公开(公告)号：US5576801A

公开(公告)日：1996-11-19

申请号：US480863

申请日：1995-06-07

申请人： Kazuo Ushida ,  Masaomi Kameyama

发明人： Kazuo Ushida ,  Masaomi Kameyama

IPC分类号： G03F7/20 ,  G03B27/42 ,  G03B27/54

CPC分类号： G03F7/70058 ,  G03F7/70241

摘要： A projection exposure apparatus includes illuminating optical means for illuminating a projection negative, and projection optical means for projection-exposing the projection negative illuminated by the illuminating optical means onto a substrate, the illuminating optical means including light source means for supplying exposure light, annular light source forming means for forming an annular secondary light source by the light from the light source means, and condenser means for condensing the light beam from the annular light source forming means on the projection negative, and is designed to satisfy the following condition:1/3.ltoreq.d.sub.1 /d.sub.2 .ltoreq.2/3,where d.sub.1 is the inner diameter of the annular secondary light source, and d.sub.2 is the outer diameter of the annular secondary light source.

摘要翻译： 投影曝光装置包括用于照射投影阴极的照明光学装置和用于将由照明光学装置负面投射的投影曝光到基板上的投影光学装置，该照明光学装置包括用于提供曝光的光源装置，环形光 用于通过来自光源装置的光形成环形二次光源的源极形成装置和用于将来自环形光源形成装置的光束聚集在投影阴极上的聚光装置，并被设计成满足以下条件：1 / 3

公开(公告)号：US5530518A

公开(公告)日：1996-06-25

申请号：US370216

申请日：1994-12-07

申请人： Kazuo Ushida ,  Masaomi Kameyama

发明人： Kazuo Ushida ,  Masaomi Kameyama

IPC分类号： G03F7/20 ,  H01L21/027

CPC分类号： G03F7/70058 ,  G03F7/70241

摘要： A projection exposure apparatus includes illuminating optical means for illuminating a projection negative, and projection optical means for projection-exposing the projection negative illuminated by the illuminating optical means onto a substrate, the illuminating optical means including light source means for supplying exposure light, annular light source forming means for forming an annular secondary light source by the light from the light source means, and condenser means for condensing the light beam from the annular light source forming means on the projection negative, and is designed to satisfy the following condition:1/3.ltoreq.d.sub.1 /d.sub.2 .ltoreq.2/3,where d.sub.1 is the inner diameter of the annular secondary light source, and d.sub.2 is the outer diameter of the annular secondary light source.

摘要翻译： 投影曝光装置包括用于照射投影阴极的照明光学装置和用于将由照明光学装置负面投射的投影曝光到基板上的投影光学装置，该照明光学装置包括用于提供曝光的光源装置，环形光 用于通过来自光源装置的光形成环形二次光源的源极形成装置和用于将来自环形光源形成装置的光束聚集在投影阴极上的聚光装置，并被设计成满足以下条件：1 / 3

公开(公告)号：US5311362A

公开(公告)日：1994-05-10

申请号：US70051

申请日：1993-06-01

申请人： Koichi Matsumoto ,  Kazuo Ushida ,  Masaomi Kameyama ,  Hiroyuki Tsuchiya

发明人： Koichi Matsumoto ,  Kazuo Ushida ,  Masaomi Kameyama ,  Hiroyuki Tsuchiya

IPC分类号： G03F7/20 ,  G02B9/08 ,  G03B27/68

CPC分类号： G03F7/7025 ,  G03F7/70241 ,  G03F7/70308

摘要： A projection exposure apparatus is provided with an illumination optical system for illuminating a reticle having a predetermined pattern and a projection optical system having a predetermined numerical aperture for projecting the predetermined pattern of the reticle illuminated by the illumination optical system onto a wafer surface. The projection optical system is arranged so that, with respect to the focusing of an image of the reticle onto the wafer surface, spherical aberration, which depends on the numerical aperture of the projection optical system, shows a positive tendency corresponding to overcorrection in third-order spherical aberration and a negative tendency corresponding to undercorrection in fifth-order spherical aberration.

