as that of the substrate and is provided with a number of openings for charging a dry and dust-free gas onto the substrate, whereby oxidation and dust-contamination of the substrate are avoided.

    摘要翻译: 一种旋转干燥机,包括用于支撑要干燥的基底的旋转台,特别适用于制造半导体器件,以及与基底间隔开的固定盖。 固定盖至少具有与基板相同的面积,并且设置有用于将干燥且无尘的气体加载到基板上的多个开口,从而避免了基板的氧化和灰尘污染。

    Downstream microwave plasma processing apparatus having an improved
coupling structure between microwave plasma
    8.
    发明授权
    Downstream microwave plasma processing apparatus having an improved coupling structure between microwave plasma 失效
    具有改善的微波等离子体耦合结构的下游微波等离子体处理装置

    公开(公告)号:US4987284A

    公开(公告)日:1991-01-22

    申请号:US462954

    申请日:1990-01-08

    CPC分类号: H01J37/32357

    摘要: A downstream microwave plasma processing apparatus useful in fabricating an integrated circuit semiconductor device includes a waveguide, a microwave transmitting window perpendicular to a microwave electric field in the waveguide, a plasma generating chamber below the window and a reaction chamber separated from the plasma generating region by a gas-porous microwave shield. The microwave energy is transmitted into the plasma generating chamber through the microwave transmitting window, and generates a plasma which is confined therein by the shield. Radicals of a short-lived reactive gas, generated in the plasma, pass through the shield and impinge onto a workpiece placed in the reaction chamber. Uniform and effective downstream plasma etching or ashing is produced.

    摘要翻译: 用于制造集成电路半导体器件的下游微波等离子体处理装置包括:波导,与波导中的微波电场垂直的微波透射窗,窗口下方的等离子体产生室以及与等离子体产生区分离的反应室, 气体微波屏蔽。 微波能量通过微波传输窗口传输到等离子体发生室,并产生被屏蔽限制在其中的等离子体。 在等离子体中产生的短寿命反应气体的自由基穿过屏蔽并撞击放置在反应室中的工件上。 产生均匀有效的下游等离子体蚀刻或灰化。