公开(公告)号：US5326607A

公开(公告)日：1994-07-05

申请号：US676569

申请日：1991-03-28

申请人： Kazuo Muramatsu ,  Nobuhiro Ohta ,  Shunsuke Takada ,  Motoharu Sato ,  Masami Takao ,  Hiroko Nagata ,  Satoru Takada

发明人： Kazuo Muramatsu ,  Nobuhiro Ohta ,  Shunsuke Takada ,  Motoharu Sato ,  Masami Takao ,  Hiroko Nagata ,  Satoru Takada

IPC分类号： C04B41/53 ,  C04B41/91 ,  C09K3/14 ,  G11B5/73 ,  G11B5/82 ,  G11B5/84 ,  C01B31/02

CPC分类号： C04B41/91 ,  C04B41/53 ,  C09K3/14 ,  G11B5/7305 ,  G11B5/82 ,  G11B5/84 ,  Y10T428/24355 ,  Y10T428/2457 ,  Y10T428/30

摘要： The surface of a blank for a textured amorphous carbon substrate is polished in a surface with a predetermined surface roughness, and then the blank with a polished surface is heated at a predetermined temperature in an oxidizing atmosphere to form minute irregularities in the polished surface through a reaction expressed by C+O.sub.2 =CO.sub.2 so that the surface is textured in an appropriate surface roughness. A randomly textured amorphous carbon substrate has a randomly textured surface with a surface roughness Ra in the range of 20 to 100 .ANG. and the ratio Ra.sub.2 /Ra.sub.1, where Ra.sub.1 is the surface roughness with respect to a circumferential direction, and Ra.sub.2 is the surface roughness with respect to a radial direction, in the range of 0.75 to 1.25 .ANG.. A concentrically textured amorphous carbon substrate has a concentrically textured surface with a surface roughness Ra in the range of 30 to 100 .ANG. or in the range of 40 to 200 .ANG., and the ratio Ra.sub.2 /Ra.sub.1 of 1.75 or greater.

摘要翻译： 在具有预定表面粗糙度的表面上抛光用于织构化非晶碳基底的坯料的表面，然后将具有抛光表面的坯料在氧化气氛中加热到预定温度，以在抛光表面中形成微小的凹凸，通过 由C + O 2 = CO 2表示的反应，使得表面以适当的表面粗糙度纹理化。 无规构造的无定形碳基板具有表面粗糙度Ra在20〜100范围内的无规纹理表面，Ra2 / Ra1的比率Ra1是相对于圆周方向的表面粗糙度，Ra2是表面粗糙度 相对于径向方向，在0.75至1.25的范围内。 同心纹理的非晶碳衬底具有表面粗糙度Ra在30至100安培范围内或40至200安培范围内的同心纹理表面，Ra2 / Ra1的比值为1.75或更高。