摘要翻译： 投影曝光装置设置有用于照射具有预定图案的掩模版的照明光学系统和具有预定数值孔径的投影光学系统，用于将由照明光学系统照射的标线图的预定图案投影到晶片表面上。 投影光学系统被布置成使得相对于掩模版的图像在晶片表面上的聚焦，取决于投影光学系统的数值孔径的球面像差表现出对应于第三方面中过度校正的正向倾向， 在五阶球面像差中对应于欠矫正的阶次球面像差和负趋势。

公开(公告)号：USRE39662E1

公开(公告)日：2007-05-29

申请号：US09320472

申请日：1999-05-25

申请人： Kazuo Ushida ,  Masaomi Kameyama ,  Takashi Mori

发明人： Kazuo Ushida ,  Masaomi Kameyama ,  Takashi Mori

IPC分类号： H01L21/027 ,  G03F7/20 ,  G03B27/42 ,  G03B27/54 ,  G03B27/72

CPC分类号： G03F7/70058 ,  G03F7/70241

摘要： A projection exposure apparatus includes illuminating optical means for illuminating a projection negative, and projection optical means for projection-exposing the projection negative illuminated by the illuminating optical means onto a substrate, the illuminating optical means including light source means for supplying exposure light, annular light source forming means for forming an annular secondary light source by the light from the light source means, and condenser means for condensing the light beam from the annular light source forming means on the projection negative, and is designed to satisfy the following condition: ⅓≦d1/d2≦⅔, where d1 is the inner diameter of the annular secondary light source, and d2 is the outer diameter of the annular secondary light source.

摘要翻译： 投影曝光装置包括用于照射投影阴极的照明光学装置和用于将由照明光学装置负面投射的投影曝光到基板上的投影光学装置，该照明光学装置包括用于提供曝光的光源装置，环形光 用于通过来自光源装置的光形成环形二次光源的源极形成装置和用于将来自环形光源形成装置的光束聚集在投影阴极上的聚光装置，并被设计成满足以下条件： in-line-formula description =“In-line Formulas”end =“lead”？> 1/3 <= D <1> / 2 <= 2/3， <？in-line-formula description =“In-line Formulas”end =“tail”？>其中d <1> 是环形二次光源的内径，d < / SUB>是环形二次光源的外径。

公开(公告)号：US4931830A

公开(公告)日：1990-06-05

申请号：US389978

申请日：1989-08-07

申请人： Kyoichi Suwa ,  Kazuo Ushida ,  Takeshi Suto ,  Masaomi Kameyama ,  Shigeru Hirukawa ,  Shinichi Nakamura

发明人： Kyoichi Suwa ,  Kazuo Ushida ,  Takeshi Suto ,  Masaomi Kameyama ,  Shigeru Hirukawa ,  Shinichi Nakamura

IPC分类号： G03F7/20 ,  H01L21/027 ,  H01L21/30

CPC分类号： G03F7/70541 ,  G03F7/70091 ,  G03F7/7025

摘要： A projection exposure apparatus is provided with an illuminating optical system for illuminating a reticle having a predetermined fine pattern, a projection optical system for projecting the pattern of the reticle onto a wafer, and diaphragm means so constructed as to vary the aperture of a diaphragm of the projection optical system, wherein means for receiving information on the pattern present on the reticle, and means for determining a diaphgram aperture capable of eliminating the high-order diffracted light generated by the pattern of the reticle according to information as stated above and controlling the aperture of variable diaphragm means of the projection optical system, are provided.

摘要翻译： 投影曝光装置设置有用于照射具有预定精细图案的掩模版的照明光学系统，用于将掩模版的图案投影到晶片上的投影光学系统，以及被构造成将隔膜的孔径改变为 投影光学系统，其中用于接收关于掩模版上存在的图案的信息的装置，以及用于确定能够根据上述信息消除由所述标线图案产生的高次衍射光的轨迹孔的装置， 提供投影光学系统的可变光阑装置的孔径。

