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公开(公告)号：USRE38403E1
公开(公告)日：2004-01-27
申请号：US09659376
申请日：2000-09-08
IPC分类号： G02B1304
CPC分类号： G03F7/70241 , G02B9/12 , G02B13/18 , G02B13/22 , G02B13/24
摘要： In the projection optical system that projects an image of the first object onto the second object with a fixed reduction ratio and a projection aligner equipped therewith, said projection optical system comprises, viewed from said first object side, in order of succession, the first group of lenses with positive refractive power, and the second group of lenses virtually consists of afocal system, and the third group of lens with positive refractive power, and if the focal length of the overall system is represented by F, the projection magnification ratio of said projection optical system is represented by B, the distance between said first object and said second object is represented by L, and when a ray from the second object side of said projection optical system that is parallel to the optical axis of said projection optical system is incident on said projection optical system, a distance between a point where an extension on the first object side of said ray intercepts the optical axis and said first object plane is represented by e, and a height of said ray on said first object from the optical axis of said projection optical system, when said ray, coming through said projection optical system, reaches said first object is represented by h, then the following conditions should be satisfied: 1.8≦|F/(B·L)| |h/e|≦3/1000.
摘要翻译： 投影光学系统，其将形成在掩模版上的图案的图像投影到基板上，所述投影光学系统以从光掩模的光程顺序投影：具有正折光力的第一组，所述第一组包括至少两个正透镜; 包括至少四个正透镜和至少四个负透镜的第二组; 具有正屈光力的第三组，所述第三组包括至少两个正透镜; 以及包括在所述第一，第二和/或第三组中的至少一个中的至少一个非球面透镜表面。
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公开(公告)号：US5943172A
公开(公告)日：1999-08-24
申请号：US929155
申请日：1997-09-11
CPC分类号： G02B9/12 , G02B13/24 , G03F7/7025
摘要： In the projection optical system that projects an image of the first object onto the second object with a fixed reduction ratio and a projection aligner equipped therewith, said projection optical system comprises, viewed from said first object side, in order of succession, the first group of lenses with positive refractive power, and the second group of lenses virtually consists of afocal system, and the third group of lens with positive refractive power, and if the focal length of said projection optical system is represented by F, the projection magnification ratio of said projection optical system is represented by B, the distance between said first object and said second object is represented by L, the distance from said first object to the lens surface that is closest to said first group of lenses is represented by d.sub.0, the focal length of said first group of lenses is represented by f.sub.1, and the focal length of said third group of lenses is represented by f.sub.3 herein, then the following conditions should be satisfied:1.8.ltoreq..vertline.F/(B.multidot.L).vertline.d.sub.0 /L.ltoreq.0.20.80.ltoreq.f.sub.3 /f.sub.1 .ltoreq.1.5.
摘要翻译： 在将第一物体的图像以固定的减速比投影到第二物体的投影光学系统和配备有投影对准器的投影光学系统中，所述投影光学系统从所述第一物体侧观察，依次依次包括第一组 具有正屈光力的透镜，第二组透镜实际上由无焦点系统组成，并且具有正屈光力的第三组透镜，并且如果所述投影光学系统的焦距由F表示，投影放大率 所述投影光学系统由B表示，所述第一物体与所述第二物体之间的距离用L表示，最接近所述第一组透镜的距离所述第一物体到透镜表面的距离由d0表示，焦点 所述第一组透镜的长度由f1表示，并且所述第三组透镜的焦距由f3表示，则f 应满足机翼条件：1.8
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公开(公告)号：US5805344A
公开(公告)日：1998-09-08
申请号：US729096
申请日：1996-10-11
CPC分类号： G03F7/70241 , G02B13/18 , G02B13/22 , G02B13/24 , G02B9/12
摘要： In the projection optical system that projects an image of the first object onto the second object with a fixed reduction ratio and a projection aligner equipped therewith, said projection optical system comprises, viewed from said first object side, in order of succession, the first group of lenses with positive refractive power, and the second group of lenses virtually consists of afocal system, and the third group of lens with positive refractive power, and if the focal length of the overall system is represented by F, the projection magnification ratio of said projection optical system is represented by B, the distance between said first object and said second object is represented by L, and when a ray from the second object side of said projection optical system that is parallel to the optical axis of said projection optical system is incident on said projection optical system, a distance between a point where an extension on the first object side of said ray intercepts the optical axis and said first object plane is represented by e, and a height of said ray on said first object from the optical axis of said projection optical system, when said ray, coming through said projection optical system, reaches said first object is represented by h, then the following conditions should be satisfied: 1.8.ltoreq..vertline.F/(B.cndot.L).vertline. .vertline.h/e.vertline..ltoreq.3/1000.
