公开(公告)号：US06514110B1

公开(公告)日：2003-02-04

申请号：US09471474

申请日：1999-12-23

申请人： Kazumasa Hirayama ,  Maki Yoshida ,  Tatsuhiko Asaka

发明人： Kazumasa Hirayama ,  Maki Yoshida ,  Tatsuhiko Asaka

IPC分类号： H01J942

CPC分类号： H01J9/44

摘要： The adjustment apparatus automatically adjusts the position and angle of a deflection yoke attached to the neck part of a cathode ray tube. A cathode ray tube having a deflection yoke as an adjustment target attached to its neck part is fixed to a predetermined adjustment position such that its tube axis extends in the horizontal direction. The adjustment apparatus holds a deflection yoke attached to the neck part of the cathode ray tube fixed to an adjustment position by means of a hold mechanism. A test image displayed through a fluorescent surface of the cathode ray tube is picked up by a plurality of cameras. The deflection yoke held by the hold mechanism is moved based on image data picked up by the cameras. The position and angle of the deflection yoke with respect to the neck part are automatically adjusted.

摘要翻译： 调节装置自动调整安装在阴极射线管颈部的偏转线圈的位置和角度。 具有附接到其颈部的作为调整对象的偏转线圈的阴极射线管被固定在预定的调整位置，使得其管轴在水平方向上延伸。 调整装置通过保持机构保持安装在固定在调整位置的阴极射线管的颈部的偏转线圈。 通过多个照相机拾取通过阴极射线管的荧光表面显示的测试图像。 由保持机构保持的偏转线圈基于由照相机拍摄的图像数据而移动。 偏转线圈相对于颈部的位置和角度被自动调节。

公开(公告)号：US5288729A

公开(公告)日：1994-02-22

申请号：US813060

申请日：1991-12-23

申请人： Yukitaka Miyata ,  Tatsuhiko Asaka ,  Hisashi Iijima ,  Shigeru Suwa

发明人： Yukitaka Miyata ,  Tatsuhiko Asaka ,  Hisashi Iijima ,  Shigeru Suwa

IPC分类号： G03F7/20 ,  H01J9/14 ,  G03F9/00

CPC分类号： G03F7/2032 ,  H01J9/142

摘要： A method of exposing an object from both sides thereof, wherein the object has photosensitive material coated on both sides thereof and it is held between a first mask plate provided with a first masking pattern and a second mask plate provided with a second masking pattern. This exposing method comprises simultaneously image-sensing first and second alignment patterns formed at those areas on the inner sides of the first and second mask plates where the object is not held by the first and second mask plates so as to obtain an image signal, the first and second alignment patterns being in a predetermined positional relation when the first and second mask plates are correctly aligned with each other, processing the image signal to determine the positionally misregistered amount of the first and second alignment patterns from the predetermined positional relation, and moving one of the first and second mask plate in the facial direction thereof on the basis of the positionally misregistered amount of the alignment pattern thus determined to return the first and second alignment patterns to the predetermined positional relation.

摘要翻译： 一种从其两侧露出物体的方法，其中物体具有涂覆在其两侧的感光材料，并且其被保持在设置有第一掩模图案的第一掩模板和设置有第二掩模图案的第二掩模板之间。 该曝光方法包括同时对第一和第二掩模板的内侧上那些区域形成的第一和第二对准图案，其中物体不被第一和第二掩模板保持以获得图像信号， 当第一和第二掩模板彼此正确对准时，第一和第二对准图案处于预定的位置关系，处理图像信号以从预定位置关系确定第一和第二对准图案的位置不对准量，并且移动 基于如此确定的对准图案的位置不对准量将第一和第二对准图案返回到预定位置关系，在其面向方向上的第一和第二掩模板之一。