公开(公告)号：US06958803B2

公开(公告)日：2005-10-25

申请号：US10619515

申请日：2003-07-16

申请人： Toshihiro Sasaya ,  Kazumasa Endo ,  Kazuo Ushida

发明人： Toshihiro Sasaya ,  Kazumasa Endo ,  Kazuo Ushida

IPC分类号： G02B3/06 ,  G02B13/24 ,  G02B27/00 ,  G03F7/20 ,  H01L21/027 ,  G03B27/42 ,  G03B27/68

CPC分类号： G03F7/70308 ,  F21V5/04 ,  F21W2131/103 ,  F21Y2101/00 ,  G02B3/06 ,  G02B13/24 ,  G02B27/0025 ,  G03F7/70241

摘要： A high-performance projection exposure apparatus and method which can adjust optical characteristics which are rotationally asymmetric with respect to the optical axis of projection optical system and which remain in the projection optical system. In exemplary embodiments, the projection exposure apparatus includes an illumination optical system, a projection optical system and a plurality of optical elements. The illumination optical system illuminates a first object, and the projection optical system projects an image of the first object onto a second object under a predetermined magnification. The optical elements are set between the first object and the second object, and has rotationally asymmetric powers with respect to an optical axis of the projection optical system. Consequently, the optical elements can correct an optical characteristic rotationally asymmetric with respect to the optical axis of the projection optical system remaining in the projection optical system.

摘要翻译： 一种可以调节相对于投影光学系统的光轴旋转不对称且保留在投影光学系统中的光学特性的高性能投影曝光装置和方法。 在示例性实施例中，投影曝光装置包括照明光学系统，投影光学系统和多个光学元件。 照明光学系统照亮第一物体，并且投影光学系统以预定的倍率将第一物体的图像投射到第二物体上。 光学元件设置在第一物体和第二物体之间，并且相对于投影光学系统的光轴具有旋转非对称的能量。 因此，光学元件可以校正相对于保留在投影光学系统中的投影光学系统的光轴旋转不对称的光学特性。

公开(公告)号：US5636000A

公开(公告)日：1997-06-03

申请号：US495726

申请日：1995-06-27

申请人： Kazuo Ushida ,  Sumio Hashimoto

发明人： Kazuo Ushida ,  Sumio Hashimoto

IPC分类号： G02B5/18 ,  G02B7/02 ,  G02B13/24 ,  G02B27/00 ,  G03F7/20 ,  G03F7/207 ,  H01L21/027

CPC分类号： G03F7/70891 ,  G02B13/24 ,  G02B27/0043 ,  G02B27/4222 ,  G02B27/4272 ,  G02B27/4283 ,  G02B7/028 ,  G03F7/70241 ,  G03F7/70308 ,  G03F7/70883

摘要： A projection exposure apparatus can correct focal point movement caused by an environmental change, such as a change in temperature or atmospheric pressure, during an operation, while minimizing occurrence of a new aberration such as a spherical aberration caused by focus correction. The projection exposure apparatus of this invention exposes a mask pattern on a photosensitive substrate via a projection optical system. The projection optical system includes a refraction or reflection type optical member, and a diffraction type correction optical member. The correction optical member has focal position movement with an environmental change during an operation in a direction opposite to the direction of focal position movement of the optical member with the environmental change during the operation.

摘要翻译： 投影曝光装置可以在操作期间校正由诸如温度变化或大气压力之类的环境变化引起的焦点运动，同时最小化由聚焦校正引起的球面像差等新像差的发生。 本发明的投影曝光装置通过投影光学系统在感光基板上曝光掩模图案。 投影光学系统包括折射或反射型光学构件和衍射型校正光学构件。 校正光学构件在操作期间在与操作期间的环境变化的光学构件的焦点位置移动的方向相反的方向上具有环境变化的焦点位置运动。