摘要翻译： 在将第一物体的图像以固定的减速比投影到第二物体的投影光学系统和配备有投影对准器的投影光学系统中，所述投影光学系统从所述第一物体侧观察，依次依次包括第一组 具有正屈光力的透镜，第二组透镜实际上由无焦点系统组成，而具有正屈光力的第三组透镜，并且如果整个系统的焦距由F表示，则所述透镜的投影倍率 投影光学系统由B表示，所述第一物体与所述第二物体之间的距离由L表示，并且当来自所述投影光学系统的与所述投影光学系统的光轴平行的第二物体侧的光线为 在所述投影光学系统上的事件之间，所述光线的第一物体侧上的延伸线与光学镜片之间的距离 并且所述第一物体平面由e表示，并且当通过所述投影光学系统通过所述投影光学系统的所述光线到达所述第一物体时，所述第一物体上的所述光线从所述投影光学系统的光轴的高度由 h，则应满足以下条件：1.8
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公开(公告)号：US5831776A
公开(公告)日：1998-11-03
申请号：US944590
申请日：1997-10-06
CPC分类号： G02B13/24 , G03F7/7025
摘要： A projection optical system that projects an image of an object in an object surface onto an image surface with a fixed reduction magnification comprises, in light path order from the object surface: a first group of lenses with positive refractive power; a second group of lenses forming an approximately afocal system; and a third group of lenses with positive refractive power. The projection optical system has a focal length F, the projection optical system has a projection magnification B, the object surface and the image surface are separated by a distance L, and a lens surface in the first group of lenses that is closest to the object surface is separated from the object surface by a distance d.sub.0. A paraxial marginal ray from an axial object point on the object surface enters the second group of lenses G.sub.2 at an entrance height h.sub.1 from an optical axis, and the paraxial marginal ray from the axial object point on the object surface emerges from the second group of lenses G.sub.2 at an emergence height h.sub.2 from the optical axis. The optical system is characterized by the following: 1.8.ltoreq..vertline.F/(B.multidot.L).vertline..ltoreq.6, d.sub.0 /L.ltoreq.0.2, and 4.ltoreq..vertline.h.sub.2 /h.sub.1 .vertline..ltoreq.10.
摘要翻译： 以固定的缩小倍率将物体表面上的物体的图像投影到图像表面上的投影光学系统包括从物体表面的光路顺序：具有正折射光焦度的第一组透镜; 第二组透镜，形成大致无焦的系统; 以及具有正屈光力的第三组透镜。 投影光学系统具有焦距F，投影光学系统具有投影倍率B，物体表面和图像表面间隔距离L，并且第一组透镜中最靠近物体的透镜表面 表面与物体表面分开距离d0。 来自物体表面上的轴向物点的近轴边缘射线在距离光轴的入口高度h1处进入第二组透镜G2，并且来自物体表面上的轴向物点的近轴边缘射线从第二组 距离光轴出现高度h2的透镜G2。 光学系统的特征在于：1.8
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5.发明授权公开(公告)号：US06958803B2
公开(公告)日：2005-10-25
申请号：US10619515
申请日：2003-07-16
申请人： Toshihiro Sasaya , Kazumasa Endo , Kazuo Ushida
发明人： Toshihiro Sasaya , Kazumasa Endo , Kazuo Ushida
CPC分类号： G03F7/70308 , F21V5/04 , F21W2131/103 , F21Y2101/00 , G02B3/06 , G02B13/24 , G02B27/0025 , G03F7/70241
摘要： A high-performance projection exposure apparatus and method which can adjust optical characteristics which are rotationally asymmetric with respect to the optical axis of projection optical system and which remain in the projection optical system. In exemplary embodiments, the projection exposure apparatus includes an illumination optical system, a projection optical system and a plurality of optical elements. The illumination optical system illuminates a first object, and the projection optical system projects an image of the first object onto a second object under a predetermined magnification. The optical elements are set between the first object and the second object, and has rotationally asymmetric powers with respect to an optical axis of the projection optical system. Consequently, the optical elements can correct an optical characteristic rotationally asymmetric with respect to the optical axis of the projection optical system remaining in the projection optical system.
