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    Gradation mask method of producing the same and method of forming special surface profile on material using gradation mask
    1.
    发明授权
    Gradation mask method of producing the same and method of forming special surface profile on material using gradation mask 失效
    渐变掩模，其制造方法和使用渐变掩模在材料上形成特殊表面轮廓的方法

    公开(公告)号：US5830605A

    公开(公告)日：1998-11-03

    申请号：US703539

    申请日：1996-08-27

    申请人： Kazuhiro Umeki ,  Shosen Sato ,  Masaaki Sato

    发明人： Kazuhiro Umeki ,  Shosen Sato ,  Masaaki Sato

    IPC分类号： G03F7/105 ,  G02B3/00 ,  G02B3/02 ,  G02B5/00 ,  G03F1/70 ,  G03F1/80 ,  G03F7/00 ,  G03F7/26 ,  H01L21/027 ,  G03F9/00

    CPC分类号： G02B3/0056 ,  G02B3/0012 ,  G03F1/50 ,  G03F7/001

    摘要： To provide a gradation mask which can easily assure distribution of desired exposure intensity. �Means to accomplish the object!A metal and/or metallic compound film 2 (FIG. 1) is uniformly formed on a transparent substrate 1 such that they have a transmittance of 10% or less. An etching mask having a desired pattern is formed on the metal and/or metallic compound film 2. The metal and/or metallic compound film 2 is dry- or wet-etched. The metal and/or metallic compound film 2 is repeatedly subject to patterning and etching steps by using etching masks with different patterns, so that the obtained layers have a thickness Z(X, Y) varying in three or more steps in accordance with desired transmittance.

    摘要翻译： 提供可以容易地确保期望的曝光强度的分布的渐变掩模。 实现该目的的手段在透明基板1上均匀地形成金属和/或金属化合物膜2（图1），使其透射率为10％以下。 在金属和/或金属化合物膜2上形成具有所需图案的蚀刻掩模。金属和/或金属化合物膜2是干法或湿法蚀刻的。 通过使用具有不同图案的蚀刻掩模，重复地对金属和/或金属化合物膜2进行图案化和蚀刻步骤，使得所获得的层具有根据期望的透射率在三个或更多个步骤中变化的厚度Z（X，Y） 。

    Exposure mask, method of producing the same, exposure mask producing apparatus, and method of forming surface profile on material using exposure mask
    2.
    发明授权
    Exposure mask, method of producing the same, exposure mask producing apparatus, and method of forming surface profile on material using exposure mask 失效
    曝光掩模，其制造方法，曝光掩模制造装置以及使用曝光掩模在材料上形成表面轮廓的方法

    公开(公告)号：US5776639A

    公开(公告)日：1998-07-07

    申请号：US629224

    申请日：1996-04-08

    申请人： Kazuhiro Umeki ,  Shosen Sato

    发明人： Kazuhiro Umeki ,  Shosen Sato

    IPC分类号： G03F1/00 ,  G03F1/68 ,  G03F1/76 ,  G03F7/20 ,  H01L21/027 ,  G03F9/00

    CPC分类号： G03F7/20 ,  G03F1/50

    摘要： A two-dimensional shape of a dotted pattern and optical densities of dots or sizes of dots having the same optical density are calculated as write data on the basis of a target distribution of transmittance. The dotted pattern is optically written on a photosensitive medium in accordance with the calculated write data, using a beam from a light source whose output is stepwise or sequentially variable. A latent dotted pattern on the photosensitive medium is developed, thereby obtaining an exposure mask having a desired two-dimensional distribution of transmittance expressed by the dotted pattern and the optical densities of dots or the sizes of dots having the same optical density.

    摘要翻译： 基于透射率的目标分布，计算出具有相同光密度的点状图案和点的光密度或点的尺寸的二维形状作为写入数据。 使用来自光源的光束，根据计算出的写入数据，将光图案光刻地写入光敏介质，该光束的输出为逐步或顺序变化。 显影在感光介质上的潜伏图案，从而获得具有由点状图案所表示的透光率所需的二维分布和点的光密度或具有相同光密度的点的尺寸的曝光掩模。