公开(公告)号：USRE38403E1

公开(公告)日：2004-01-27

申请号：US09659376

申请日：2000-09-08

申请人： Toshihiro Sasaya ,  Kazuo Ushida ,  Yutaka Suenaga ,  Romeo I. Mercado

发明人： Toshihiro Sasaya ,  Kazuo Ushida ,  Yutaka Suenaga ,  Romeo I. Mercado

IPC分类号： G02B1304

CPC分类号： G03F7/70241 ,  G02B9/12 ,  G02B13/18 ,  G02B13/22 ,  G02B13/24

摘要： In the projection optical system that projects an image of the first object onto the second object with a fixed reduction ratio and a projection aligner equipped therewith, said projection optical system comprises, viewed from said first object side, in order of succession, the first group of lenses with positive refractive power, and the second group of lenses virtually consists of afocal system, and the third group of lens with positive refractive power, and if the focal length of the overall system is represented by F, the projection magnification ratio of said projection optical system is represented by B, the distance between said first object and said second object is represented by L, and when a ray from the second object side of said projection optical system that is parallel to the optical axis of said projection optical system is incident on said projection optical system, a distance between a point where an extension on the first object side of said ray intercepts the optical axis and said first object plane is represented by e, and a height of said ray on said first object from the optical axis of said projection optical system, when said ray, coming through said projection optical system, reaches said first object is represented by h, then the following conditions should be satisfied: 1.8≦|F/(B·L)| |h/e|≦3/1000.

摘要翻译： 投影光学系统，其将形成在掩模版上的图案的图像投影到基板上，所述投影光学系统以从光掩模的光程顺序投影：具有正折光力的第一组，所述第一组包括至少两个正透镜; 包括至少四个正透镜和至少四个负透镜的第二组; 具有正屈光力的第三组，所述第三组包括至少两个正透镜; 以及包括在所述第一，第二和/或第三组中的至少一个中的至少一个非球面透镜表面。

公开(公告)号：US06262793B1

公开(公告)日：2001-07-17

申请号：US08360515

申请日：1994-12-21

申请人： Toshihiro Sasaya ,  Kazumasa Endo ,  Kazuo Ushida

发明人： Toshihiro Sasaya ,  Kazumasa Endo ,  Kazuo Ushida

IPC分类号： G03B2742

CPC分类号： G03F7/70308 ,  F21V5/04 ,  F21W2131/103 ,  F21Y2101/00 ,  G02B3/06 ,  G02B13/24 ,  G02B27/0025 ,  G03F7/70241

摘要： A method of manufacturing an exposure apparatus includes a step of providing a projection optical system that projects a pattern image formed on a mask onto a photosensitive substrate. Additionally, a surface of a correction member having a predetermined thickness is locally tooled or processed in order to correct random aberration that remains in the projection optical system. The tooled correction member is arranged between the mask and the substrate, irrespective of the mask. Furthermore, when the projection optical system is provided, an aberration caused due to the predetermined thickness of the correction member is taken into account in advance.

摘要翻译： 制造曝光装置的方法包括提供将形成在掩模上的图案图像投影到感光基板上的投影光学系统的步骤。 此外，具有预定厚度的校正构件的表面被局部加工或加工，以便校正残留在投影光学系统中的随机像差。 加工的校正构件布置在掩模和基板之间，而不管掩模。 此外，当设置投影光学系统时，预先考虑由于校正构件的预定厚度引起的像差。

公开(公告)号：US4403835A

公开(公告)日：1983-09-13

申请号：US248352

申请日：1981-03-27

申请人： Kazuo Ushida

发明人： Kazuo Ushida

IPC分类号： G02B21/02 ,  G02B27/00

CPC分类号： G02B27/0068 ,  G02B21/02

摘要： An objective lens for microscope includes, in succession from the object side, a first lens group having a cemented meniscus lens component having its concave surface facing the object side, a second lens group having a positive lens component movable in the direction of the optical axis, and a third lens group having a positive refractive power. Thus, by moving the second lens group a predetermined amount along the optical axis in accordance with the thickness of a parallel planar member disposed between the object surface and the objective lens, aberrations varied by the parallel planar member are corrected.

摘要翻译： 用于显微镜的物镜包括从物体侧连续地具有第一透镜组，其具有其凹面朝向物体侧的胶结凹凸透镜部件，具有可沿光轴方向移动的正透镜部件的第二透镜组 以及具有正折光力的第三透镜组。 因此，通过根据设置在物体表面和物镜之间的平行平面构件的厚度沿光轴移动预定量的第二透镜组，校正由平行平面构件变化的像差。