摘要翻译： 一种可以调节相对于投影光学系统的光轴旋转不对称且保留在投影光学系统中的光学特性的高性能投影曝光装置和方法。 在示例性实施例中，投影曝光装置包括照明光学系统，投影光学系统和多个光学元件。 照明光学系统照亮第一物体，并且投影光学系统以预定的倍率将第一物体的图像投射到第二物体上。 光学元件设置在第一物体和第二物体之间，并且相对于投影光学系统的光轴具有旋转非对称的能量。 因此，光学元件可以校正相对于保留在投影光学系统中的投影光学系统的光轴旋转不对称的光学特性。
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6.发明授权Method of manufacturing and using correction member to correct aberration in projection exposure apparatus 失效制造和使用校正构件以校正投影曝光装置中的像差的方法公开(公告)号：US06262793B1
公开(公告)日：2001-07-17
申请号：US08360515
申请日：1994-12-21
申请人： Toshihiro Sasaya , Kazumasa Endo , Kazuo Ushida
发明人： Toshihiro Sasaya , Kazumasa Endo , Kazuo Ushida
IPC分类号： G03B2742
CPC分类号： G03F7/70308 , F21V5/04 , F21W2131/103 , F21Y2101/00 , G02B3/06 , G02B13/24 , G02B27/0025 , G03F7/70241
摘要： A method of manufacturing an exposure apparatus includes a step of providing a projection optical system that projects a pattern image formed on a mask onto a photosensitive substrate. Additionally, a surface of a correction member having a predetermined thickness is locally tooled or processed in order to correct random aberration that remains in the projection optical system. The tooled correction member is arranged between the mask and the substrate, irrespective of the mask. Furthermore, when the projection optical system is provided, an aberration caused due to the predetermined thickness of the correction member is taken into account in advance.
摘要翻译： 制造曝光装置的方法包括提供将形成在掩模上的图案图像投影到感光基板上的投影光学系统的步骤。 此外，具有预定厚度的校正构件的表面被局部加工或加工，以便校正残留在投影光学系统中的随机像差。 加工的校正构件布置在掩模和基板之间，而不管掩模。 此外，当设置投影光学系统时，预先考虑由于校正构件的预定厚度引起的像差。
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7.发明授权
公开(公告)号：US5636000A
公开(公告)日：1997-06-03
申请号：US495726
申请日：1995-06-27
申请人： Kazuo Ushida , Sumio Hashimoto
发明人： Kazuo Ushida , Sumio Hashimoto
CPC分类号： G03F7/70891 , G02B13/24 , G02B27/0043 , G02B27/4222 , G02B27/4272 , G02B27/4283 , G02B7/028 , G03F7/70241 , G03F7/70308 , G03F7/70883
摘要： A projection exposure apparatus can correct focal point movement caused by an environmental change, such as a change in temperature or atmospheric pressure, during an operation, while minimizing occurrence of a new aberration such as a spherical aberration caused by focus correction. The projection exposure apparatus of this invention exposes a mask pattern on a photosensitive substrate via a projection optical system. The projection optical system includes a refraction or reflection type optical member, and a diffraction type correction optical member. The correction optical member has focal position movement with an environmental change during an operation in a direction opposite to the direction of focal position movement of the optical member with the environmental change during the operation.
摘要翻译： 投影曝光装置可以在操作期间校正由诸如温度变化或大气压力之类的环境变化引起的焦点运动，同时最小化由聚焦校正引起的球面像差等新像差的发生。 本发明的投影曝光装置通过投影光学系统在感光基板上曝光掩模图案。 投影光学系统包括折射或反射型光学构件和衍射型校正光学构件。 校正光学构件在操作期间在与操作期间的环境变化的光学构件的焦点位置移动的方向相反的方向上具有环境变化的焦点位置运动。
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公开(公告)号：US5576801A
公开(公告)日：1996-11-19
申请号：US480863
申请日：1995-06-07
申请人： Kazuo Ushida , Masaomi Kameyama
发明人： Kazuo Ushida , Masaomi Kameyama
CPC分类号： G03F7/70058 , G03F7/70241
摘要： A projection exposure apparatus includes illuminating optical means for illuminating a projection negative, and projection optical means for projection-exposing the projection negative illuminated by the illuminating optical means onto a substrate, the illuminating optical means including light source means for supplying exposure light, annular light source forming means for forming an annular secondary light source by the light from the light source means, and condenser means for condensing the light beam from the annular light source forming means on the projection negative, and is designed to satisfy the following condition:1/3.ltoreq.d.sub.1 /d.sub.2 .ltoreq.2/3,where d.sub.1 is the inner diameter of the annular secondary light source, and d.sub.2 is the outer diameter of the annular secondary light source.
摘要翻译： 投影曝光装置包括用于照射投影阴极的照明光学装置和用于将由照明光学装置负面投射的投影曝光到基板上的投影光学装置，该照明光学装置包括用于提供曝光的光源装置，环形光 用于通过来自光源装置的光形成环形二次光源的源极形成装置和用于将来自环形光源形成装置的光束聚集在投影阴极上的聚光装置，并被设计成满足以下条件：1 / 3
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公开(公告)号：US5530518A
公开(公告)日：1996-06-25
申请号：US370216
申请日：1994-12-07
申请人： Kazuo Ushida , Masaomi Kameyama
发明人： Kazuo Ushida , Masaomi Kameyama
IPC分类号： G03F7/20 , H01L21/027
CPC分类号： G03F7/70058 , G03F7/70241
摘要： A projection exposure apparatus includes illuminating optical means for illuminating a projection negative, and projection optical means for projection-exposing the projection negative illuminated by the illuminating optical means onto a substrate, the illuminating optical means including light source means for supplying exposure light, annular light source forming means for forming an annular secondary light source by the light from the light source means, and condenser means for condensing the light beam from the annular light source forming means on the projection negative, and is designed to satisfy the following condition:1/3.ltoreq.d.sub.1 /d.sub.2 .ltoreq.2/3,where d.sub.1 is the inner diameter of the annular secondary light source, and d.sub.2 is the outer diameter of the annular secondary light source.
摘要翻译： 投影曝光装置包括用于照射投影阴极的照明光学装置和用于将由照明光学装置负面投射的投影曝光到基板上的投影光学装置，该照明光学装置包括用于提供曝光的光源装置，环形光 用于通过来自光源装置的光形成环形二次光源的源极形成装置和用于将来自环形光源形成装置的光束聚集在投影阴极上的聚光装置，并被设计成满足以下条件：1 / 3
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公开(公告)号：US4403835A
公开(公告)日：1983-09-13
申请号：US248352
申请日：1981-03-27
申请人： Kazuo Ushida
发明人： Kazuo Ushida
CPC分类号： G02B27/0068 , G02B21/02
摘要： An objective lens for microscope includes, in succession from the object side, a first lens group having a cemented meniscus lens component having its concave surface facing the object side, a second lens group having a positive lens component movable in the direction of the optical axis, and a third lens group having a positive refractive power. Thus, by moving the second lens group a predetermined amount along the optical axis in accordance with the thickness of a parallel planar member disposed between the object surface and the objective lens, aberrations varied by the parallel planar member are corrected.
摘要翻译： 用于显微镜的物镜包括从物体侧连续地具有第一透镜组，其具有其凹面朝向物体侧的胶结凹凸透镜部件，具有可沿光轴方向移动的正透镜部件的第二透镜组 以及具有正折光力的第三透镜组。 因此，通过根据设置在物体表面和物镜之间的平行平面构件的厚度沿光轴移动预定量的第二透镜组，校正由平行平面构件变化的像差。
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